Spectrometric Solid State Analysis

Group leader

Dr. rer. nat. Volker Hoffmann                              
Postanschrift:
Dr. Volker Hoffmann
Leibniz-IFW-Dresden, Helmholtzstr. 20
01069 Dresden

Telefon: +49 351 4659 691
Fax: +49 351 4659 452
email: v.hoffmann(at)ifw-dresden.de

The research group “Spectroscopic solid state analysis" studies the field of analytical glow discharge and performs elemental analysis of solid samples.

Former projects:

  • European Thematic Network on Glow Discharge Spectroscopy for Spectrochemical analysis (1999-2002)
  • European research project Marie Curie RTN Analytical Glow Discharge Network GLADNET. For more details please see the website: www.gladnet.net (01.02.2007 – 31.01.2011)
  • ZIM project “Sensorik und Technologie zur Probenpräparation mit Glimmentladung” KF2466403AB0 (01.02.2011 - 28.02.2013)
  • NIMESA project: „Novel Instrumentation for Modern Elemental Speciation Analysis“ together with NSF/DFG Projekt of group of Gary Hieftje in Bloomington, Indiana und  group of Wolfgang Buscher in Münster, Germany

Current Projects:

  • European project SIB09-REG2 “Research in Glow discharge spectrometry & non-metal determination” which belongs to the SIB09 ELEMENTS “Primary standards for challenging elements”
  • DFG-Project HO 2062/9-1 „Entwicklung eines Simulationsmodells für neuartige Plasma-Anregungsquellen zur analytischen Nutzung in der Atomspektrometrie – SIMONA“


Main research topics

 

Publications

Journal Papers

2020 - R. Schmidt, A. Gebert, M. Schumacher, V. Hoffmann, A. Voss, S. Pilz, M. Uhlemann, A. Lode, M. Gelinsky
Electrodeposition of Sr-substituted hydroxyapatite on low modulus beta-type Ti-45Nb and effect on in vitro Sr release and cell response
Materials Science and Engineering C | Volume: 108 | P. 110425/1-12 | URL

2020 - J. Vishnu, M. Calin, S. Pilz, A. Gebert, B. Kaczmarek, M. Michalska-Sionkowska, V. Hoffmann, G. Manivasagam
Superhydrophilic nanostructured surfaces of beta Ti-29Nb alloy for cardiovascular stent applications
Surface and Coatings Technology | Volume: 396 | P. 125965/1-7 | URL

2019 - T. Kodalle, D. Greiner, V. Brackmann, K. Prietzel, A. Scheu, T. Bertram, P. Reyes-Figueroa, T. Unold, D. Abou-Ras, R. Schlatmann, C.A. Kaufmann, V. Hoffmann
Glow discharge optical emission spectrometry for quantitative depth profiling of CIGS thin-films
Journal of Analytical Atomic Spectrometry | Volume: 34 | Issue: 6 | P. 1233-1241 | URL

2019 - C. Gonzalez Gago, P. Smid, T. Hofmann, C. Venzago, V. Hoffmann, C. Gruner, J. Pfeifer, S. Richter, H. Kipphardt
Investigations of matrix independent calibration approaches in fast flow glow discharge mass spectrometry
Journal of Analytical Atomic Spectrometry | Volume: 34 | Issue: 6 | P. 1109-1125 | URL

2019 - M. Fernández-Barcia, S. Kurdi, A. Terzopoulou, Z.H. Barber, V. Hoffmann, C. Damm, L. Giebeler, S. Pané, M. Uhlemann, U. Wolff, K. Nielsch, A. Gebert
Comparative study of the sustainable preparation of FeMn thin films via electrodeposition and magnetron co-sputtering
Surface and Coatings Technology | Volume: 375 | P. 182-196 | URL

2019 - Z. Weiss, J.C. Pickering, V. Hoffmann
Sixty years of spectroscopic research: a tribute to Professor Edward B. M. Steers
Chemical Papers | Volume: 73 | Issue: 12 | P. 2891–2896 | URL

2019 - E. Brachmann, M. Seifert, N. Neumann, N. Alshwawreh, M. Uhlemann, S.B. Menzel, J. Acker, S. Herold, V. Hoffmann, T. Gemming
Electroless-Deposited Platinum Antennas for Wireless Surface AcousticWave Sensors
Materials | Volume: 12 | Issue: 7 | P. 1002/1-13 | URL

2018 - M. Voronov, V. Hoffmann
Application of microsecond pulsed glow discharge to modern commercially available optical emission spectrometers for bulk elemental analysis
Journal of Analytical Atomic Spectrometry | Volume: 33 | Issue: 4 | P. 663-669

2018 - Z. Weiss, J.C. Pickering, V. Hoffmann
Obituary Prof. Edward B. M. Steers (1931-2018)
Spectrochimica Acta Part B: Atomic Spectroscopy | Volume: 149 | P. 241-242 | URL

2018 - A. Mulone, A. Nicolenco, V. Hoffmann, U. Klement, N. Tsyntsaru, H. Cesiulis
In-depth characterization of as-deposited and annealed Fe-W coatings electrodeposited from glycolate-citrate plating bath
Electrochimica Acta | Volume: 261 | P. 167-177 | URL

2018 - J. Sablowski, J. Linnemann, S. Hempel, V. Hoffmann, S. Unz, M. Beckmann, L. Giebeler
Electrodeposited metal-organic framework films as self-assembled hierarchically superstructured supports for stable omniphobic surface coatings
Scientific Reports | Volume: 8 | P. 15400/1-11 | URL

2018 - M. Fernandez-Barcia, V. Hoffmann, S. Oswald, L. Giebeler, U. Wolff, M. Uhlemann, A. Gebert
Electrodeposition of manganese layers from sustainable sulfate based electrolytes
Surface and Coatings Technology | Volume: 334 | P. 261-268 | URL

2017 - M. Voronov, V. Hoffmann, W. Buscher, C. Engelhard
Computational model of inductively coupled plasma sources in comparison to experimental data for different torch designs and plasma conditions. Part II: theoretical model
Journal of Analytical Atomic Spectrometry | Volume: 32 | Issue: 1 | P. 181-192 | URL

2017 - A. Gubal, A. Ganeev, V. Hoffmann, M. Voronov, V. Brackmann, S. Oswald
Combined hollow cathode vs. Grimm cell: semiconductive and nonconductive samples
Journal of Analytical Atomic Spectrometry | Volume: 32 | Issue: 2 | P. 354-366 | URL

2017 - M. Voronov, V. Hoffmann, C. Engelhard, W. Buscher
Computational model of inductively coupled plasma sources in comparison to experimental data for different torch designs and plasma conditions. Part I: experimental study
Journal of Analytical Atomic Sectrometry | Volume: 32 | Issue: 1 | P. 167-180 | URL

2017 - A.P. Storey, S.J. Ray, V. Hoffmann, M. Voronov, C. Engelhard, W. Buscher, G.M. Hieftje
Wavelength Scanning with a Tilting Interference Filter for Glow-Discharge Elemental Imaging
Applied Spectroscopy | Volume: 71 | Issue: 6 | P. 1280-1288 | URL

2016 - J. Acker, S. Buecker, V. Hoffmann
Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C2H2/N2O flame
Journal of Analytical Atomic Spectrometry | Volume: 31 | Issue: 4 | P. 902-911 | URL

