Spectrometric Solid State Analysis

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Group leader

Dr. rer. nat. Volker Hoffmann                              
Postanschrift:
Dr. Volker Hoffmann
Leibniz-IFW-Dresden, P.O.B. 27 00 16
D-01171 Dresden

Telefon: +49 351 4659 691
Fax: +49 351 4659 452
email: v.hoffmann@ifw-dresden.de

Team

Dr. Maxim Voronov

Dr. Varvara Brackmann

Romy Keller - Laborantin

 

The research group “Spectroscopic solid state analysis" study in the field of analytical glow discharge and perform elemental analysis of solid samples.

Former projects:

  • European Thematic Network on Glow Discharge Spectroscopy for Spectrochemical analysis (1999-2002)
  • European research project Marie Curie RTN Analytical Glow Discharge Network GLADNET. For more details please see the website: www.gladnet.net (01.02.2007 – 31.01.2011)
  • ZIM project “Sensorik und Technologie zur Probenpräparation mit Glimmentladung” KF2466403AB0 (01.02.2011 - 28.02.2013)
  • NIMESA project: „Novel Instrumentation for Modern Elemental Speciation Analysis“ together with NSF/DFG Projekt of group of Gary Hieftje in Bloomington, Indiana und  group of Wolfgang Buscher in Münster, Germany

Current Projects:

  • European project SIB09-REG2 “Research in Glow discharge spectrometry & non-metal determination” which belongs to the SIB09 ELEMENTS “Primary standards for challenging elements”
  • DFG-Project HO 2062/9-1 „Entwicklung eines Simulationsmodells für neuartige Plasma-Anregungsquellen zur analytischen Nutzung in der Atomspektrometrie – SIMONA“


Main research topics

  • Sample preparation for SEM and TEM investigations Dr. V. Brackmann, Dr. V. Hoffmann

 

 

Publications

Journal papers

2016

J. Acker, S. Buecker, V. Hoffmann: Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C2H2/N2O flame, Journal of Analytical Atomic Spectrometry 31 (2016) Nr. 4, S. 902-911 URL

A. Gebert, D. Eigel, P.F. Gostin, V. Hoffmann, M. Uhlemann, A. Helth, S. Pilz, R. Schmidt, M. Calin, M. Goettlicher, M. Rohnke, J. Janek: Oxidation treatments of beta-type Ti-40Nb for biomedical use, Surface and Coatings Technology 302 (2016), S. 88-99 URL

S. Mushtaq, E.B.M. Steers, G. Churchill, D. Barnhart, V. Hoffmann, J.C. Pickering, K. Putyera: Does asymmetric charge transfer play an important role as an ionization mode in low power-low pressure glow discharge mass spectrometry?, Spectrochimica Acta Part B: Atomic Spectroscopy 118 (2016), S. 56-61 URL

R. Schmidt, V. Hoffmann, A. Helth, P.F. Gostin, M. Calin, J. Eckert, A. Gebert: Electrochemical deposition of hydroxyapatite on beta-Ti-40Nb, Surface and Coatings Technology 294 (2016), S. 186-193 URL

Z. Weiss, E.B.M. Steers, S. Mushtaq, V. Hoffmann, J.C. Pickering: The use of radiative transition rates to study the changes in the excitation of Cu ions in a Ne glow discharge caused by small additions of H2, O2 and N2, Spectrochimica Acta Part B: Atomic Spectroscopy 118 (2016), S. 81-89 URL

2015

M.D. Heinemann, V. Efimova, R. Klenk, B. Hoepfner, M. Wollgarten, T. Unold, H.-W. Schock, C.A. Kaufmann: Cu(In,Ga)Se2 superstrate solar cells: prospects and limitations, Progress in Photovoltaics 23 (2015) Nr. 10, S. 1228-1237 URL

M. Voronov, V. Hoffmann, D. Birus, C. Engelhard, W. Buscher: Investigation of the electrical properties of standard and low-gas-flow ICPs using novel probes for the direct measurements of RF voltage and current in the load coil and the corresponding calculation of the ICP power, Journal of Analytical Atomic Spectrometry 30 (2015) Nr. 10, S. 2089-2098 URL

G. Yin, V. Brackmann, V. Hoffmann, M. Schmid: Enhanced performance of ultra-thin Cu(In,Ga)Se2 solar cells deposited at low process temperature, Solar Energy Materials and Solar Cells 132 (2015), S. 142-147 URL

2014

V. Brackmann, V. Hoffmann, A. Kauffmann, A. Helth, J. Thomas, H. Wendrock, J. Freudenberger, T. Gemming, J. Eckert: Glow discharge plasma as a surface preparation tool for microstructure investigations, Materials Characterization 91 (2014), S. 76-88 URL

M. Calin, A. Helth, J.J. Gutierrez Moreno, M. Boenisch, V. Brackmann, L. Giebeler, T. Gemming, C.E. Lekka, A. Gebert, R. Schnettler, J. Eckert: Elastic softening of Beta-type Ti-Nb alloys by indium (In) additions, Journal of the Mechanical Behavior of Biomedical Materials 39 (2014), S. 162-174 URL

C. Gonzalez-Gago, P. Smid, T. Hofmann, C. Venzago, V. Hoffmann, W. Gruner: The use of matrix-specific calibrations for oxygen in analytical glow discharge spectrometry, Analytical and Bioanalytical Chemistry 406 (2014), S. 7473-7482 URL

A. Plotnikov, J. Pfeifer, S. Richter, H. Kipphardt, V. Hoffmann: Determination of major nonmetallic impurities in magnesium by glow discharge mass spectrometry with a fast flow source using sintered and pressed powder samples, Analytical and Bioanalytical Chemistry 406 (2014), S. 7463-7471 URL

A. Undisz, R. Hanke, K.E. Freiberg, V. Hoffmann, M. Rettenmayr: The effect of heating rate on the surface chemistry of NiTi, Acta Biomaterialia 10 (2014), S. 4919-4923 URL

M. Voronov, V. Hoffmann: Factors affecting the formation of the radiation pre-peak at the operation of a Grimm-type source in pulsed DC mode, Analytical and Bioanalytical Chemistry 406 (2014) Nr. 29, S. 7445-7454 URL

