Our research bridges molecular design and materials science, developing metal–organic precursors and thin film processes for advanced technological applications, supported by our team, infrastructure, and collaborative network.
Our research bridges molecular design and materials science, developing metal–organic precursors and thin film processes for advanced technological applications, supported by our team, infrastructure, and collaborative network.
Our group focuses on the development of metal-organic complexes suitable as precursors for the fabrication of thin film materials via chemical vapor deposition (CVD), atomic layer deposition (ALD) and chemical solution deposition (CSD).
Our team brings together expertise at all levels, from the group leader to postdocs, PhD students, scholarship recipients, and visiting researchers.
Discover the research infrastructure available to our group, enabling innovative experiments, advanced analyses, and collaborative work across disciplines.
Explore our research through featured highlights, a comprehensive list of current and past publications, and a record of invited talks that reflect our ongoing contributions to the field.
We welcome your questions and ideas—reach out to connect with our team and learn more about our work.
For inquiries, collaborations, or additional information, please use the contact details provided below.
Leibniz Institute for Solid State and Materials Research Dresden
Helmholtzstr. 20
01069 Dresden
Germany
Brit Präßler-Wüstling
Phone: +49 (0) 351 4659 217
E-mail: b.praessler@ifw-dresden.de
E-mail: office-imc@ifw-dresden.de
Katja Peschel
Phone: +49 (0) 351 4659 304
E-mail: k.peschel@ifw-dresden.de
E-mail: office-imc@ifw-dresden.de