2016 - R. Schmidt, V. Hoffmann, A. Helth, P.F. Gostin, M. Calin, J. Eckert, A. Gebert
Electrochemical deposition of hydroxyapatite on beta-Ti-40Nb
Surface and Coatings Technology | Volume: 294 | P. 186-193

2016 - Z. Weiss, E.B.M. Steers, S. Mushtaq, V. Hoffmann, J.C. Pickering
The use of radiative transition rates to study the changes in the excitation of Cu ions in a Ne glow discharge caused by small additions of H2, O2 and N2
Spectrochimica Acta Part B: Atomic Spectroscopy | Volume: 118 | P. 81-89 | URL

2016 - S. Mushtaq, E.B.M. Steers, V. Hoffmann, Z. Weiss, J.C. Pickering
Evidence for charge transfer from hydrogen molecular ions to copper atoms in a neon-hydrogen analytical glow discharge
Journal of Analytical Atomic Spectrometry | Volume: 31 | Issue: 11 | P. 2175-2181

2016 - A. Gebert, D. Eigel, P.F. Gostin, V. Hoffmann, M. Uhlemann, A. Helth, S. Pilz, R. Schmidt, M. Calin, M. Goettlicher, M. Rohnke, J. Janek
Oxidation treatments of beta-type Ti-40Nb for biomedical use
Surface and Coatings Technology | Volume: 302 | P. 88-99

2016 - A.P. Storey, S.J. Ray, V. Hoffmann, M. Voronov, C. Engelhard, W. Buscher, G.M. Hieftje
Emergence and consequences of lateral sample heterogeneity in glow discharge spectrometry
Spectrochimica Acta Part B | Volume: 126 | P. 37-43

2016 - S. Mushtaq, E.B.M. Steers, G. Churchill, D. Barnhart, V. Hoffmann, J.C. Pickering, K. Putyera
Does asymmetric charge transfer play an important role as an ionization mode in low power-low pressure glow discharge mass spectrometry?
Spectrochimica Acta Part B: Atomic Spectroscopy | Volume: 118 | P. 56-61 | URL

2016 - C. Schubert, V. Hoffmann, A. Kuemmel, J. Sinn, M. Haertel, A. Reuther, M. Thomalla, T. Gemming, J. Eckert, C. Leyense
Compositional depth profiling of diamond-like carbon layers by glow discharge optical emission spectroscopy
Journal of Analytical Atomic Spectrometry | Volume: 31 | P. 2207-2212

2015 - M. Voronov, V. Hoffmann, D. Birus, C. Engelhard, W. Buscher
Investigation of the electrical properties of standard and low-gas-flow ICPs using novel probes for the direct measurements of RF voltage and current in the load coil and the corresponding calculation of the ICP power
Journal of Analytical Atomic Spectrometry | Volume: 30 | Issue: 10 | P. 2089-2098 | URL

2015 - G. Yin, V. Brackmann, V. Hoffmann, M. Schmid
Enhanced performance of ultra-thin Cu(In,Ga)Se2 solar cells deposited at low process temperature
Solar Energy Materials and Solar Cells | Volume: 132 | P. 142-147 | URL

2014 - C. Gonzalez-Gago, P. Smid, T. Hofmann, C. Venzago, V. Hoffmann, W. Gruner
The use of matrix-specific calibrations for oxygen in analytical glow discharge spectrometry
Analytical and Bioanalytical Chemistry | Volume: 406 | P. 7473-7482 | URL

2014 - M. Voronov, V. Hoffmann, T. Steingrobe, W. Buscher, C. Engelhard, A.P. Storey, S.J. Ray, G.M. Hieftje
Spot patterns and instabilities in a pulsed low-pressure rf glow discharge
Plasma Sources Science and Technology | Volume: 23 | Issue: 5 | P. 054009/1-5 | URL

2014 - A. Undisz, R. Hanke, K.E. Freiberg, V. Hoffmann, M. Rettenmayr
The effect of heating rate on the surface chemistry of NiTi
Acta Biomaterialia | Volume: 10 | P. 4919-4923 | URL

2014 - V. Brackmann, V. Hoffmann, A. Kauffmann, A. Helth, J. Thomas, H. Wendrock, J. Freudenberger, T. Gemming, J. Eckert
Glow discharge plasma as a surface preparation tool for microstructure investigations
Materials Characterization | Volume: 91 | P. 76-88 | URL

2014 - Z. Weiss, E.B.M. Steers, J.C. Pickering, V. Hoffmann, S. Mushtaq
Excitation of higher levels of singly charged copper ions in argon and neon glow discharges
Journal of Analytical Atomic Spectrometry | Volume: 29 | Issue: 12 | P. 2256-2261 | URL

2014 - M. Voronov, V. Hoffmann
Factors affecting the formation of the radiation pre-peak at the operation of a Grimm-type source in pulsed DC mode
Analytical and Bioanalytical Chemistry | Volume: 406 | Issue: 29 | P. 7445-7454

2014 - A. Plotnikov, J. Pfeifer, S. Richter, H. Kipphardt, V. Hoffmann
Determination of major nonmetallic impurities in magnesium by glow discharge mass spectrometry with a fast flow source using sintered and pressed powder samples
Analytical and Bioanalytical Chemistry | Volume: 406 | P. 7463-7471

2012 - G. Gamez, M. Voronov, S.J. Ray, V. Hoffmann, G.M. Hieftje, J. Michler
Surface elemental mapping via glow discharge optical emission spectroscopy
Spectrochimica Acta B | Volume: 70 | P. 1-9 | URL

2012 - D. Abou-Ras, B. Marsen, T. Rissom, F. Frost, H. Schulz, F. Bauer, V. Efimova, V. Hoffmann, A. Eicke
Enhancements in specimen preparation of Cu (In,Ga)(S,Se) 2 thin films
Micron | Volume: 43 | P. 470-474 | URL

2012 - M. Voronov, V. Hoffmann, T. Wallendorf, S. Marke, I. Moench, C. Engelhard, W. Buscher, S.J. Rayd, G.M. Hieftje
Glow discharge imaging spectroscopy with a novel acousto-optical imaging spectrometer
Journal of Analytical Atomic Spectrometry | Volume: 27 | P. 419-425 | URL

2012 - V. Efimova, V. Hoffmann, J. Eckert
Sputter crater formation in the case of microsecond pulsed glow discharge in Grimm-type source. Comparison of direct current and radio frequency modes
Spectrochimica Acta B | Volume: 76 | P. 181-189 | URL

2012 - M. Voronov, V. Hoffmann, W. Buscher, C. Engelhard, S.J. Ray, G.M. Hieftje
Thermal mechanism for formation of electrical prepeak and pressure waves in a microsecond direct current pulsed glow discharge with a Grimm-type source: A modeling investigation
Journal of Analytical Atomic Spectrometry | Volume: 27 | P. 1225-1233 | URL

2011 - S.E. Gledhill, A. Zykov, T. Rissom, R. Caballero, C. A. Kaufmann, C.-H. Fischer , M. Lux-Steiner, V. Efimova, V. Hoffmann, S. Oswald
The role of the spray pyrolysed Al2O3 barrier layer in achieving high efficiency solar cells on flexible steel substrates
Applied Physics A | Volume: 104 | P. 407-413

2011 - V. Hoffmann, M. Steinert, J. Acker
Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry.lf.(DC-GD-OES)
Journal of Analytical Atomic Spectrometry | Volume: 26 | P. 1990-1996 | URL