M. Voronov, V. Hoffmann, T. Steingrobe, W. Buscher, C. Engelhard, A.P. Storey, S.J. Ray, G.M. Hieftje: Spot patterns and instabilities in a pulsed low-pressure rf glow discharge, Plasma Sources Science and Technology 23 (2014) Nr. 5, S. 54009/1-5 URL

Z. Weiss, E.B.M. Steers, J.C. Pickering, V. Hoffmann, S. Mushtaq: Excitation of higher levels of singly charged copper ions in argon and neon glow discharges, Journal of Analytical Atomic Spectrometry 29 (2014) Nr. 12, S. 2256-2261 URL

2012

D. Abou-Ras, B. Marsen, T. Rissom, F. Frost, H. Schulz, F. Bauer, V. Efimova, V. Hoffmann, A. Eicke: Enhancements in specimen preparation of Cu (In,Ga)(S,Se) 2 thin films, Micron 43 (2012), S. 470-474 URL

V. Efimova, V. Hoffmann, J. Eckert: Sputter crater formation in the case of microsecond pulsed glow discharge in Grimm-type source. Comparison of direct current and radio frequency modes, Spectrochimica Acta B 76 (2012), S. 181-189 URL

G. Gamez, M. Voronov, S.J. Ray, V. Hoffmann, G.M. Hieftje, J. Michler: Surface elemental mapping via glow discharge optical emission spectroscopy, Spectrochimica Acta B 70 (2012), S. 1-9 URL

M. Voronov, V. Hoffmann, W. Buscher, C. Engelhard, S.J. Ray, G.M. Hieftje: Thermal mechanism for formation of electrical prepeak and pressure waves in a microsecond direct current pulsed glow discharge with a Grimm-type source: A modeling investigation, Journal of Analytical Atomic Spectrometry 27 (2012), S. 1225-1233 URL

M. Voronov, V. Hoffmann, T. Wallendorf, S. Marke, I. Moench, C. Engelhard, W. Buscher, S.J. Rayd, G.M. Hieftje: Glow discharge imaging spectroscopy with a novel acousto-optical imaging spectrometer, Journal of Analytical Atomic Spectrometry 27 (2012), S. 419-425 URL

2011

D. Abou-Ras, R. Caballero, C.-H. Fischer, C.A. Kaufmann, I. Lauermann, R. Mainz, H. Moenig, A. Schoepke, C. Stephan, C. Streeck, S. Schorr, A. Eicke, M. Doebeli, B. Gade, J. Hinrichs, T. Nunney, H. Dijkstra, V. Hoffmann, D. Klemm, V. Efimova, A. Bergmaier, G. Dollinger, T. Wirth, W. Unger, A.A. Rockett, A. Perez-Rodriguez, J. Alvarez-Garcia, V. Izquierdo-Roca, T. Schmid, P.-P. Choi, M. Mueller, F. Bertram, J. Christen, H. Khatri, R.W. Collins, S. Marsillac, I. Koetschau: Comprehensive comparison of various techniques for the analysis of elemental distributions in thin films, Microscopy and Microanalysis 17 (2011), S. 728-751 URL

A. Bachmatiuk, F. Boerrnert, V. Hoffmann, D. Lindackers, J.-H. Lin, B. Buechner, M.H. Ruemmeli: Hydrogen-induced self-assembly of helical carbon nanostructures from ethanol over SiO2 catalysts, Journal of Applied Physics 109 (2011) Nr. 9, S. 94317/1-4 URL

V. Efimova, V. Hoffmann, J. Eckert: Electrical properties of the my-s pulsed glow discharge in a Grimm-type source: comparison of dc and rf modes, Journal of Analytical Atomic Spectrometry 26 (2011), S. 784-791 URL

S.E. Gledhill, A. Zykov, T. Rissom, R. Caballero, C. A. Kaufmann, C.-H. Fischer, M. Lux-Steiner, V. Efimova, V. Hoffmann, S. Oswald: The role of the spray pyrolysed Al2O3 barrier layer in achieving high efficiency solar cells on flexible steel substrates, Applied Physics A 104 (2011), S. 407-413

V. Hoffmann, M. Steinert, J. Acker: Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry
(DC-GD-OES), Journal of Analytical Atomic Spectrometry 26 (2011), S. 1990-1996 URL

T. Rissom, R. Mainz, C.A. Kaufmann, R. Caballero, V. Efimova, V. Hoffmann, H.-W. Schock: Examination of growth kinetics of copper rich Cu(In,Ga)Se2-films using synchrotron energy dispersive X-ray diffractometry, Solar Energy Materials and Solar Cells 95 (2011) Nr. 1, S. 250-253 URL

M. Voronov, V. Hoffmann, W. Buscher, C. Engelhard, S.J. Ray, G.M. Hieftje: Pressure waves generated in a Grimm-type pulsed glow discharge source and their influence on discharge parameters, Journal of Analytical Atomic Spectrometry 505 (2011), S. 811-815 URL

2010

V. Efimova, A. Derzsi, A. Zlotorowicz, V. Hoffmann, Z. Donko, J. Eckert: Influence of the anode material on the characteristics of an analytical glow discharge cell, Spectrochimica Acta, Part B 65 (2010) Nr. 4, S. 311-315 URL

M. Voronov, P. Smid, V. Hoffmann, T. Hofmann, C. Venzago: Microsecond pulsed glow discharge in fast flow Grimm type sources for mass spectrometry, Journal of Analytical Atomic Spectrometry 25 (2010), S. 511-518 URL

2009

D. Klemm, V. Hoffmann, K. Wetzig, J. Eckert: DC-and RF-GD-OES measurements of adsorbed organic monolayers on copper, Analytical and Bioanalytical Chemistry 395 (2009) Nr. 6, S. 1893-1900 URL

D. Klemm, V. Hoffmann, C. Edelmann: Controlling of material analysers of the GD-OES type with help of pump-down curves, Vacuum 84 (2009) Nr. 2, S. 299-303 URL

M. Stangl, M. Liptak, J. Acker, V. Hoffmann, S. Baunack, K. Wetzig: Influence of incorporated non-metallic impurities on electromigration in copper damascene interconnect lines, Thin Solid Films 517 (2009), S. 2687-2690 URL

