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Bismuth Hall probes: Preparation, properties and application

  R. Koseva, I. Mönch, J. Schumann, K.-F. Arndt, O.G. Schmidt
Thin Solid Films 518, 4847 (2010) URL PDF
 
  Abstract  
 

Bismuth Hall probes with an active area in the µm2 and sub-µm2 (down to (100 × 100) nm2) range have been fabricated on SiO2/Si substrates. The structural and electrical properties of Bi films with a thickness of 20–90 nm were investigated. Critical values of the structural characteristics, at which the film resistivity dependences undergo a distinct change were found. The transition to low resistivity, good crystallinity and high degree of texturing were observed at a film thickness of 65 nm. The potential use of the Bi Hall sensor as a swell sensor for monitoring the swelling of stimuli-sensitive hydrogels was demonstrated.

 
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