Publications

Chemistry A European Journal - 16/2022: Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition (Chem. Eur. J. 16/2022)

Graphical Abstract

A series of new N-heterocyclic carbene (NHC) based Cu(I) and Ag(I) complexes were synthesized, analyzed, and evaluated for their potential usage in atomic layer deposition (ALD) of coinage metal thin films. Employing the same set of diketonate-type ligands for both metals did result in thermally stable Cu(I) complexes suitable for ALD, while the Ag(I) complexes exhibit an inherently unstable nature and different bonding features. More information can be found in the Research Article by Anjana Devi et al. (DOI: 10.1002/chem.202103798).

Chemistry of Materials Vol 34/Issue 1: Ferromagnetic Europium Sulfide Thin Films: Influence of Precursors on Magneto-Optical PropertiesClic

Europium sulfide (EuS) thin films are appealing as ferromagnetic semiconductors and luminescent and optomagnetic materials owing to their unique functional properties. With the emerging field of spintronics and magneto-optical devices, chemical vapor deposition (CVD) offers a versatile platform to tune the material properties and the method to fabricate device structures needed for such applications. Herein, we report the growth of high-quality cubic EuS via a versatile CVD process where the new Eu(III) precursors employed facilitate the formation of the target EuS layers under moderated process conditions. Based on the prior evaluation of the physicochemical properties of these precursors using thermal analysis and density functional theory studies, adequate volatility, thermal stability, and sufficient reactivity toward potential co-reactants, namely, elemental sulfur, could be inferred. Thus, the use of toxic hydrogen sulfide generally needed for sulfide film depositions could be avoided, which is a significant advantage in terms of simplifying the deposition process. The as-deposited thin films were analyzed in terms of the structure, composition, and morphology, revealing highly oriented polycrystalline and stoichiometric EuS films. [..]

Journal of Materials Chemistry C (Issue 32, 2021): Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metal–organic chemical vapour deposition†

Abstract

The unique structural and electronic properties of transition metal dichalcogenides (TMDs) and in particular tungsten disulphide (WS₂) make them interesting for a variety of applications such as the electrocatalytic hydrogen evolution reaction (HER) for water splitting devices and chemiresistive gas sensors. The key parameter for the realisation of these devices is the controlled large-area growth of WS₂ combined with tuning the surface morphology and electronic properties which is achieved by bottom-up fabrication methods such as chemical vapour deposition (CVD). In this study, 2H-WS₂ films are fabricated by a new metal–organic CVD (MOCVD) process resulting in the growth of crystalline, pure, and stoichiometric films which was accomplished at temperatures as low as 600 °C as confirmed by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering spectrometry (RBS)/nuclear reaction analysis (NRA), and Raman spectroscopy. The surface morphology of WS₂ layers was investigated by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HR-TEM). [..]

Chemistry A European Journal - (Chem. Eur. J. 15/2021): Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application

New metalorganic precursors of cerium and ytterbium have been developed in this systematic study. Among them, a homoleptic guanidinate-based cerium complex has been demonstrated as a promising precursor for water-assisted atomic layer deposition of CeO₂ thin films. More information can be found in the Full Paper by A. Devi et al. on page 4913.

Chemical Communications - Issue 89, 2020: A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

This paper demonstrates a carbene stabilized precursor [Cu(^t^BuNHC)(hmds)] with suitable volatility, reactivity and thermal stability, that enables the spatial plasma-enhanced atomic layer deposition (APP-ALD) of copper thin films at atmospheric pressure. The resulting conductive and pure copper layers were thoroughly analysed and a comparison of precursor and process with the previously reported silver analogue [Ag(^t^BuNHC)(hmds)] revealed interesting similarities and notable differences in precursor chemistry and growth characteristics. This first report of APP-ALD grown copper layers is an important starting point for high throughput, low-cost manufacturing of copper films for nano- and optoelectronic devices.

Dalton Transactions - Issue 31, 2020: Additive-free spin coating of tin oxide thin films: synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes

Abstract

The fabrication of SnO_x in thin film form via chemical solution deposition (CSD) processes is favored over vacuum based techniques as it is cost effective and simpler. The precursor employed plays a central role in defining the process conditions for CSD. Particularly for processing SnO₂ layers that are appealing for sensor or electronic applications, there are limited precursors available for CSD. Thus the focus of this work was to develop metalorganic precursors for tin, based on the ketoiminate ligand class. [..]

