Responsible: Daniil Karnaushenko, Dr. Michael Melzer
Substitute: Cornelia Krien
Two magneton sources for DC cool sputtering of metal and magnetic materials (only conductive materials). The system equipped with a measurement setup for observing stress evolution during the film growth and sample for this machine is a stripe.
Ultra-high vacuum sputtering machines with 8 magneton sources for sputtering of both conductive and non-conductive target materials. The system can support full 3-inch wafers.
Ultra-high vacuum sputtering machine with eight DC magneton sources for metal and magnetic materials. The system connected with an analytic chamber, where one can perform scanning tunneling microscopy, atomic force microscopy, low-energy electron diffraction and Auger. System can support full 3-inch wafer.
This optical microscope system features a high focal depth, 3D profile reconstruction, automatic wide area stitching and tilted observations.