Profesor Oliver G. Schmidt

Director:

Prof. Dr. Oliver G. Schmidt
IFW Dresden
Postfach 27 01 16
D-01171 Dresden  

Contact: 

Office
Kristina Krummer
office-iin (at) ifw-dresden.de
Phone:+49 351 4659 810
Fax:+49 351 4659 782

General Purpose Deposition

Room: BEG.17
Telephone: 863
Responsible: Ronny Engelhard
Substitute: Daniil Karnaushenko

Small sputtering machine
Small sputtering machine

One 2-inch metal target (Cr, Cu, Ni, …), small samples but very fast
For ohmic contacts or SEM preparation

Room: BEG.37
Telephone: 656
Responsible: Ronny Engelhard
Substitute: Dr. Stefan Harazim

Edwards Auto500 e-beam
Edwards Auto500 e-beam

This tool is used for material evaporation by 4-pocket-electron beam onto samples. Metals and oxides are deposited onto semiconductor or glass substrates. The sample holder is capable of taking up to four 2" wafers at the same time. You can deposit 4 materials in one run, that can be used for high quality metal/oxide interfaces.

New oxide e-beam
New oxide e-beam

4 e-beam crucibles - only oxides (high quality) - substrate heater up to 700°C – flat or angled deposition – six 2”-samples at the same time

Thermal evaporator for metals
Thermal evaporator for metals

4 thermal evap. cells - Cr, Au, Ge, Al – for good ohmic contact layers – 4x 2”- sample holder

Tectra thermal evaporator
Tectra thermal evaporator

2 thermal evap. cells, 1 small e-beam (only for doping) - for every kind of experimental usage, f.e.: Indium, ITO, NaCl... deposition

Oven (1100°C max)
Oven (1100°C max)

For annealing in air atmosphere, up to 1100°C