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X-Ray Photoelectron Spectroscopy (XPS)
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- quantitative element analysis at surfaces of solid materials by spectroscopy of emitted photo electrons, information of the chemical states by analysis of peak-shift or peak-shape change
- excitation of electrons with medium energy X-rays (Al-Ka or Mg-Ka), or He-UV-radiation
- analysis of only elastically scattered electrons (no energy loss) with a hemispherical energy analyzer
- depth resolution 2 ... 10 nm depending on electron energy
- analysis of non-conducting samples, additionally low energy electron flood gun
- sputtering by noble gas ions (e.g. Ar+) for surface cleaning and depth profiling
- analysis at UHV-conditions, base pressure 10-8 Pa (@ 10-10 mbar)
- Analytical features:
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- spectra registration (survey or multiplex spectra) of selected sample areas, peak identification, atomic concentration(a. c.)-calculation, spectra manipulation (peakfit, background subtraction, factor analysis ...)
- depth profiling in connection with ion sputtering,
- line-scan and map registration (including spectral shape = “chemical imaging”)
- (automatic non-destructive) depth profiling at the nm-scale by angle dependent measurements (ARXPS) with model calculations
- off-line spectra classification by mathematical methods like factor analysis
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Head Dr. Annett Gebert IFW Dresden P.O.Box 270116 D-01171 Dresden Germany phone: +49-351-4659-275 fax: +49-351-4659-452 e-mail: a.gebert@ifw-dresden.de
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