Z. Weiss, E.B.M. Steers, P. Smid, V. Hoffmann: Towards a catalogue of glow discharge emission spectra, Journal of Analytical Atomic Spectrometry 24 (2009) Nr. 1, S. 27-33 URL

2008

V.V. Efimova, M.V. Voronov, V. Hoffmann, J. Eckert: Electrical properties of pulsed glow discharge: two new aspects, Publications of the Astronomical Observatory of Belgrade 84 (2008), S. 369-373

S. Hampel, D. Kunze, D. Haase, K. Kraemer, M. Rauschenbach, M. Ritschel, A. Leonhardt, J. Thomas, S. Oswald, V. Hoffmann, B. Buechner: Carbon nanotubes filled with a chemotherapeutic agent: a nanocarrier mediates inhibition of tumor cell growth, Nanomedicine 3 (2008) Nr. 2, S. 175-182 URL

V.-D. Hodoroaba, D. Klemm, U. Reinholz, E. Strub, J. Roehrich, W. Bohne, V. Hoffmann, K. Wetzig: Potential candidates of certified reference material for determination of hydrogen concentration with glow discharge optical emission spectrometry (GD-OES)—a feasibility study, Journal of Analytical Atomic Spectrometry 23 (2008) Nr. 4, S. 460-462 URL

V. Hoffmann, V.V. Efimova, M.V. Voronov, P. Smid, E.B.M. Steers, J. Eckert: Measurement of voltage and current in continuous and pulsed rf and dc glow discharges, Journal of Physics / Conference Series 133 (2008), S. 12017/1-12 URL

D. Klemm, M. Stangl, A. Peeva, V. Hoffmann, K. Wetzig, J. Eckert: Analysis of interface impurities in electroplated Cu layers by using GD-OES and TOF-SIMS, Surface and Interface Analysis 40 (2008) Nr. 3-4, S. 418-422 URL

2007

S. Baunack, V. Hoffmann, W. Zahn: Quantitative nitrogen analysis by Auger electron spectrometry and glow discharge optical emission spectrometry, Microchimica Acta 156 (2007) Nr. 1-2, S. 69-72 URL

R. Schoenfelder, M.H. Ruemmeli, W. Gruner, M. Loeffler, J. Acker, V. Hoffmann, T. Gemming, B. Buechner, T. Pichler: Purification-induced sidewall functionalization of magnetically pure single-walled carbon nanotubes, Nanotechnology 18 (2007) Nr. 37, S. 375601/1-8 URL

M. Stangl, J. Acker, V. Hoffmann, W. Gruner, K. Wetzig: Segregation of organic impurities in thin electroplated Cu metallizations, Microchimica Acta 156 (2007) Nr. 1-2, S. 159-162 URL

S. Strehle, R. Reiche, V. Hoffmann, J. Acker, T. Gemming, K. Wetzig: Sulfur incorporation in electroplated Cu(Ag) thin films, Microchimica Acta 156 (2007) Nr. 1-2, S. 167-172 URL

V.S. Vidyarthi, W.-M. Lin, G. Suchaneck, G. Gerlach, C. Thiele, V. Hoffmann: Plasma emission controlled multi-target reactive sputtering for in-situ crystallized Pb(Zr,Ti)O3 thin films on 6" Si-wafers, Thin Solid Films 515 (2007) Nr. 7-8, S. 3547-3553 URL

M. Voronov, V. Hoffmann: Secondary discharge in fast flow Grimm-type microsecond pulsed glow discharge source for mass spectrometry, Journal of Analytical Atomic Spectrometry 22 (2007), S. 1184-1188 URL

L. Wilken, V. Hoffmann, K. Wetzig: Electrical measurements at radio frequency glow discharges for spectroscopy, Spectrochimica Acta B 62 (2007) Nr. 10, S. 1085-1122 URL

2006

V.-D. Hodoroaba, V. Hoffmann, B.M. Steers, M. Griepentrog, A. Dueck, U. Beck: Round Robin exercise: Coated materials for glow discharge spectroscopy, Journal of Analytical Atomic Spectrometry 21 (2006) Nr. 1, S. 74-81 URL

R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, H. Heuer, C. Wenzel, H.-J. Engelmann, D. Gehre, E. Zschech: Effect of nitrogen content on the degradation mechanisms of thin Ta–Si–N diffusion barriers for Cu metallization, Thin Solid Films 500 (2006) Nr. 1-2, S. 259-267 URL

M.R. Webb, V. Hoffmann, G.M. Hieftje: Surface elemental mapping using glow discharge—optical emission spectrometry, Spectrochimica Acta, Part B 61 (2006) Nr. 12, S. 1279-1284 URL

L. Wilken, V. Hoffmann, K. Wetzig: Radio frequency glow discharge source with integrated voltage and current probes used for evaluation of discharge parameters, Journal of Applied Physics 99 (2006) Nr. 6, S. 63305/1-13 URL

2005

V. Hoffmann, M. Kasik, P.K. Robinson, C. Venzago: Glow discharge mass spectrometry, Analytical and Bioanalytical Chemistry 381 (2005), S. 173-188 URL

V. Hoffmann, M. Hecker, R. Huebner: Focussing and defocussing effects at radio frequency glow discharge optical emission spectroscopy analyses of thin films with partly nonconductive components, Zeitschrift fuer Metallkunde 96 (2005) Nr. 9, S. 983-987

R. Huebner, R. Reiche, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, H. Heuer, C. Wenzel, H.-J. Engelmann, E. Zschech: Void formation in the Cu layer during thermal treatment of SiNx/Cu/Ta73Si27/SiO2/Si systems, Crystal Research and Technology 40 (2005) Nr. 1-2, S. 135-142

S. Kardelky, A. Gebert, O. Gutfleisch, V. Hoffmann, L. Schultz: Prediction of the oxidation behaviour of Sm–Co-based magnets, Journal of Magnetism and Magnetic Materials 290-291 (2005) Nr. Part 2, S. 1226-1229 URL

Y.-S. Kim, M. Plotnikov, V. Hoffmann: Comparison study of sensitivity factors of elements in glow discharge- and inductively coupled plasma-mass spectrometry, Bulletin of the Korean Chemical Society 26 (2005) Nr. 12, S. 1991-1995