Our scientific contributions reflect ongoing advances in precursor chemistry and thin film technologies.

Publications at IFW

Journal Papers

J. Obenlüneschloß, R. Pathak, V. Rozyyev, A.U. Mane, T. Gemming, D. Rogalla, J.W. Elam, A. Devi
Expanding the zinc precursor toolbox: a comparative study of precursors for thermal ALD of ZnO thin films
Dalton Transactions 55, 3853-3865 (2026) URL

J.-P. Glauber, N. Boysen, S. Baspinar, A. Kostka, D. Rogalla, A. Ostendorf, H. Parala, T.-M. Chung, A. Devi
A New Synthetic Method for HfS₂ Thin Films Using MOCVD
ACS Applied Materials & Interfaces 18, 10491-10502 (2026) URL

B.O.A. Fauzi, A. Lichtenberg, C. Hegemann, T. Fischer, M. Schmickler, H. Parala, A. Devi, S. Mathur
Hf_xZr_1−xO₂ thin films from chemical vapor deposition of fluorinated β-ketoenamine precursors
RSC Applied Interfaces 1-15 (2026) URL

J.-P. Glauber, J. Lorenz, J. Liu, M. Seifert, V. Hoffmann, C. Abad, D. Rogalla, L. Giebeler, C. Harms, M. Wark, M. Nolan, A. Devi
VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties
Small Methods 10, e01972/1-15 (2026) URL

F. Preischel, K. Rönnby, M. Wilken, J.-P. Glauber, S. Froeschke, D. Rogalla, T. Gemming, A.A. Popov, P. Dement, M. Nolan, A. Devi
A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films
Small e11982/1-18 (2026) URL

M.A. Moreno, A. Devi, L. Velasquez, G. Gonzalez, D. Navas
Metamorphosis of Multilayered‐(NH₄)₂V₇O₁₆ Squares to Zinc Vanadate and w‐ZnO Nanoparticles via Zinc Metalation through Atomic Layer Deposition: Precision and Sustainability in Material Transformation
Chemistry–Methods 6, e202500066/1-12 (2026) URL

J.-P. Glauber, M. Moors, D.A. Ryndyk, E. Najafidehaghani, J. Lorenz, R.-M. Maas, N. Boysen, H. Parala, T. Heine, A. Devi, K. Monakhov
Tunable Electronic and Optoelectronic Properties of MoS₂ Through Molecular Coverage‐Controlled Polyoxometalate Doping
Advanced Electronic Materials 12, e00706/1-12 (2026) URL

C. Bauden, J. Haag, A. Mendez, F. Munnik, F. Ganss, A. Wennberg, I. Fernandez, I. Kaban, H. Parala, A. Devi, M. Krause
Formation and Characterization of Transparent Conductive Oxide SnO₂:Ta Grown at Low Deposition Temperature
physica status solidi (b) 263, e202500625/1-10 (2026) URL

P. Ranjan, P. Raizada, P. Singh, A. Devi, B. Saha, A. Singh
Functional Nanomaterials Based Electrochemical and Chemiresistive Sensors for Hydrogen Detection: A Review
Chemistry – An Asian Journal 20, e00712/1-20 (2025) URL

J. Obenlüneschloß, J. Klimars, I. Selvakumar, B. Mallick, M. Schmickler, M. Wilken, D. Rogalla, M. Gock, M. Unkrig-Bau, J.-N. Huster, A. Devi
Heteroleptic Ruthenium p-Cymene Amidinate Complexes─A Synthetic Endeavor to Unearth Precursors for Ru Thin Films
Inorganic Chemistry 64, 21903-21918 (2025) URL

J. Obenlüneschloß, N. Boysen, K. Rönnby, A. Muriqi, V. Hoffmann, C. Abad, D. Rogalla, U. Brokmann, E. Rädlein, M. Nolan, A. Devi
Rare Mononuclear Lithium–Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films
Angewandte Chemie International Edition 64, e202513066/1-11 (2025) URL