2011 - M. Voronov, V. Hoffmann, W. Buscher, C. Engelhard, S.J. Ray, G.M. Hieftje
Pressure waves generated in a Grimm-type pulsed glow discharge source and their influence on discharge parameters
Journal of Analytical Atomic Spectrometry | Volume: 505 | P. 811-815 | URL

2011 - V. Efimova, V. Hoffmann, J. Eckert
Electrical properties of the my-s pulsed glow discharge in a Grimm-type source: comparison of dc and rf modes
Journal of Analytical Atomic Spectrometry | Volume: 26 | P. 784-791 | URL

2011 - D. Abou-Ras, R. Caballero, C.-H. Fischer, C.A. Kaufmann, I. Lauermann, R. Mainz, H. Moenig, A. Schoepke, C. Stephan, C. Streeck, S. Schorr, A. Eicke, M. Doebeli, B. Gade, J. Hinrichs, T. Nunney, H. Dijkstra, V. Hoffmann, D. Klemm, V. Efimova, A. Bergmaier, G. Dollinger, T. Wirth, W. Unger, A.A. Rockett, A. Perez-Rodriguez, J. Alvarez-Garcia, V. Izquierdo-Roca, T. Schmid, P.-P. Choi, M. Mueller, F. Bertram, J. Christen, H. Khatri, R.W. Collins, S. Marsillac, I. Koetschau
Comprehensive comparison of various techniques for the analysis of elemental distributions in thin films
Microscopy and Microanalysis | Volume: 17 | P. 728-751

2011 - T. Rissom, R. Mainz, C.A. Kaufmann, R. Caballero, V. Efimova, V. Hoffmann, H.-W. Schock
Examination of growth kinetics of copper rich Cu(In,Ga)Se2-films using synchrotron energy dispersive X-ray diffractometry
Solar Energy Materials and Solar Cells | Volume: 95 | Issue: 1 | P. 250-253 | URL

2011 - A. Bachmatiuk, F. Boerrnert, V. Hoffmann, D. Lindackers, J.-H. Lin, B. Büchner, M.H. Ruemmeli
Hydrogen-induced self-assembly of helical carbon nanostructures from ethanol over SiO2 catalysts
Journal of Applied Physics | Volume: 109 | Issue: 9 | P. 094317/1-4 | URL

2010 - M. Voronov, P. Smid, V. Hoffmann, T. Hofmann, C. Venzago
Microsecond pulsed glow discharge in fast flow Grimm type sources for mass spectrometry
Journal of Analytical Atomic Spectrometry | Volume: 25 | P. 511-518 | URL

2010 - V. Efimova, A. Derzsi, A. Zlotorowicz, V. Hoffmann, Z. Donko, J. Eckert
Influence of the anode material on the characteristics of an analytical glow discharge cell
Spectrochimica Acta, Part B | Volume: 65 | Issue: 4 | P. 311-315 | URL

2009 - Z. Weiss, E.B.M. Steers, P. Smid, V. Hoffmann
Towards a catalogue of glow discharge emission spectra
Journal of Analytical Atomic Spectrometry | Volume: 24 | Issue: 1 | P. 27-33 | URL

2009 - D. Klemm, V. Hoffmann, K. Wetzig, J. Eckert
DC-and RF-GD-OES measurements of adsorbed organic monolayers on copper
Analytical and Bioanalytical Chemistry | Volume: 395 | Issue: 6 | P. 1893-1900

2009 - M. Stangl, M. Liptak, J. Acker, V. Hoffmann, S. Baunack, K. Wetzig
Influence of incorporated non-metallic impurities on electromigration in copper damascene interconnect lines
Thin Solid Films | Volume: 517 | P. 2687-2690 | URL

2009 - D. Klemm, V. Hoffmann, C. Edelmann
Controlling of material analysers of the GD-OES type with help of pump-down curves
Vacuum | Volume: 84 | Issue: 2 | P. 299-303 | URL

2008 - V.V. Efimova, M.V. Voronov, V. Hoffmann, J. Eckert
Electrical properties of pulsed glow discharge: two new aspects
Publications of the Astronomical Observatory of Belgrade | Volume: 84 | P. 369-373

2008 - V.-D. Hodoroaba, D. Klemm, U. Reinholz, E. Strub, J. Roehrich, W. Bohne, V. Hoffmann, K. Wetzig
Potential candidates of certified reference material for determination of hydrogen concentration with glow discharge optical emission spectrometry (GD-OES)—a feasibility study
Journal of Analytical Atomic Spectrometry | Volume: 23 | Issue: 4 | P. 460-462 | URL

2008 - D. Klemm, M. Stangl, A. Peeva, V. Hoffmann, K. Wetzig, J. Eckert
Analysis of interface impurities in electroplated Cu layers by using GD-OES and TOF-SIMS
Surface and Interface Analysis | Volume: 40 | Issue: 3-4 | P. 418-422 | URL

2008 - S. Hampel, D. Kunze, D. Haase, K. Kraemer, M. Rauschenbach, M. Ritschel, A. Leonhardt, J. Thomas, S. Oswald, V. Hoffmann, B. Büchner
Carbon nanotubes filled with a chemotherapeutic agent: a nanocarrier mediates inhibition of tumor cell growth
Nanomedicine | Volume: 3 | Issue: 2 | P. 175-182

2008 - V. Hoffmann, V.V. Efimova, M.V. Voronov, P. Smid, E.B.M. Steers, J. Eckert
Measurement of voltage and current in continuous and pulsed rf and dc glow discharges
Journal of Physics / Conference Series | Volume: 133 | P. 012017/1-12 | URL

2007 - M. Stangl, J. Acker, V. Hoffmann, W. Gruner, K. Wetzig
Segregation of organic impurities in thin electroplated Cu metallizations
Microchimica Acta | Volume: 156 | Issue: 1-2 | P. 159-162 | URL

2007 - S. Baunack, V. Hoffmann, W. Zahn
Quantitative nitrogen analysis by Auger electron spectrometry and glow discharge optical emission spectrometry
Microchimica Acta | Volume: 156 | Issue: 1-2 | P. 69-72 | URL

2007 - L. Wilken, V. Hoffmann, K. Wetzig
Electrical measurements at radio frequency glow discharges for spectroscopy
Spectrochimica Acta B | Volume: 62 | Issue: 10 | P. 1085-1122 | URL

2007 - S. Strehle, R. Reiche, V. Hoffmann, J. Acker, T. Gemming, K. Wetzig
Sulfur incorporation in electroplated Cu(Ag) thin films
Microchimica Acta | Volume: 156 | Issue: 1-2 | P. 167-172 | URL

2007 - V.S. Vidyarthi, W.-M. Lin, G. Suchaneck, G. Gerlach, C. Thiele, V. Hoffmann
Plasma emission controlled multi-target reactive sputtering for in-situ crystallized Pb(Zr,Ti)O3 thin films on 6'' Si-wafers
Thin Solid Films | Volume: 515 | Issue: 7-8 | P. 3547-3553 | URL

2007 - R. Schoenfelder, M.H. Ruemmeli, W. Gruner, M. Loeffler, J. Acker, V. Hoffmann, T. Gemming, B. Büchner, T. Pichler
Purification-induced sidewall functionalization of magnetically pure single-walled carbon nanotubes
Nanotechnology | Volume: 18 | Issue: 37 | P. 375601/1-8 | URL

2007 - M. Voronov, V. Hoffmann
Secondary discharge in fast flow Grimm-type microsecond pulsed glow discharge source for mass spectrometry
Journal of Analytical Atomic Spectrometry | Volume: 22 | P. 1184-1188 | URL