D. Reitz, H. Heuer, S. Baunack, R. Huebner, V. Hoffmann, S. Menzel, C. Wenzel, K. Wetzig: Investigation of a Ta–Si–O/Ta–Si–N bilayer system for embedded SAW finger structures, Microelectronic Engineering 82 (2005) Nr. 3-4, S. 301-306 URL

M. Stangl, V. Dittel, J. Acker, V. Hoffmann, W. Gruner, S. Strehle, K. Wetzig: Investigation of organic impurities adsorbed on and incorporated into electroplated copper layers, Applied Surface Science 252 (2005) Nr. 1, S. 158-161 URL

M. Stangl, J. Acker, V. Dittel, W. Gruner, V. Hoffmann, K. Wetzig: Characterization of electroplated copper self-annealing with investigations focused on incorporated impurities, Microelectronic Engineering 82 (2005) Nr. 2, S. 189-195 URL

M. Stangl, J. Acker, A. Henssge, W. Gruner, V. Hoffmann, H. Wendrock, K. Wetzig: Untersuchungen zum Einbau von Additiven in elektrochemisch abgeschiedenen Kupferschichten, Galvanotechnik 96 (2005) Nr. 5, S. 1084-1087

M. Stangl, J. Acker, V. Dittel, W. Gruner, V. Hoffmann, S. Oswald, K. Wetzig: Verhalten organischer Verunreinigungen in elektrochemisch abgeschiedenem Kupfer waehrend des self-annealings bei Raumtemperatur, Galvanotechnik 96 (2005) Nr. 7, S. 1576-1579

L. Wilken, V. Hoffmann, K. Wetzig: Analysis of new electrical signals in respect to quantification of radio frequency glow discharge emission spectrometry, Applied Surface Science 252 (2005) Nr. 1, S. 261-265 URL

L. Wilken, V. Hoffmann, K. Wetzig: Radio frequency glow discharge source with integrated voltage and current probes used for sputtering rate and emission yield measurements at insulating samples, Analytical and Bioanalytical Chemistry 383 (2005) Nr. 3, S. 424-433 URL

2004

R. Huebner, M. Hecker, N. Mattern, A. Voss, J. Acker, V. Hoffmann, K. Wetzig, H.-J. Engelmann, E. Zschech, H. Heuer, C. Wenzel: Influence of nitrogen content on the crystallization behavior of thin Ta–Si–N diffusion barriers, Thin Solid Films 468 (2004), S. 183-192 URL

R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, C. Wenger, H.-J. Engelmann, C. Wenzel, E. Zschech: Degradation mechanisms of Ta and Ta-Si diffusion barriers during thermal stressing, Thin Solid Films 458 (2004) Nr. 1-2, S. 237-245 URL

R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, H.-J. Engelmann, E. Zschech: Comparison of the annealing behavior of thin Ta films deposited onto Si and SiO2 substrates, Analytical and Bioanalytical Chemistry 379 (2004) Nr. 4, S. 568-575 URL

2003

J. Angeli, A. Bengtson, A. Bogaerts, V. Hoffmann, V.-D. Hodoroaba, E. Steers: Glow discharge optical emission spectrometry: moving towards reliable thin film analysis- a short review, Journal of Analytical Atomic Spectrometry 18 (2003) Nr. 6, S. 670-679 URL

S. Groudeva-Zotova, D. Elefant, R. Kaltofen, D. Tietjen, J. Thomas, V. Hoffmann, C.M. Schneider: Magnetic and structural characteristics of exchange biasing systems based on NiMn antiferromagnetic films, Journal of Magnetism and Magnetic Materials 263 (2003) Nr. 1-2, S. 57-71 URL

V.-D. Hodoroaba, E.B.M. Steers, V. Hoffmann, W.E.S. Unger, W. Paatsch, K. Wetzig: Influence of hydrogen on the analytical figures of merit of glow discharge optical emission spectroscopy- friend or foe?, Journal of Analytical Atomic Spectrometry 18 (2003) Nr. 6, S. 521-526 URL

V. Hoffmann, R. Dorka, L. Wilken, V.D. Hodoroaba, K. Wetzig: Present possibilities of thin-layer analysis by GDOES, Surface and Interface Analysis 35 (2003) Nr. 7, S. 575-582

R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, C. Wenger, H.-J. Engelmann, C. Wenzel, E. Zschech, J.W. Bartha: Structure and thermal stability of graded Ta-TaN diffusion barriers between Cu and SiO2, Thin Solid Films 437 (2003), S. 248-256 URL

L. Wilken, V. Hoffmann, K. Wetzig: In situ depth measurements for GD-OES, Journal of Analytical Atomic Spectrometry 18 (2003) Nr. 9, S. 1133-1140 URL

L. Wilken, V. Hoffmann, K. Wetzig: Erosion rate measurements for GD-OES, Journal of Analytical Atomic Spectrometry 18 (2003) Nr. 9, S. 1141-1145 URL

L. Wilken, V. Hoffmann, H.-J. Uhlemann, H. Siegel, K. Wetzig: Development of a radio-frequency glow discharge source with integrated voltage and current probes, Journal of Analytical Atomic Spectrometry 18 (2003) Nr. 6, S. 646-655 URL

2002

C. Beyer, I. Feldmann, D. Gilmour, V. Hoffmann, N. Jakubowski: Development and analytical characterization of a Grimm-type glow discharge ion source operated with high gas flow rates and coupled to a mass spectrometer with high mass resolution, Spectrochimica acta part B 57 (2002) Nr. 10, S. 1521-1533 URL

A. Bogaerts, L. Wilken, V. Hoffmann, R. Gijbels, K. Wetzig: Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry, Spectrochimica Acta Part B 57 (2002 ) Nr. 1, S. 109-119 URL

M. Hecker, R. Huebner, R. Ecke, S. Schulz, H.J. Engelmann, H. Stegmann, V. Hoffmann, N. Mattern, T. Gessner, E. Zschech: Effect of annealing on the microstructure of ultrathin tungsten nitride diffusion barriers for copper metallization, Microelectronic Engineering 64 (2002) Nr. 1-4, S. 269-277 URL