J. Liu, J.-P. Glauber, J. Lorenz, D. Rogalla, C. Harms, A. Devi, M. Nolan
Surface Oxidation of Transition Metal Nitrides
The Journal of Physical Chemistry C 129, 11173-11182 (2025) URL

F. Preischel, D. Zanders, J.-P. Glauber, K. Rönnby, D. Rogalla, T. Gemming, P. Dement, M. Nolan, A. Devi
Plasma-enhanced atomic layer deposition of AlPO₄/AlP_xO_y: comparing dual source and supercycle approaches for composition control
Dalton Transactions 54, 17507-17520 (2025) URL

G. Bartholazzi, T. Jussila, J. Obenlüneschloß, V. Vähänissi, A. Devi, H. Savin, M. Karppinen, D.H. Macdonald, L.E. Black
Atomic-layer-deposited CuxCryOz thin films: Optoelectronic properties and potential application as hole-selective contacts for c-Si solar cells
Applied Surface Science 683, 161793/1-10 (2025) URL

F. Preischel, K. Rönnby, L. Mai, D. Zanders, D. Rogalla, B. Mallick, M. Nolan, A. Devi
Near Room-Temperature Atomic Layer Deposition of Magnesium Oxide Using Bis-3-(N,N-dimethylamino)propyl Magnesium(II) and Water
Journal of the American Chemical Society 147, 31764-31778 (2025) URL

E. Kessels, A. Devi, J.-S. Park, M. Ritala, A. Yanguas-Gil, C. Wiemer
Atomic layer deposition
Nature Reviews Methods Primers 5, 66/1-25 (2025) URL

A. Ghazy, D. Zanders, A. Devi, M. Karppinen
Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements
Advanced Materials Interfaces 12, 2400274/1-30 (2025) URL

R.-M. Neubieser, L.G. Weckelmann, M. Michel, M. Unruh, D. Zanders, A. Kostka, A. Devi, A. Grabmaier
Gas Sensor for Ammonia and Nitrogen Oxides Made of ALD-Grown MoS₂
IEEE Sensors Letters 9, 2000904/1-4 (2025) URL

P. Kaur, M. Nisula, C. Detavernier, A. Devi
New dithiooxamide derivatives as promising precursors for ALD/MLD applications
Dalton Transactions 54, 14896-14903 (2025) URL

A. Jose, E. Dmitrieva, S. Schiemenz, H. Schlörb, T. Gemming, D. Wolf, A. Devi, A. Gebert
Nanoporous gold nanostructures via overpotential electrodeposition and two-step dealloying for SERS applications
Journal of Alloys and Compounds 1046, 184881/1-14 (2025) URL

J.L. Vazquez-Arce, A. Amoroso, N. Perez, J. Charvot, D. Naglav‐Hansen, P. Zhao, J. Yang, S. Lehmann, A. Wrzesinska-Lashkova, F. Pieck, R. Tonner‐Zech, F. Bureš, A. Acquesta, Y. Vaynzof, A. Devi, K. Nielsch, A. Bahrami
Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth
Angewandte Chemie International Edition 64, e202422578/1-13 (2025) URL

K.Yu. Monakhov, C. Meinecke, M. Moors, C. Schmitz-Antoniak, T. Blaudeck, J. Hann, C. Bickmann, D. Reuter, T. Otto, S.E. Schulz, H. Parala, A. Devi
Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces
Pure and Applied Chemistry 96, 1313-1331 (2024) URL

J.-P. Glauber, J. Lorenz, J. Liu, B. Müller, S. Bragulla, A. Kostka, D. Rogalla, M. Wark, M. Nolan, C. Harms, A. Devi
A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction
Dalton Transactions 53, 15451-15464 (2024) URL

N. Huster, R. Mullins, M. Nolan, A. Devi
Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition
Dalton Transactions 53, 7711-7720 (2024) URL

A. Philip, T. Jussila, J. Obenlüneschloß, D. Zanders, F. Preischel, J. Kinnunen, A. Devi, M. Karppinen
Conformal Zn‐Benzene Dithiol Thin Films for Temperature‐Sensitive Electronics Grown via Industry‐Feasible Atomic/Molecular Layer Deposition Technique
Small 20, 2402608/1-10 (2024) URL