2006 - L. Wilken, V. Hoffmann, K. Wetzig
Radio frequency glow discharge source with integrated voltage and current probes used for evaluation of discharge parameters
Journal of Applied Physics | Volume: 99 | Issue: 6 | P. 063305/1-13 | URL

2006 - V.-D. Hodoroaba, V. Hoffmann, B.M. Steers, M. Griepentrog, A. Dueck, U. Beck
Round Robin exercise: Coated materials for glow discharge spectroscopy
Journal of Analytical Atomic Spectrometry | Volume: 21 | Issue: 1 | P. 74-81 | URL

2006 - M.R. Webb, V. Hoffmann, G.M. Hieftje
Surface elemental mapping using glow discharge—optical emission spectrometry
Spectrochimica Acta, Part B | Volume: 61 | Issue: 12 | P. 1279-1284 | URL

2006 - R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, H. Heuer, C. Wenzel, H.-J. Engelmann, D. Gehre, E. Zschech
Effect of nitrogen content on the degradation mechanisms of thin Ta–Si–N diffusion barriers for Cu metallization
Thin Solid Films | Volume: 500 | Issue: 1-2 | P. 259-267 | URL

2005 - M. Stangl, J. Acker, V. Dittel, W. Gruner, V. Hoffmann, K. Wetzig
Characterization of electroplated copper self-annealing with investigations focused on incorporated impurities
Microelectronic Engineering | Volume: 82 | Issue: 2 | P. 189-195 | URL

2005 - D. Reitz, H. Heuer, S. Baunack, R. Huebner, V. Hoffmann, S. Menzel, C. Wenzel, K. Wetzig
Investigation of a Ta-Si-O/Ta-Si-N bilayer system for embedded SAW finger structures
Microelectronic Engineering | Volume: 82 | Issue: 3-4 | P. 301-306 | URL

2005 - V. Hoffmann, M. Kasik, P.K. Robinson, C. Venzago
Glow discharge mass spectrometry
Analytical and Bioanalytical Chemistry | Volume: 381 | P. 173-188

2005 - M. Stangl, J. Acker, A. Henssge, W. Gruner, V. Hoffmann, H. Wendrock, K. Wetzig
Untersuchungen zum Einbau von Additiven in elektrochemisch abgeschiedenen Kupferschichten
Galvanotechnik | Volume: 96 | Issue: 5 | P. 1084-1087

2005 - Y.-S. Kim, M. Plotnikov, V. Hoffmann
Comparison study of sensitivity factors of elements in glow discharge- and inductively coupled plasma-mass spectrometry
Bulletin of the Korean Chemical Society | Volume: 26 | Issue: 12 | P. 1991-1995

2005 - M. Stangl, V. Dittel, J. Acker, V. Hoffmann, W. Gruner, S. Strehle, K. Wetzig
Investigation of organic impurities adsorbed on and incorporated into electroplated copper layers
Applied Surface Science | Volume: 252 | Issue: 1 | P. 158-161 | URL

2005 - V. Hoffmann, M. Hecker, R. Huebner
Focussing and defocussing effects at radio frequency glow discharge optical emission spectroscopy analyses of thin films with partly nonconductive components
Zeitschrift fuer Metallkunde | Volume: 96 | Issue: 9 | P. 983-987

2005 - S. Kardelky, A. Gebert, O. Gutfleisch, V. Hoffmann, L. Schultz
Prediction of the oxidation behaviour of Sm–Co-based magnets
Journal of Magnetism and Magnetic Materials | Volume: 290-291 | Issue: Part 2 | P. 1226-1229 | URL

2005 - L. Wilken, V. Hoffmann, K. Wetzig
Analysis of new electrical signals in respect to quantification of radio frequency glow discharge emission spectrometry
Applied Surface Science | Volume: 252 | Issue: 1 | P. 261-265 | URL

2005 - R. Huebner, R. Reiche, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, H. Heuer, C. Wenzel, H.-J. Engelmann, E. Zschech
Void formation in the Cu layer during thermal treatment of SiNx/Cu/Ta73Si27/SiO2/Si systems
Crystal Research and Technology | Volume: 40 | Issue: 1-2 | P. 135-142

2005 - M. Stangl, J. Acker, V. Dittel, W. Gruner, V. Hoffmann, S. Oswald, K. Wetzig
Verhalten organischer Verunreinigungen in elektrochemisch abgeschiedenem Kupfer waehrend des self-annealings bei Raumtemperatur
Galvanotechnik | Volume: 96 | Issue: 7 | P. 1576-1579

2005 - L. Wilken, V. Hoffmann, K. Wetzig
Radio frequency glow discharge source with integrated voltage and current probes used for sputtering rate and emission yield measurements at insulating samples
Analytical and Bioanalytical Chemistry | Volume: 383 | Issue: 3 | P. 424-433 | URL

2004 - R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, H.-J. Engelmann, E. Zschech
Comparison of the annealing behavior of thin Ta films deposited onto Si and SiO2 substrates
Analytical and Bioanalytical Chemistry | Volume: 379 | Issue: 4 | P. 568-575

2004 - R. Huebner, M. Hecker, N. Mattern, A. Voss, J. Acker, V. Hoffmann, K. Wetzig, H.-J. Engelmann, E. Zschech, H. Heuer, C. Wenzel
Influence of nitrogen content on the crystallization behavior of thin Ta–Si–N diffusion barriers
Thin Solid Films | Volume: 468 | P. 183-192 | URL

2004 - R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, C. Wenger, H.-J. Engelmann, C. Wenzel, E. Zschech
Degradation mechanisms of Ta and Ta-Si diffusion barriers during thermal stressing
Thin Solid Films | Volume: 458 | Issue: 1-2 | P. 237-245 | URL

2003 - S. Groudeva-Zotova, D. Elefant, R. Kaltofen, D. Tietjen, J. Thomas, V. Hoffmann, C.M. Schneider
Magnetic and structural characteristics of exchange biasing systems based on NiMn antiferromagnetic films
Journal of Magnetism and Magnetic Materials | Volume: 263 | Issue: 1-2 | P. 57-71 | URL

2003 - L. Wilken, V. Hoffmann, K. Wetzig
In situ depth measurements for GD-OES
Journal of Analytical Atomic Spectrometry | Volume: 18 | Issue: 9 | P. 1133-1140 | URL

2003 - L. Wilken, V. Hoffmann, H.-J. Uhlemann, H. Siegel, K. Wetzig
Development of a radio-frequency glow discharge source with integrated voltage and current probes
Journal of Analytical Atomic Spectrometry | Volume: 18 | Issue: 6 | P. 646-655 | URL

2003 - V.-D. Hodoroaba, E.B.M. Steers, V. Hoffmann, W.E.S. Unger, W. Paatsch, K. Wetzig
Influence of hydrogen on the analytical figures of merit of glow discharge optical emission spectroscopy- friend or foe?
Journal of Analytical Atomic Spectrometry | Volume: 18 | Issue: 6 | P. 521-526 | URL

2003 - R. Huebner, M. Hecker, N. Mattern, V. Hoffmann, K. Wetzig, C. Wenger, H.-J. Engelmann, C. Wenzel, E. Zschech, J.W. Bartha
Structure and thermal stability of graded Ta-TaN diffusion barriers between Cu and SiO2
Thin Solid Films | Volume: 437 | P. 248-256 | URL