M. Hecker, D. Fischer, V. Hoffmann, H.-J. Engelmann, A. Voss, N. Mattern, C. Wenzel, C. Vogt, E. Zschech: Influence of N content on microstructure and thermal stability of Ta-N thin films for Cu interconnection, Thin Solid Films 414 (2002) Nr. 2, S. 184-191 URL

Y.-S. Kim, V. Hoffmann, D. Schiel: Determination of residual carbon and nitrogen on glow discharge lamp for optical emission spectrometry, Bulletin of the Korean Chemical Society 23 (2002) Nr. 3, S. 525-527

2001

A. Bogaerts, L. Wilken, V. Hoffmann, R. Gijbels, K. Wetzig: Comparison of modeling calculations with experimental results for direct current glow discharge optical emission spectrometry, Spectrochimica Acta Part B 56 (2001) Nr. 5, S. 551-564 URL

V.-D. Hodoroaba, E.B.M. Steers, V. Hoffmann, K. Wetzig: The effect of small quantities of hydrogen on a glow discharge in neon. Comparison with the argon case, Journal of Analytical and Atomic Spectrometry 16 (2001) Nr. 1, S. 43-49 URL

D.-V. Hodoroaba, W.E.S. Unger, H. Jenett, V. Hoffmann, B. Hagenhoff, S. Kayser, K. Wetzig: Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS, Applied Surface Science 179 (2001) Nr. 1-4, S. 30-37 URL

R. Kurt, A. Karimi, V. Hoffmann: Growth of decorated carbon nano-tubes, Chemical Physics Letters 335 (2001) Nr. 5-6, S. 545-552 URL

A. Plotnikov, C. Vogt, V. Hoffmann, C. Taeschner, K. Wetzig: Application of laser ablation inductively coupled plasma quadrupole mass spectrometry (LA-ICP-QMS) for depth profile analysis, Journal of Analytical Atomic Spectrometry 16 (2001) Nr. 11, S. 1290-1295 URL

Ch. Taeschner, B. Ljungberg, V. Hoffmann, C. Vogt, A. Leonhardt: Deposition of TiN, TiC and Ti1-xAlxN coatings by pulsed d.c. plasma enhanced chemical vapour deposition methods, Surface and Coatings Technology 142-144 (2001), S. 823-828 URL

2000

R. Dorka, R. Kunze, V. Hoffmann: Investigation of SiO2 layers by glow discharge optical emission spectroscopy including layer thickness determination by an optical interference effect, Journal of Analytical Atomic Spectrometry 15 (2000) Nr. 7, S. 873-876 URL

V.-D. Hodoroaba, V. Hoffmann, E.B.M. Steers, K. Wetzig: Investigations of the effect of hydrogen in an argon glow discharge, Journal of Analytical and Atomic Spectrometry 15 (2000) Nr. 9, S. 1075-1080 URL

V.-D. Hodoroaba, V. Hoffmann, E.B.M. Steers, K. Wetzig: Emission spectra of copper and argon in an argon glow discharge containing small quantities of hydrogen, Journal of Analytical and Atomic Spectrometry 15 (2000) Nr. 8, S. 951-958 URL

1999

G. Blumenthal, W. Schneider, W. Plieth, S. Baunack, V. Hoffmann: Chromatierungen auf Zinkschichten, Metalloberflaeche 53 (1999) Nr. 10, S. 10-17

V. Hoffmann, R. Kurt, K. Kaemmer, R. Thielsch, T. Wirth: Interference phenomena at transparent layers in glow discharge optical emission spectrometry, Applied Spectroscopy 53 (1999) Nr. 8, S. 987-990

R. Kurt, V. Hoffmann, R. Reiche, W. Pitschke, K. Wetzig: Chemical analysis of thin films by means of SS-MS, GD-OES, and XPS demonstrated at Ir-Si thermoelectrica, Fresenius Journal of Analytical Chemistry 363 (1999) Nr. 2, S. 179-184

A. Moebius, C. Frenzel, R. Thielsch, R. Rosenbaum, C.J. Adkins, M. Schreiber, H.-D. Bauer, R. Groetzschel, V. Hoffmann, T. Krieg, N. Matz, H. Vinzelberg, M. Witcomb: Metal-insulator transition in amorphous Si1-xNix: Evidence for Mott's minimum metallic conductivity, Physical Review B 60 (1999) Nr. 20, S. 14209-14223 URL

1998

V. Hoffmann, F. Praessler, K. Wetzig: Optische Emissionsspektrometrie in der Werkstoffanalytik, Nachrichten aus Chemie, Technik und Laboratorium 46 (1998) Nr. 5, S. 535-538

1997

K. Wetzig, S. Baunack, V. Hoffmann, S. Oswald, F. Praessler: Quantitative depth profiling of thin layers, Fresenius Journal of Analytical Chemistry 358 (1997) Nr. 1-2, S. 25-31 URL

1996

U. Beck, G. Reiners, T. Wirth, V. Hoffmann, F. Praessler: Multilayer reference coatings for depth profile standards, Thin Solid Films 291 (1996) Nr. Dez., S. 57-62 URL

V. Hoffmann, H.-J. Uhlemann, F. Praessler, K. Wetzig, D. Birus: New hardware for radio frequency powered glow discharge spectroscopies and its capabilities for analytical applications, Fresenius Journal of Analytical Chemistry 355 (1996) Nr. 7-8, S. 826-830 URL

F. Praessler, V. Hoffmann, J. Schumann, K. Wetzig: Quantitative depth profiling in glow discharge spectroscopies - A new deconvolution technique to separate effects of an uneven erosion crater shape, Fresenius Journal of Analytical Chemistry 355 (1996) Nr. 7-8, S. 840-846 URL

Contributions to collected editions/proceedings

2015

D. Eigel, P.-F. Gostin, A. Eychmueller, A. Gebert, V. Hoffmann: Oberflaechenmodifizierung von Ti-Nb-Legierungen durch Plasma-Elektrolyse-Oxidation fuer biokompatible Anwendungen, Kongress des Zentralverbands fuer Oberflaechentechnik (ZVO), Berlin/ Germany, 23.-24.9.15 (2015)