L. Johnston, J. Obenlüneschloß, M.F. Khan Niazi, M. Weber, C. Lausecker, L. Rapenne, H. Roussel, C. Sanchez-Velazquez, D. Bellet, A. Devi, D. Muñoz-Rojas
Assessing the potential of non-pyrophoric Zn(DMP)₂ for the fast deposition of ZnO functional coatings by spatial atomic layer deposition
RSC Applied Interfaces 1, 1371-1381 (2024) URL

J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, T. de los Arcos, V.R. Damerla, A. Kostka, J. Franke, R. Dahlmann, T.D. Kühne, M. Wessling, P. Awakowicz, A. Devi
Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum
Advanced Materials Interfaces 11, 2400171/1-13 (2024) URL

D. V. Christensen, U. Staub, T.R. Devidas, B. Kalisky, K.C. Nowack, J.L. Webb, U.L. Andersen, A. Huck, D.A. Broadway, K. Wagner, P. Maletinsky, T. van der Sar, C.R. Du, A. Yacoby, D. Collomb, S. Bending, A. Oral, H.J. Hug, A.-O. Mandru, V. Neu, H.W. Schumacher, S. Sievers, H. Saito, A.A. Khajetoorians, N. Hauptmann, S. Baumann, A. Eichler, C.L. Degen, J. McCord, M. Vogel, M. Fiebig, P. Fischer, A. Hierro-Rodriguez, S. Finizio, S.S. Dhesi, C. Donnelly, F. Büttner, O. Kfir, W. Hu, S. Zayko, S. Eisebitt, B. Pfau, R. Frömter, M. Kläui, F.S. Yasin, B.J. McMorran, S. Seki, X. Yu, A. Lubk, D. Wolf, N. Pryds, D. Makarov, M. Poggio
2024 roadmap on magnetic microscopy techniques and their applications in materials science
Journal of Physics: Materials 7, 032501/1-82 (2024) URL

M. Wilken, A. Muriqi, A. Krusenbaum, M. Nolan, A. Devi
Targeting Manganese Amidinate and ß‐Ketoiminate Complexes as Precursors for Mn‐Based Thin Film Deposition
Chemistry - A European Journal 30, e202401275/1-13 (2024) URL

N.H. Freitag, C.F. Reiche, V. Neu, P. Devi, U. Burkhardt, C. Felser, D. Wolf, A. Lubk, B. Büchner, T. Mühl
Simultaneous magnetic field and field gradient mapping of hexagonal MnNiGa by quantitative magnetic force microscopy
Communications Physics 6, 11/1-13 (2023) URL

B. Nagy, Y. Khaydukov, D. Efremov, A.S. Vasenko, L. Mustafa, J.-H. Kim, T. Keller, K. Zhernenkov, A. Devishvili, R. Steitz, B. Keimer, L. Bottyan
On the explanation of the paramagnetic Meissner effect in superconductor/ferromagnet heterostructures
epl 116, 17005/1-6 (2016) URL

P.-H. Aubert, A. Neudeck, L. Dunsch, P. Audebert, P. Capdevielle, M. Maumy
Electrochemical synthesis and structural studies of copolymers based on the electrooxidation of pyrrole and some salen compounds
Journal of Electroanalytical Chemistry 470, 77-88

Invited Talks

A. Devi
Ligands as Effective Inhibitors in Area Selective Deposition
Area Selective Deposition Workshop 2024 - ASD2024 | Hotel Place d'Armes
Montreal, Canada, 14.04.2024 - 14.04.2024

T. Mühl, N.H. Freitag, M. Sharma, D. Prasad, C.F. Reiche, V. Neu, P. Devi, U. Burkhardt, C. Felser, D. Wolf, A. Lubk, B. Büchner
Sensors based on Magnetic Nanowires
International Symposium on Integrated Magnetics 2024 (iSIM 2024) | Brazilian Center for Physics Research (CBPF)
Rio de Janeiro, Brasil, 04.05.2024 - 04.05.2024