2003 - L. Wilken, V. Hoffmann, K. Wetzig
Erosion rate measurements for GD-OES
Journal of Analytical Atomic Spectrometry | Volume: 18 | Issue: 9 | P. 1141-1145 | URL

2003 - J. Angeli, A. Bengtson, A. Bogaerts, V. Hoffmann, V.-D. Hodoroaba, E. Steers
Glow discharge optical emission spectrometry: moving towards reliable thin film analysis- a short review
Journal of Analytical Atomic Spectrometry | Volume: 18 | Issue: 6 | P. 670-679 | URL

2003 - V. Hoffmann, R. Dorka, L. Wilken, V.D. Hodoroaba, K. Wetzig
Present possibilities of thin-layer analysis by GDOES
Surface and Interface Analysis | Volume: 35 | Issue: 7 | P. 575-582

2002 - A. Bogaerts, L. Wilken, V. Hoffmann, R. Gijbels, K. Wetzig
Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry
Spectrochimica Acta Part B | Volume: 57 | Issue: 1 | P. 109-119

2002 - Y.-S. Kim, V. Hoffmann, D. Schiel
Determination of residual carbon and nitrogen on glow discharge lamp for optical emission spectrometry
Bulletin of the Korean Chemical Society | Volume: 23 | Issue: 3 | P. 525-527

2002 - C. Beyer, I. Feldmann, D. Gilmour, V. Hoffmann, N. Jakubowski
Development and analytical characterization of a Grimm-type glow discharge ion source operated with high gas flow rates and coupled to a mass spectrometer with high mass resolution
Spectrochimica acta part B | Volume: 57 | Issue: 10 | P. 1521-1533

2002 - M. Hecker, D. Fischer, V. Hoffmann, H.-J. Engelmann, A. Voss, N. Mattern, C. Wenzel, C. Vogt, E. Zschech
Influence of N content on microstructure and thermal stability of Ta-N thin films for Cu interconnection
Thin Solid Films | Volume: 414 | Issue: 2 | P. 184-191 | URL

2002 - M. Hecker, R. Huebner, R. Ecke, S. Schulz, H.J. Engelmann, H. Stegmann, V. Hoffmann, N. Mattern, T. Gessner, E. Zschech
Effect of annealing on the microstructure of ultrathin tungsten nitride diffusion barriers for copper metallization
Microelectronic Engineering | Volume: 64 | Issue: 1-4 | P. 269-277

2001 - R. Kurt, A. Karimi, V. Hoffmann
Growth of decorated carbon nano-tubes
Chemical Physics Letters | Volume: 335 | Issue: 5-6 | P. 545-552

2001 - A. Bogaerts, L. Wilken, V. Hoffmann, R. Gijbels, K. Wetzig
Comparison of modeling calculations with experimental results for direct current glow discharge optical emission spectrometry
Spectrochimica Acta Part B | Volume: 56 | Issue: 5 | P. 551-564

2001 - D.-V. Hodoroaba, W.E.S. Unger, H. Jenett, V. Hoffmann, B. Hagenhoff, S. Kayser, K. Wetzig
Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS
Applied Surface Science | Volume: 179 | Issue: 1-4 | P. 30-37 | URL

2001 - A. Plotnikov, C. Vogt, V. Hoffmann, C. Taeschner, K. Wetzig
Application of laser ablation inductively coupled plasma quadrupole mass spectrometry (LA-ICP-QMS) for depth profile analysis
Journal of Analytical Atomic Spectrometry | Volume: 16 | Issue: 11 | P. 1290-1295 | URL

2001 - V.-D. Hodoroaba, E.B.M. Steers, V. Hoffmann, K. Wetzig
The effect of small quantities of hydrogen on a glow discharge in neon. Comparison with the argon case
Journal of Analytical and Atomic Spectrometry | Volume: 16 | Issue: 1 | P. 43-49 | URL

2001 - Ch. Taeschner, B. Ljungberg, V. Hoffmann, C. Vogt, A. Leonhardt
Deposition of TiN, TiC and Ti1-xAlxN coatings by pulsed d.c. plasma enhanced chemical vapour deposition methods
Surface and Coatings Technology | Volume: 142-144 | P. 823-828

2000 - R. Dorka, R. Kunze, V. Hoffmann
Investigation of SiO2 layers by glow discharge optical emission spectroscopy including layer thickness determination by an optical interference effect
Journal of Analytical Atomic Spectrometry | Volume: 15 | Issue: 7 | P. 873-876 | URL

2000 - V.-D. Hodoroaba, V. Hoffmann, E.B.M. Steers, K. Wetzig
Investigations of the effect of hydrogen in an argon glow discharge
Journal of Analytical and Atomic Spectrometry | Volume: 15 | Issue: 9 | P. 1075-1080 | URL

2000 - V.-D. Hodoroaba, V. Hoffmann, E.B.M. Steers, K. Wetzig
Emission spectra of copper and argon in an argon glow discharge containing small quantities of hydrogen
Journal of Analytical and Atomic Spectrometry | Volume: 15 | Issue: 8 | P. 951-958 | URL

1999 - A. Moebius, C. Frenzel, R. Thielsch, R. Rosenbaum, C.J. Adkins, M. Schreiber, H.-D. Bauer, R. Groetzschel, V. Hoffmann, T. Krieg, N. Matz, H. Vinzelberg, M. Witcomb
Metal-insulator transition in amorphous Si1-xNix: Evidence for Mott's minimum metallic conductivity
Physical Review B | Volume: 60 | Issue: 20 | P. 14209-14223 | URL

1999 - G. Blumenthal, W. Schneider, W. Plieth, S. Baunack, V. Hoffmann
Chromatierungen auf Zinkschichten
Metalloberflaeche | Volume: 53 | Issue: 10 | P. 10-17

1999 - V. Hoffmann, R. Kurt, K. Kaemmer, R. Thielsch, T. Wirth
Interference phenomena at transparent layers in glow discharge optical emission spectrometry
Applied Spectroscopy | Volume: 53 | Issue: 8 | P. 987-990

1999 - R. Kurt, V. Hoffmann, R. Reiche, W. Pitschke, K. Wetzig
Chemical analysis of thin films by means of SS-MS, GD-OES, and XPS demonstrated at Ir-Si thermoelectrica
Fresenius Journal of Analytical Chemistry | Volume: 363 | Issue: 2 | P. 179-184

1998 - V. Hoffmann, F. Praessler, K. Wetzig
Optische Emissionsspektrometrie in der Werkstoffanalytik
Nachrichten aus Chemie, Technik und Laboratorium | Volume: 46 | Issue: 5 | P. 535-538

1997 - K. Wetzig, S. Baunack, V. Hoffmann, S. Oswald, F. Praessler
Quantitative depth profiling of thin layers
Fresenius Journal of Analytical Chemistry | Volume: 358 | Issue: 1-2 | P. 25-31 | URL

1996 - F. Praessler, V. Hoffmann, J. Schumann, K. Wetzig
Quantitative depth profiling in glow discharge spectroscopies - A new deconvolution technique to separate effects of an uneven erosion crater shape
Fresenius Journal of Analytical Chemistry | Volume: 355 | Issue: 7-8 | P. 840-846 | URL

1996 - U. Beck, G. Reiners, T. Wirth, V. Hoffmann, F. Praessler
Multilayer reference coatings for depth profile standards
Thin Solid Films | Volume: 291 | Issue: Dez. | P. 57-62 | URL