2011

V. Hoffmann, A. Quentmeier: Glow discharge optical emission spectroscopy (GD-OES), in: Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications. G. Friedbacher, H. Bubert (eds.), 2. compl. rev. and enl. Ed. 2011, Weinheim: Wiley-VCH, 534 S., 329-342 (2011)

V. Hoffmann, D. Klemm, V. Efimova, C. Venzago, A.A. Rockett, T. Wirth, T. Nunney, C.A. Kaufmann, R. Caballo: Elemental distribution profiling of thin films for solar cells, in: Advanced Characterization Techniques for Thin Film Solar Cells, Daniel Abou-Ras, Thomas Kirchartz, Uwe Rau (eds.) Weinheim: Wiley-VCH, 2011, Capter 16, 411-448 (2011)

2008

C. Edelmann, D. Klemm, V. Hoffmann: Evaluierung der Abpumpkurven einer Glimmentladungsquelle: Qualitaetskontrolle von Spektralanalysen, in: Transfer. Das Steinbeis Magazin, 9 (2008)

M. Stangl, M. Liptak, V. Hoffmann, K. Wetzig, J. Acker: Thermoelektrische Schaedigungsmechanismen an elektrochemisch abgeschiedenen Kupfer-Damaszen-Leitbahnen, in: Jahrbuch Oberflaechentechnik; Richard Suchentrunk (ed.) ; Leuze-Verl.; 2008, 64, 287-292 (2008)

M. Stangl, J. Acker, V. Hoffmann, K. Wetzig, U. Kuenzelmann, J.W. Bartha: Application of the copper damascene process for the preparation of electromigration test structures, in: Proceedings, ICPT, Berlin: VDE-Verl., 2008, 331-335 (2008)

2005

M. Hecker, R. Huebner, J. Acker, V. Hoffmann, N. Mattern, R. Ecke, S.E. Schulz, H. Heuer, C. Wenzel, H.-J. Engelmann, E. Zschech: Advanced barriers for copper interconnects, in: Materials for Information Technology: Devices, Interconnects and Packaging, London, Springer-Verl., 2005, 283-295 (2005)

2004

N. Jakubowski, A. Bogaerts, V. Hoffmann: Analytical glow discharges, in: Atomic Spectroscopy in Elemental Analysis, Blackwell Publishing CRC Press, Michael Cullen (Ed.), 91-156 (2004)

M. Stangl, J. Acker, A. Henssge, W. Gruner, V. Hoffmann, H. Wendrock, K. Wetzig: Untersuchungen zum Einbau von Additiven in elektrochemisch abgeschiedenen Kupferschichten, in: Tagungsband "Oberflaechentage 2004" mit 42. Jahrestagung der Deutschen Gesellschaft fuer Galvano- und Oberflaechentechnik e.V., Dresden, 22.-24.9.04, 185-187 (2004)

2002

S. Faehler, U. Hannemann, V. Neu, V. Hoffmann, B. Holzapfel, L. Schultz: Highly coercive, textured NdFeB films by pulsed laser deposition, XVIIth International Workshop on Rare-Earth Magnets and their Applications, Newark,Delaware/USA, 18.-22.8.02, in: Proceedings, G.C. Hadjipanayis and M.J.Bonder (ed.), Rinton Press, Princeton, 449-456 (2002)

M. Hecker, N. Mattern, V. Hoffmann, C. Wenzel, J. Bartha, H.-J. Engelmann, E. Zschech: Microstructure and degradation mechanisms of Ta based diffusion barriers for copper interconnects, Advanced Metallization Conference 2001 (AMC 2001), Montreal/Canada, 8.-11.10.01, in: Materials Research Society Conference Proceedings, 597-601 (2002)

2001

S. Daebritz, V. Hoffmann, G. Sadowski, D. Bergner: Investigations of phase growth in the copper-tin system, in: Defect and Diffusion Forum, Sitec Publications, Switzerland, 194-199, 1575-1580 (2001)

2000

V. Hoffmann, R. Dorka, L. Wilken, K. Wetzig: New developments in glow discharge optical emission and mass spectrometry, 8th Symposium on Laser Spectroscopy, Kaeri/Korea, 3.-4.11.00 , in: Proceedings of the 8th Symposium on Laser Spectroscopy, 8/3, 78-82 (2000)

1999

A. Moebius, C. Frenzel, R. Thielsch, R. Rosenbaum, C.J. Adkins, M. Schreiber, H.-D. Bauer, R. Groetzschel, V. Hoffmann, T. Krieg, N. Matz, H. Vinzelberg, M. Witcomb: The metal-insulator transition in amorphous Si1-xNix: So, was Mott right after all?, 24th International Conference on the Physics of Semiconductors, Jerusalem/Israel, 2.-7.8.98, in: Proceedings, World Scientific, Singapore , CDII.D.4 (1999)

1997

S. Daebritz, D. Bergner, V. Hoffmann: Phase growth between copper and different tin solders, DIMAT-96, International Conference on Diffusion in Materials, Nordkirchen, 5.-9.8.96, in: Defect and Diffusion Forum, 143-147, 579-584 (1997)

V. Hoffmann, H. Mai: Compacted powders, in: Glow Discharge Optical Emission Spectrometry, John Wiley & Sons, New York, 551-562 (1997)

Invited talks

2016

V. Hoffmann: Advances in glow discharge spectrochemistry, Winter Conference on Plasma Spectrochemistry (EWCPS) 2016, Tucson/ USA, 8.-16.1.16 (2016)

V. Hoffmann: Analyse von Wasserstoff, Kohlenstoff und Sauerstoff mit der optischen Glimmentladungs-Spektrometrie, 25. ICP-MS Anwendertreffen und 12. Symposium Massenspektrometrische Verfahren der Elementspurenanalyse, Siegen/ Germany, 12.-15.9.16 (2016)

2015

V. Hoffmann, E. Steers, S. Mushtaq, J. Pickering, C. Gonzalez Gago, P. Smid, T. Hofmann, C. Venzago, W. Gruner: Measurement of Oxygen in Solid Samples using Analytical Glow Discharges with Optical and Mass Spectrometric Detection, SciX 2015, Rhode Island/ USA, 27.9.-2.10.15 (2015)

