Profesor Oliver G. Schmidt

Director:

Prof. Dr. Oliver G. Schmidt
IFW Dresden
Postfach 27 01 16
D-01171 Dresden  

Contact: 

Office
Kristina Krummer
office-iin (at) ifw-dresden.de
Phone:+49 351 4659 810
Fax:+49 351 4659 782

Magnetic Nanomembranes

Room: BEG.16-BEG.18
Telephone: 657
Responsible: Daniil Karnaushenko, Dr. Michael Melzer
Substitute: Cornelia Krien

Sputtering Machine B2
Sputtering Machine B2

Two magneton sources for DC cool sputtering of metal and magnetic materials (only conductive materials). The system equipped with a measurement setup for observing stress evolution during the film growth and sample for this machine is a stripe.

Sputtering Machine B8
Sputtering Machine B8

Ultra-high vacuum sputtering machines with 8 magneton sources for sputtering of both conductive and non-conductive target materials. The system can support full 3-inch wafers.

Sputtering Machine DCA with In-Situ Analytic Tools
Sputtering Machine DCA with In-Situ Analytic Tools

Ultra-high vacuum sputtering machine with eight DC magneton sources for metal and magnetic materials. The system connected with an analytic chamber, where one can perform scanning tunneling microscopy, atomic force microscopy, low-energy electron diffraction and Auger. System can support full 3-inch wafer.

Digital microscope (Keyence VHX-5000)
Digital microscope (Keyence VHX-5000)

This optical microscope system features a high focal depth, 3D profile reconstruction, automatic wide area stitching and tilted observations.

HZM 4P sputtering machine: 3 targets, metals and alloys, very big samples are possible
HZM 4P sputtering machine: 3 targets, metals and alloys, very big samples are possible