1996 - V. Hoffmann, H.-J. Uhlemann, F. Praessler, K. Wetzig, D. Birus
New hardware for radio frequency powered glow discharge spectroscopies and its capabilities for analytical applications
Fresenius Journal of Analytical Chemistry | Volume: 355 | Issue: 7-8 | P. 826-830 | URL

1995 - F. Praessler, V. Hoffmann, J. Schumann, K. Wetzig
Comparison of depth resolution for direct current and radiofrequency modes in glow discharge optical emission spectrometry
Journal of Analytical Atomic Spectrometry | Volume: 10 | Issue: 9 | P. 677-680 | URL

1995 - V. Hoffmann, G. Ehrlich
Investigations on the lateral distribution of the emission line intensities in the plasma of a Grimm-type glow discharge source
Spectrochimica Acta B | Volume: 50 | Issue: 4-7 | P. 607-616

1994 - S. Oswald, V. Hoffmann, G. Ehrlich
Contributions to computer-aided interpretation of ion sputtering depth profiling
Spectrochimica Acta B | Volume: 49 | Issue: 11 | P. 1123-1145


Contributions to collected editions/proceedings

2017 - V. Hoffmann
Latest developments in analytical glow discharge contribution to conference proceedings
Japanese Discussing Group for Plasma Spectrochemistry, Tokyo/ Japan, 14.4.17 | P. 30-33

2017 - A. Bengtson, V. Hoffmann, M. Kasik, K. Marshall
Analytical Glow Discharges: Fundamentals, Applications and New Developments
Encyclopedia of Analytical Chemistry | Volume: Encyclopedia of Analytical Chemistry | P. 1-76 | URL

2015 - D. Eigel, P.-F. Gostin, A. Eychmueller, A. Gebert, V. Hoffmann
Oberflaechenmodifizierung von Ti-Nb-Legierungen durch Plasma-Elektrolyse-Oxidation fuer biokompatible Anwendungen
Kongress des Zentralverbands fuer Oberflaechentechnik (ZVO), Berlin/ Germany, 23.-24.9.15

2011 - V. Hoffmann, A. Quentmeier
Glow discharge optical emission spectroscopy (GD-OES)
| Volume: Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications. G. Friedbacher, H. Bubert (eds.), 2. compl. rev. and enl. Ed. 2011, Weinheim: Wiley-VCH, 534 S. | P. 329-342

2011 - V. Hoffmann, D. Klemm, V. Efimova, C. Venzago, A.A. Rockett, T. Wirth, T. Nunney, C.A. Kaufmann, R. Caballo
Elemental distribution profiling of thin films for solar cells
| Volume: Advanced Characterization Techniques for Thin Film Solar Cells, Daniel Abou-Ras, Thomas Kirchartz, Uwe Rau (eds.) Weinheim: Wiley-VCH, 2011, Capter 16 | P. 411-448

2008 - M. Stangl, M. Liptak, V. Hoffmann, K. Wetzig, J. Acker
Thermoelektrische Schaedigungsmechanismen an elektrochemisch abgeschiedenen Kupfer-Damaszen-Leitbahnen
| Volume: Jahrbuch Oberflaechentechnik; Richard Suchentrunk (ed.) ; Leuze-Verl.; 2008, 64 | P. 287-292

2008 - C. Edelmann, D. Klemm, V. Hoffmann
Evaluierung der Abpumpkurven einer Glimmentladungsquelle: Qualitaetskontrolle von Spektralanalysen
| Volume: Transfer. Das Steinbeis Magazin | P. 9

2008 - M. Stangl, J. Acker, V. Hoffmann, K. Wetzig, U. Kuenzelmann, J.W. Bartha
Application of the copper damascene process for the preparation of electromigration test structures
| Volume: Proceedings, ICPT, Berlin: VDE-Verl., 2008 | P. 331-335

2005 - M. Hecker, R. Huebner, J. Acker, V. Hoffmann, N. Mattern, R. Ecke, S.E. Schulz, H. Heuer, C. Wenzel, H.-J. Engelmann, E. Zschech
Advanced barriers for copper interconnects
| Volume: Materials for Information Technology: Devices, Interconnects and Packaging, London, Springer-Verl., 2005 | P. 283-295

2004 - N. Jakubowski, A. Bogaerts, V. Hoffmann
Analytical glow discharges
| Volume: Atomic Spectroscopy in Elemental Analysis, Blackwell Publishing CRC Press, Michael Cullen (Ed.) | P. 91-156

2004 - M. Stangl, J. Acker, A. Henssge, W. Gruner, V. Hoffmann, H. Wendrock, K. Wetzig
Untersuchungen zum Einbau von Additiven in elektrochemisch abgeschiedenen Kupferschichten
| Volume: Tagungsband ''Oberflaechentage 2004'' mit 42. Jahrestagung der Deutschen Gesellschaft fuer Galvano- und Oberflaechentechnik e.V., Dresden, 22.-24.9.04 | P. 185-187

2002 - S. Faehler, U. Hannemann, V. Neu, V. Hoffmann, B. Holzapfel, L. Schultz
Highly coercive, textured NdFeB films by pulsed laser deposition
XVIIth International Workshop on Rare-Earth Magnets and their Applications, Newark,Delaware/USA, 18.-22.8.02 | Volume: Proceedings, G.C. Hadjipanayis and M.J.Bonder (ed.), Rinton Press, Princeton | P. 449-456

2002 - M. Hecker, N. Mattern, V. Hoffmann, C. Wenzel, J. Bartha, H.-J. Engelmann, E. Zschech
Microstructure and degradation mechanisms of Ta based diffusion barriers for copper interconnects
Advanced Metallization Conference 2001 (AMC 2001), Montreal/Canada, 8.-11.10.01 | Volume: Materials Research Society Conference Proceedings | P. 597-601

2001 - S. Daebritz, V. Hoffmann, G. Sadowski, D. Bergner
Investigations of phase growth in the copper-tin system
| Volume: Defect and Diffusion Forum, Sitec Publications, Switzerland, 194-199 | P. 1575-1580

2000 - V. Hoffmann, R. Dorka, L. Wilken, K. Wetzig
New developments in glow discharge optical emission and mass spectrometry
8th Symposium on Laser Spectroscopy, Kaeri/Korea, 3.-4.11.00 | Volume: Proceedings of the 8th Symposium on Laser Spectroscopy, 8/3 | P. 78-82

1999 - A. Moebius, C. Frenzel, R. Thielsch, R. Rosenbaum, C.J. Adkins, M. Schreiber, H.-D. Bauer, R. Groetzschel, V. Hoffmann, T. Krieg, N. Matz, H. Vinzelberg, M. Witcomb
The metal-insulator transition in amorphous Si1-xNix: So, was Mott right after all?
24th International Conference on the Physics of Semiconductors, Jerusalem/Israel, 2.-7.8.98 | Volume: Proceedings, World Scientific, Singapore | P. CDII.D.4

1997 - S. Daebritz, D. Bergner, V. Hoffmann
Phase growth between copper and different tin solders
DIMAT-96, International Conference on Diffusion in Materials, Nordkirchen, 5.-9.8.96 | Volume: Defect and Diffusion Forum, 143-147 | P. 579-584

1997 - V. Hoffmann, H. Mai
Compacted powders
| Volume: Glow Discharge Optical Emission Spectrometry, John Wiley & Sons, New York | P. 551-562