2014

V. Hoffmann: Advances in glow discharge spectrochemistry, 2014 Winter Conference on Plasma Spectrochemistry, Amelia Island, Florida/ USA, 6.-11.1.14 (2014)

2013

V. Hoffmann: Plasma diagnostics on analytical glow discharges, International Workshop "Diagnostic Systems for Plasma Processes" Lichtenwalde, Chemnitz, 24.9.13 (2013)

V. Hoffmann: Progress and demands in analytical glow discharges, Colloquium Spectroscopicum Internationale XXXVIII, Tromsoe/ Norwegen, 17.-20.6.13 (2013)

2012

V. Hoffmann, M. Voronov, T. Wallendorf, S. Marke, G.M. Hieftje, S. Ray, C. Engelhard, W. Buscher: Spatial- and time-resolved measurements by means of a new acousto-optical imaging spectrometer in combination with glow discharge sources, 2012 Winter Conference on Plasma Spectrochemistry, Tucson/ Arizona, 9.-14.1.12 (2012)

M. Voronov, V. Hoffmann, T. Steingrobe, W. Buscher, C. Engelhard, A. Storey, S. Ray, G. Hieftje: Thermal mechanism of prepeak formation in pulsed glow discharge, 65th Annual Gaseous Electronics Conference, Austin, Texas/ USA, 22.-26.10.12 (2012)

2010

V. Hoffmann: New instrumentation for RF-GD-OES, International Glow Discharge Spectroscopy Symposium, CUFR Jean Francois Champollion, Albi/ Frankreich, 22.-27.8.10 (2010)

V. Hoffmann: GDOES-Analyse ultraduenner Schichten mit verbesserter Hardware, Wissenschaftliches Kolloquium des Institutes fuer Werkstoffkunde der TU Darmstadt, 1.7.10 (2010)

D. Klemm, R. Taranczewski, V. Hoffmann, U. Kuehn, J. Eckert: 3D Laserstrahlschmelzen – Technologie fuer die generative Fertigung und Anwendung in der Materialforschung, Institutsseminar vom Fraunhofer Institut fuer Werkstoff- und Strahltechnik, Dresden, 26.4.10 (2010)

2009

V. Hoffmann: Neue Entwicklungen in der analytischen Glimmentladungsspektrometrie, Institutsseminar, FH Senftenberg, 19.5.09 (2009)

V. Hoffmann, V. Efimova, D. Klemm, M. Voronov, J. Eckert: Gepulste Glimmentladungen - von den Grundlagen zu den Anwendungen, 15. Tagung Festkoerperanalytik, Chemnitz, 12.-16.7.09 (2009)

2008

J. Acker, S. Buecker, V. Hoffmann: Flammen-Molekuelabsorptionsspektrometrie zweiatomiger Molekuele - Zum Mechanismus der Bildung von AlF in der Acetylen-Lachgas-Flamme, 2nd International Symposium on CSAAS, Berlin, 7.-8.10.08 (2008)

V. Hoffmann, V. Efimova, M. Voronov, P. Smid, E. Steers, J. Eckert: Measurement of voltage and current in continuous and pulsed rf and dc glow discharges, 24th SPIG, Novi Sad/ Serbien, 25.-29.8.08 (2008)

V. Hoffmann: RF and pulsed glow discharges,and crater formation in glow discharges, FA CSS 2008, Reno/ USA, 28.9.-2.10.08 (2008)

V. Hoffmann, D. Klemm, K. Wetzig: Progress at thin film analysis by glow discharge spectrometry, Nordic Conference on Plasma Spectrochemistry, Loen/ Norwegen, 15.-18.6.08 (2008)

V. Hoffmann, V. Efimova, D. Klemm, M. Voronov, J. Eckert: Pulsed glow discharges – from fundamentals to applications, 2008 Third Asia Pacific Winter Conference, Tsukuba/ Japan, 16.-21.11.08 (2008)

D. Klemm, V. Hoffmann: GD-OES Analysen duenner und duennster Schichten (Praxisseminar), Workshop der TAZ GmbH, Eurasburg, 13.-14.10.08 (2008)

E. Steers, P. Smid, V. Hoffmann: Effects of traces of molecular gases (hydrogen, nitrogen) in glow discharges in noble gases, 24th SPIG, Novi Sad/ Serbien, 25.-29.8.08 (2008)

2007

S. Hampel, D. Kunze, D. Haase, K. Kraemer, A. Leonhardt, M. Ritschel, J. Thomas, S. Oswald, V. Hoffmann, B. Buechner: Drugfilled multiwalled carbon nanotubes – a nanosized drug carrier system, Carbio-Meeting, Dresden, 11.-14.12.07 (2007)

V. Hoffmann: Development and application of mass spectrometry for current solid state and materials research, Europaeische Plasma Winterkonferenz, Taormina/ Italien, 18.2.07 (2007)

2006

V. Hoffmann, D. Klemm, K. Wetzig: Analysis of light elements by glow discharge optical emission spectrometry, Second Asia-Pacific Winter Conference on Plasma Spectrochemistry, Bangkok/ Thailand, 27.11.-2.12.06 (2006)

V. Hoffmann, T. Gemming, N. Mattern: Neue Entwicklungen zur Festkoerper- und Strukturanalytik im IFW Dresden, EFDS Fachausschuss "Prozesssicherheit und Produktqualitaet" am 25.4.06 (2006)

V. Hoffmann: Charakterisierung von duennen Schichten mit Hilfe der Atomspektrometrie mit Glimmentladungen, Vortragsreihe: Materialcharakterisierung mit modernen Methoden der physikalischen und chemischen Analyse, Universitaet Hamburg, 28.6.06 (2006)

V. Hoffmann: Glimmentladungs-Spektroskopie, Surface Engineering und Nanotechnologie (SENT 2006-3), Dresden, 5.12.06 (2006)

D. Klemm, V. Hoffmann, M. Uhlemann, G. Pietzsch, K. Wetzig: GD-OES-Duennschichtanalytik in wenigen Minuten?!, Internationale Fachmesse fuer Vakuumtechnik und Vakuumanwendungen, Magdeburg, 26.9.06 (2006)

