Sections
Personal tools

Electron spin resonance study of Si/SiGe quantum dots

  F. Lipps, F. Pezzoli, M. Stoffel, C. Deneke, J. Thomas, A. Rastelli, V. Kataev, O. G. Schmidt, B. Büchner
Phys. Rev. B 81, 125312 (2010) URL PDF
 
  Abstract  
 

In this work, we present systematic electron spin resonance (ESR) experiments on SiGe quantum-dot structures. A series of samples with different sizes of quantum dots is prepared by varying growth temperature and spacing between quantum-dot layers. At a frequency of about 9.5 GHz, two ESR signals with g factors around 1.9992 and 1.9994 are observed with magnetic field in growth direction. The signals shift and broaden with magnetic field in the in-plane direction. The estimated dephasing time T2* amounts up to 500 ns. The saturation behavior yields relaxation time T1 of about 10 μs. The relative intensity between the two peaks can be changed with illumination with subband-gap light. The two peaks are interpreted as s- and p-like states of electrons confined in the strained Si around the SiGe nanostructures.

 
Director
Prof. Dr. Oliver G. Schmidt
IFW Dresden
Postfach 27 01 16
D-01171 Dresden

 

Contact:  
Sekretariat
Ulrike Steere
Phone: +49 351 4659 810
Fax: +49 351 4659 782