Two stylized molecule figures with faces, one on a red background and the other on a gray background


Infrastructure

Advanced infrastructure and shared facilities form the backbone of the group’s research activities and scientific collaborations. From materials synthesis and processing to high-resolution characterization and data analysis, the available resources enable innovative and interdisciplinary approaches to modern materials research. Together, they create an environment that supports scientific exchange, technological development, and collaborative discovery.

Our work is supported by specialized infrastructure enabling synthesis, processing, and characterization.

 

ALD and MOCVD Competence Center

The aim of this initiative is to enable large-scale processing of advanced functional materials at the atomic level for future nanotechnologies. Therefor the Competence Center at IFW Dresden has been upgraded with an industrial MOCVD reactor from Agnitron Technology (USA). This system enables highly precise process control, especially with newly developed precursors, greatly enhancing the institute’s materials research capabilities. Recently, an ALD reactor from Veeco Systems (Fiji) capable of handling 200 mm wafers and growing a wide variety of material systems, including 2D materials, metals, and dielectrics, was installed. This tool can also handle custom-made precursors. Together, these developments further strengthen the competence center’s role as a bridge between fundamental research and application-driven development.

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Research Process at "Molecules to Material"

Scientific discovery begins with ideas and is realized through advanced research capabilities. From molecular precursor design to the fabrication and characterization of functional materials, the infrastructure available to the group provides the technological foundation for innovative research in materials chemistry and thin-film science.

1. Precursor Design, Synthesis and Characterization

Development and synthesis of metal-organic precursor compounds form the foundation of the group's research activities.

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2. Thin Film Fabrication

Advanced deposition technologies enable the translation of molecular precursors into functional thin-film materials.

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3. Materials Characterization

Comprehensive characterization provides insight into structure, composition, and functional performance.

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4. Advanced Institute Facilities

Through the shared infrastructure of IMC and IFW Dresden, additional specialized characterization and processing capabilities are available.

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