Our research is supported by advanced infrastructure for the synthesis, processing, and characterization of functional thin films, 2D materials, and nanostructured heterostructures. State-of-the-art deposition and materials-processing facilities, combined with sophisticated structural, chemical, and spectroscopic characterization techniques, enable precise control of materials from the atomic to the device scale. This integrated infrastructure allows us to develop, understand, and optimize novel materials and interfaces for applications ranging from advanced electronics and quantum technologies to sustainable functional materials.
The aim of this initiative is to enable large-scale processing of advanced functional materials at the atomic level for future nanotechnologies. Therefore, the Competence Center at IFW Dresden has been upgraded with an industrial MOCVD reactor. This system enables highly precise process control, especially with newly developed precursors, greatly enhancing the institute’s materials research capabilities. In addition, a state-of-the-art atomic layer deposition (ALD) platform has been installed, providing advanced capabilities for the deposition of a wide range of material systems, including 2D materials, metals, and dielectric thin films on technologically relevant substrate sizes. The system is also compatible with custom-designed precursor compounds, creating new opportunities for process development and materials innovation. Together, these developments further strengthen the Competence Center’s role as a bridge between fundamental research and application-driven development.
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