1995 - V. Hoffmann, F. Praessler, P.R. Perzl
Entwicklung der direkten optischen Glimmentladungsspektrometrie (GDS-OES) mit Hochfrequenz (HF)-gestuetzter Anregung zur quantitativen Analyse nichtleitender Schichten
VDI-Statusseminar ''Oberflaechen- und Schichttechnologien, Mainz, 29.-31.5.95 | Volume: Tagungsband, VDI-Technologiezentrum Duesseldorf | P. 191-198


Invited Talks

2019 - V. Hoffmann
Light Element Analysis by Analytical Glow Discharges
European Winter Plasma Conference on Plasma Spectrochemistry 2019, Pau/ France, 3.-8.2.19
Pau | France | 03.02.2019 - 08.02.2019

2018 - V. Hoffmann
Advances in Glow Discharge Optical Emission Spectrometry
Conference on Plasma Spectrochemistry, Amelia Island, Florida/ USA, 8.-13.1.18

2017 - V. Hoffmann
New developments in glow discharge optical and mass spectrometry
ZFM Festkoerpertag 2017, Leibniz Universität Hannover, Hannover/ Germany, 3.2.17

2017 - V. Hoffmann
Latest developments in analytical glow discharge
Japanese Discussing Group for Plasma Spectrochemistry, Tokyo/ Japan, 14.4.17

2016 - V. Hoffmann
Analyse von Wasserstoff, Kohlenstoff und Sauerstoff mit der optischen Glimmentladungs-Spektrometrie
25. ICP-MS Anwendertreffen und 12. Symposium Massenspektrometrische Verfahren der Elementspurenanalyse, Siegen/ Germany, 12.-15.9.16

2016 - V. Hoffmann
Advances in glow discharge spectrochemistry
Winter Conference on Plasma Spectrochemistry (EWCPS), Tucson/ USA, 8.-16.1.16

2015 - V. Hoffmann, E. Steers, S. Mushtaq, J. Pickering, C. Gonzalez Gago, P. Smid, T. Hofmann, C. Venzago, W. Gruner
Measurement of Oxygen in Solid Samples using Analytical Glow Discharges with Optical and Mass Spectrometric Detection
SciX 2015, Rhode Island/ USA, 27.9.-2.10.15

2014 - V. Hoffmann
Advances in glow discharge spectrochemistry
2014 Winter Conference on Plasma Spectrochemistry, Amelia Island, Florida/ USA, 6.-11.1.14

2013 - V. Hoffmann
Plasma diagnostics on analytical glow discharges
International Workshop ''Diagnostic Systems for Plasma Processes'' Lichtenwalde, Chemnitz, 24.9.13

2013 - V. Hoffmann
Progress and demands in analytical glow discharges
Colloquium Spectroscopicum Internationale XXXVIII, Tromsoe/ Norwegen, 17.-20.6.13

2012 - M. Voronov, V. Hoffmann, T. Steingrobe, W. Buscher, C. Engelhard, A. Storey, S. Ray, G. Hieftje
Thermal mechanism of prepeak formation in pulsed glow discharge
65th Annual Gaseous Electronics Conference, Austin, Texas/ USA, 22.-26.10.12

2012 - V. Hoffmann, M. Voronov, T. Wallendorf, S. Marke, G.M. Hieftje, S. Ray, C. Engelhard, W. Buscher
Spatial- and time-resolved measurements by means of a new acousto-optical imaging spectrometer in combination with glow discharge sources
2012 Winter Conference on Plasma Spectrochemistry, Tucson/ Arizona, 9.-14.1.12

2010 - V. Hoffmann
New instrumentation for RF-GD-OES
International Glow Discharge Spectroscopy Symposium, CUFR Jean Francois Champollion, Albi/ Frankreich, 22.-27.8.10

2010 - D. Klemm, R. Taranczewski, V. Hoffmann, U. Kuehn, J. Eckert
3D Laserstrahlschmelzen – Technologie fuer die generative Fertigung und Anwendung in der Materialforschung
Institutsseminar vom Fraunhofer Institut fuer Werkstoff- und Strahltechnik, Dresden, 26.4.10

2010 - V. Hoffmann
GDOES-Analyse ultraduenner Schichten mit verbesserter Hardware
Wissenschaftliches Kolloquium des Institutes fuer Werkstoffkunde der TU Darmstadt, 1.7.10

2009 - V. Hoffmann
Neue Entwicklungen in der analytischen Glimmentladungsspektrometrie
Institutsseminar, FH Senftenberg, 19.5.09

2009 - V. Hoffmann, V. Efimova, D. Klemm, M. Voronov, J. Eckert
Gepulste Glimmentladungen - von den Grundlagen zu den Anwendungen
15. Tagung Festkoerperanalytik, Chemnitz, 12.-16.7.09

2008 - V. Hoffmann, V. Efimova, M. Voronov, P. Smid, E. Steers, J. Eckert
Measurement of voltage and current in continuous and pulsed rf and dc glow discharges
24th SPIG, Novi Sad/ Serbien, 25.-29.8.08

2008 - V. Hoffmann, V. Efimova, D. Klemm, M. Voronov, J. Eckert
Pulsed glow discharges – from fundamentals to applications
2008 Third Asia Pacific Winter Conference, Tsukuba/ Japan, 16.-21.11.08

2008 - V. Hoffmann
RF and pulsed glow discharges,and crater formation in glow discharges
FA CSS 2008, Reno/ USA, 28.9.-2.10.08

2008 - V. Hoffmann, D. Klemm, K. Wetzig
Progress at thin film analysis by glow discharge spectrometry
Nordic Conference on Plasma Spectrochemistry, Loen/ Norwegen, 15.-18.6.08

2008 - E. Steers, P. Smid, V. Hoffmann
Effects of traces of molecular gases (hydrogen, nitrogen) in glow discharges in noble gases
24th SPIG, Novi Sad/ Serbien, 25.-29.8.08

2008 - J. Acker, S. Buecker, V. Hoffmann
Flammen-Molekuelabsorptionsspektrometrie zweiatomiger Molekuele - Zum Mechanismus der Bildung von AlF in der Acetylen-Lachgas-Flamme
2nd International Symposium on CSAAS, Berlin, 7.-8.10.08

2008 - D. Klemm, V. Hoffmann
GD-OES Analysen duenner und duennster Schichten (Praxisseminar)
Workshop der TAZ GmbH, Eurasburg, 13.-14.10.08

2007 - S. Hampel, D. Kunze, D. Haase, K. Kraemer, A. Leonhardt, M. Ritschel, J. Thomas, S. Oswald, V. Hoffmann, B. Büchner
Drugfilled multiwalled carbon nanotubes - a nanosized drug carrier system
Carbio-Meeting, Dresden, 11.-14.12.07

2007 - V. Hoffmann
Development and application of mass spectrometry for current solid state and materials research
Europaeische Plasma Winterkonferenz, Taormina/ Italien, 18.2.07

2006 - D. Klemm, V. Hoffmann, M. Uhlemann, G. Pietzsch, K. Wetzig
GD-OES-Duennschichtanalytik in wenigen Minuten?!
Internationale Fachmesse fuer Vakuumtechnik und Vakuumanwendungen, Magdeburg, 26.9.06

2006 - V. Hoffmann
Glimmentladungs-Spektroskopie
Surface Engineering und Nanotechnologie (SENT 2006-3), Dresden, 5.12.06

