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Local setting of magnetic anisotropy in amorphous films by Co ion implantation

  J. McCord, I. Mönch, J. Fassbender, A. Gerber, E. Quandt
J. Phys. D Appl. Phys. 42, 055006 (2009) URL PDF
 
  Abstract  
  The local setting of magnetic anisotropy by low fluence Co ion implantation in amorphous magnetic thin films is demonstrated. For a wide range of ion fluences no structural changes occur and the adjustment of anisotropy is reversible. A quantitative relationship between the anisotropy change and the atomic displacements is found. Magnetic domain investigations of the purely magnetically patterned stripes reveal an effective quasi-cubic anisotropy below a critical width for orthogonal magnetic anisotropy alignment. The method of ion-annealing allows for a local setting of anisotropy without irreversible structural and magnetic alterations.  
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