2005

V. Hoffmann, L. Wilken, K. Wetzig: Development and application of glow discharge spectroscopy at IFW Dresden, Asia-Pacific Conference on Plasmon-Spectrochemistry, Chiang Mai/ Thailand, 25.-30.4.05 (2005)

V. Hoffmann: Neue Entwicklungen der GD-OES, Symposium "Glimmentladungsspektroskopie- eine moderne Methode der Schicht- und Materialanalytik", TU Ilmenau, 2.3.05 (2005)

V. Hoffmann: Neue Entwicklungen auf dem Gebiet der analytischen Glimmentladung, CANAS 2005, Freiberg, 6.-10.3.05 (2005)

V. Hoffmann: Tiefenprofilmessungen an duennen Schichten mittels optischer Glimmentladungs-Spektrometrie, Industrie-Fach-Messe 2005 und 5. Dresdner Materialforschungstag, 11.11.05 (2005)

V. Hoffmann: GD-OES und GD-MS - geben und nehmen, Fachseminar Glimmentladungs-Massenspektrometie, Hanau, 1.12.05 (2005)

M. Stangl, J. Acker, V. Hoffmann, V. Dittel, W. Gruner, K. Wetzig: Influence of organic impurities on the self-annealing process of electroplated Cu, 13. Tagung Festkoerperanalytik, Chemnitz, 27.6.05 (2005)

2004

V. Hoffmann: RF-GD-OES: where we are and where we like to be, Expert Meeting on Glow Discharge, Yokohama/Japan, 3.-7.4.04 (2004)

V. Hoffmann: Oberflaechenanalytik, Industrielle Weiterbildung "Surface Engineering und Nanotechnologie", Dresden, 25.-27.5.04 (2004)

V. Hoffmann: Nutzung der GDOS zur Charakterisierung von Oberflaechen und Schichten, Vortrag am FhG-IWS, Dresden, 10.5.04 (2004)

2003

V. Hoffmann: Modern developments in glow discharge spectrometry and their application in material science, European Winter Conference on Plasma Spectrochemistry, Garmisch-Partenkirchen, 12.-17.1.03 (2003)

2002

V. Hoffmann: Present possibilities of run layer analysis by GDS, International Symposium on "GDOES for Surface Analysis", Kero University, Yokohama/Japan, 19.-21.11.02 (2002)

V. Hoffmann, R. Dorka, L. Wilken, K. Wetzig, V.-D. Hodoroaba: Tiefenprofilanalytik mittels Glimmentladungsspektrometrie von nichtleitenden Schichtsystemen, 12. AOFA, Kaiserlautern, 15.-19.9.02 (2002)

V. Neu, U. Hannemann, S. Faehler, V. Hoffmann, B. Holzapfel, L. Schultz: Pulsed laser deposition of hard magnetic SmCo and NdFeB films, MARTECH Seminar, Florida State University, Tallahassee/USA, 12.8.02 (2002)

2001

V. Hoffmann: Developments in GD-OES and -MS at IFW, Institutsseminar der Fakultaet Chemie der Universitaet Bloomington/USA, 11.9.01 (2001)

V. Hoffmann: Grundlagen und Anwendungen der RF-GD-OES, Seminar "Praktische Glimmentladungsspektrometrie", Herrsching, 25.-26.6.01 (2001)

V. Hoffmann, R. Dorka, L. Wilken, K. Wetzig: Constructional developments for analytical spectrometry with RF glow discharges, FACSS 2001, Detroit/USA, 7.-12.10.01 (2001)

2000

W. Gruner, V. Hoffmann, A. Berger: Aktuelle Probleme bei der Bestimmung von C,O, N und H, Analytica Conference 2000, Muenchen, 11.-14.4.00 (2000)

V. Hoffmann: Developments in glow discharge optical and mass spectrometry and applications in materials science, 9th Solid Sampling Spectrometry Colloquium, Merseburg, 11.-15.9.00 (2000)

V. Hoffmann: New developments in glow discharge optical and mass spectrometry, 6. International Symposium on Advanced Analytical techniques and Applications, Masan/Korea, 6.-7.11.00 (2000)

V. Hoffmann: Bulk- und Schichtanalyse mittels Glimmentladungsspektrometrie, Workshop Bewertung und Charakterisierung technischer Oberflaechen fuer die verarbeitende Industrie, Bergisch-Gladbach, 11.5.00 (2000)

L. Wilken, V. Hoffmann, K. Wetzig: Verbesserte elektrische Signale in der RF-GD-OES, 7. Deutsches Anwendertreffen "Analytische Glimmentladungsspektrometrie", Dresden, 17.-18.10.00 (2000)

1999

V. Hoffmann: Basics of glow discharge measurements - New potentialities for analytical applications, GD-OES-Seminar "Principles - Applications in Materials Research", Mol/Belgien, 5.11.99 (1999)

1998

V. Hoffmann: Einsatz der Glimmentladung in der Werkstofforschung des IFW Dresden, Workshop "Praxis der Glimmentladungsspektrometrie", Muenchen, 10.-11.9.98 (1998)

V. Hoffmann: Einsatz der Glimmentladung in der Werkstofforschung des IFW Dresden, Workshop "Analyse von Schichten mittels Glimmentladung" in der EMPA, Thun/Schweiz, 16.9.98 (1998)

1997

V. Hoffmann, F. Praessler, K. Wetzig: 30 Jahre GRIMMsche Glimmentladungsquelle - Untersuchung der Entladungsparameter, CANAS'97, Freiberg, 10.-14.3.97 (1997)

V. Hoffmann: Qualitative und quantitative Werkstoffanalytik mit der GD-OES, Seminar der Physikalisch-Technischen Bundesanstalt Braunschweig, 12.12.1997 (1997)

1996

V. Hoffmann, H.-J. Uhlemann, F. Praessler, K. Wetzig, D. Birus: Nouvelle configuration pour une lampe à décharge luminescente sous radio fréquence. Possibilité analytiques, 2. Forum LABO, Paris/Frankreich, 1.-5.4.96 (1996)

Monographs

2016

V. Hoffmann, A. Bengtson, M. Kasik, K. Marshall: Analytical Glow Discharges: Fundamentals, Applications and New Developments in: Encyclopedia of Analytical Chemistry, John Wiley and sons Ltd, 2016, 76 S.