2006 - V. Hoffmann, T. Gemming, N. Mattern
Neue Entwicklungen zur Festkoerper- und Strukturanalytik im IFW Dresden
EFDS Fachausschuss ''Prozesssicherheit und Produktqualitaet'' am 25.4.06

2006 - V. Hoffmann
Charakterisierung von duennen Schichten mit Hilfe der Atomspektrometrie mit Glimmentladungen
Vortragsreihe: Materialcharakterisierung mit modernen Methoden der physikalischen und chemischen Analyse, Universitaet Hamburg, 28.6.06

2006 - V. Hoffmann, D. Klemm, K. Wetzig
Analysis of light elements by glow discharge optical emission spectrometry
Second Asia-Pacific Winter Conference on Plasma Spectrochemistry, Bangkok/ Thailand, 27.11.-2.12.06

2005 - V. Hoffmann
Neue Entwicklungen auf dem Gebiet der analytischen Glimmentladung
CANAS 2005, Freiberg, 6.-10.3.05

2005 - V. Hoffmann
Tiefenprofilmessungen an duennen Schichten mittels optischer Glimmentladungs-Spektrometrie
Industrie-Fach-Messe 2005 und 5. Dresdner Materialforschungstag, 11.11.05

2005 - V. Hoffmann, L. Wilken, K. Wetzig
Development and application of glow discharge spectroscopy at IFW Dresden
Asia-Pacific Conference on Plasmon-Spectrochemistry, Chiang Mai/ Thailand, 25.-30.4.05

2005 - M. Stangl, J. Acker, V. Hoffmann, V. Dittel, W. Gruner, K. Wetzig
Influence of organic impurities on the self-annealing process of electroplated Cu
13. Tagung Festkoerperanalytik, Chemnitz, 27.6.05

2005 - V. Hoffmann
GD-OES und GD-MS - geben und nehmen
Fachseminar Glimmentladungs-Massenspektrometie, Hanau, 1.12.05

2005 - V. Hoffmann
Neue Entwicklungen der GD-OES
Symposium ''Glimmentladungsspektroskopie- eine moderne Methode der Schicht- und Materialanalytik'', TU Ilmenau, 2.3.05

2004 - V. Hoffmann
Oberflaechenanalytik
Industrielle Weiterbildung ''Surface Engineering und Nanotechnologie'', Dresden, 25.-27.5.04

2004 - V. Hoffmann
Nutzung der GDOS zur Charakterisierung von Oberflaechen und Schichten
Vortrag am FhG-IWS, Dresden, 10.5.04

2004 - V. Hoffmann
RF-GD-OES: where we are and where we like to be
Expert Meeting on Glow Discharge, Yokohama/Japan, 3.-7.4.04

2003 - V. Hoffmann
Modern developments in glow discharge spectrometry and their application in material science
European Winter Conference on Plasma Spectrochemistry, Garmisch-Partenkirchen, 12.-17.1.03

2002 - V. Neu, U. Hannemann, S. Faehler, V. Hoffmann, B. Holzapfel, L. Schultz
Pulsed laser deposition of hard magnetic SmCo and NdFeB films
MARTECH Seminar, Florida State University, Tallahassee/USA, 12.8.02

2002 - V. Hoffmann
Present possibilities of run layer analysis by GDS
International Symposium on ''GDOES for Surface Analysis'', Kero University, Yokohama/Japan, 19.-21.11.02

2002 - V. Hoffmann, R. Dorka, L. Wilken, K. Wetzig, V.-D. Hodoroaba
Tiefenprofilanalytik mittels Glimmentladungsspektrometrie von nichtleitenden Schichtsystemen
12. AOFA, Kaiserlautern, 15.-19.9.02

2001 - V. Hoffmann, R. Dorka, L. Wilken, K. Wetzig
Constructional developments for analytical spectrometry with RF glow discharges
FACSS 2001, Detroit/USA, 7.-12.10.01

2001 - V. Hoffmann
Developments in GD-OES and -MS at IFW
Institutsseminar der Fakultaet Chemie der Universitaet Bloomington/USA, 11.9.01

2001 - V. Hoffmann
Grundlagen und Anwendungen der RF-GD-OES
Seminar ''Praktische Glimmentladungsspektrometrie'', Herrsching, 25.-26.6.01

2000 - L. Wilken, V. Hoffmann, K. Wetzig
Verbesserte elektrische Signale in der RF-GD-OES
7. Deutsches Anwendertreffen ''Analytische Glimmentladungsspektrometrie'', Dresden, 17.-18.10.00

2000 - W. Gruner, V. Hoffmann, A. Berger
Aktuelle Probleme bei der Bestimmung von C,O, N und H
Analytica Conference 2000, Muenchen, 11.-14.4.00

2000 - V. Hoffmann
Bulk- und Schichtanalyse mittels Glimmentladungsspektrometrie
Workshop Bewertung und Charakterisierung technischer Oberflaechen fuer die verarbeitende Industrie, Bergisch-Gladbach, 11.5.00

2000 - V. Hoffmann
Developments in glow discharge optical and mass spectrometry and applications in materials science
9th Solid Sampling Spectrometry Colloquium, Merseburg, 11.-15.9.00

2000 - V. Hoffmann
New developments in glow discharge optical and mass spectrometry
6. International Symposium on Advanced Analytical techniques and Applications, Masan/Korea, 6.-7.11.00

1999 - V. Hoffmann
Basics of glow discharge measurements - New potentialities for analytical applications
GD-OES-Seminar ''Principles - Applications in Materials Research'', Mol/Belgien, 5.11.99

1998 - V. Hoffmann
Einsatz der Glimmentladung in der Werkstofforschung des IFW Dresden
Workshop ''Analyse von Schichten mittels Glimmentladung'' in der EMPA, Thun/Schweiz, 16.9.98

1998 - V. Hoffmann
Einsatz der Glimmentladung in der Werkstofforschung des IFW Dresden
Workshop ''Praxis der Glimmentladungsspektrometrie'', Muenchen, 10.-11.9.98

1997 - V. Hoffmann
Qualitative und quantitative Werkstoffanalytik mit der GD-OES
Seminar der Physikalisch-Technischen Bundesanstalt Braunschweig, 12.12.1997

1997 - V. Hoffmann, F. Praessler, K. Wetzig
30 Jahre GRIMMsche Glimmentladungsquelle - Untersuchung der Entladungsparameter
CANAS'97, Freiberg, 10.-14.3.97

1996 - V. Hoffmann, H.-J. Uhlemann, F. Praessler, K. Wetzig, D. Birus
Nouvelle configuration pour une lampe à décharge luminescente sous radio fréquence. Possibilité analytiques
2. Forum LABO, Paris/Frankreich, 1.-5.4.96

1995 - F. Praessler, V. Hoffmann
A new deconvolution technique to separate effects of an uneven erosion crater shape
Schwedisches Institut fuer Metallforschung, Stockholm/Schweden, 16.10.95

1995 - V. Hoffmann, F. Praessler, K. Wetzig
Entwicklung einer HF-gestuetzten Glimmentladungs-Emissionsspektrometrie zur direkten quantitativen Analyse nichtleitender Schichten
Deutsch-Oesterreichischer AK ''REM in der Materialpruefung'', Wien/Oesterreich, 6.7.95

1995 - V. Hoffmann, F. Praessler, K. Wetzig
Optische Glimmentladungsspektrometrie zur Analyse elektrisch leitender und nichtleitender Schichten
Seminar fuer Oberflaechentechnik, IOPW, TU Braunschweig, 23.11.95