Publications 2025

Heteroleptic Ruthenium p-Cymene Amidinate Complexes─A Synthetic Endeavor to Unearth Precursors for Ru Thin Films
J Obenlüneschloß, J Klimars, I Selvakumar, B Mallick, M Schmickler, ...
Inorganic Chemistry, 2025

Atomic layer deposition
E Kessels, A Devi, JS Park, M Ritala, A Yanguas-Gil, C Wiemer
Nature Reviews Methods Primers 5 (1), 66, 2025

From Precursors to Performance: Understanding the Chemistry in NiO Atomic Layer Deposition for Optimized Device Functionality
V Kannampalli, M Schmickler, A Devi, B Fabre, C Lagrost, L Santinacci
248th ECS Meeting (October 12-16, 2025), 2025

Functional Nanomaterials Based Electrochemical and Chemiresistive Sensors for Hydrogen Detection: A Review
P Ranjan, P Raizada, P Singh, A Devi, B Saha, A Singh
Chemistry–An Asian Journal, e00712, 2025

Rare mononuclear lithium–carbene complex for atomic layer deposition of lithium containing thin films
J Obenlüneschloß, N Boysen, K Rönnby, A Muriqi, V Hoffmann, C Abad, ...
Angewandte Chemie International Edition, e202513066, 2025

Low-temperature, high-throughput spatial atomic layer deposition of NiOx nanocrystalline thin films from [Ni (ipki) 2]r
S Porcar, M Schmickler, H Okcu, J Obenlüneschloß, S d’Ercole, ...
Applied Surface Science Advances 29, 100836, 2025

Near Room-Temperature Atomic Layer Deposition of Magnesium Oxide Using Bis-3-(N,N-dimethylamino)propyl Magnesium(II) and Water
F Preischel, K Rönnby, L Mai, D Zanders, D Rogalla, B Mallick, M Nolan, ...
Journal of the American Chemical Society 147 (35), 31764-31778, 2025

High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces
JP Glauber, J Lorenz, J Liu, M Seifert, V Hoffmann, C Abad, D Rogalla, ...
...

Surface Oxidation of Transition Metal Nitrides
J Liu, JP Glauber, J Lorenz, D Rogalla, C Harms, A Devi, M Nolan
The Journal of Physical Chemistry C, 2025

Outside Front Cover: Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth (Angew. Chem. 15/2025)
JLV Arce, A Amoroso, N Perez, J Charvot, DN Hansen, P Zhao, J Yang, ...
Angewandte Chemie 137 (15), e202506105, 2025

Niedertemperatur‐Atomlagenabscheidung von (00l)‐Orientiertem Elementarem Bismut
JL Vazquez‐Arce, A Amoroso, N Perez, J Charvot, D Naglav‐Hansen, ...
Angewandte Chemie 137 (15), e202422578, 2025

Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth
JL Vazquez‐Arce, A Amoroso, N Perez, J Charvot, D Naglav‐Hansen, ...
Angewandte Chemie International Edition 64 (15), e202422578, 2025

Gas Sensor for Ammonia and Nitrogen Oxides Made of ALD Grown MoS₂
RM Neubieser, LG Weckelmann, M Michel, M Unruh, D Zanders, A Kostka, ...
IEEE Sensors Letters, 2025

Atomic-layer-deposited CuxCryOz thin films
G Bartholazzi, T Jussila, J Obenlüneschloß, V Vähänissi, A Devi, H Savin, ...
...

Atomic-layer-deposited CuxCryOz thin films: Optoelectronic properties and potential application as hole-selective contacts for c-Si solar cells
G Bartholazzi, T Jussila, J Obenlüneschloß, V Vähänissi, A Devi, H Savin, ...
Applied Surface Science 683, 161793, 2025

Atomic and molecular layer deposition of functional thin films based on rare earth elements
A Ghazy, D Zanders, A Devi, M Karppinen
Advanced Materials Interfaces 12 (4), 2400274, 2025

Atomic Layer Deposition of NiO x: Harnessing the Potential of New Precursor Combinations for Photoelectrochemical Water Oxidation
V Kannampalli, M Schmickler, B Fabre, L Largeau, A Seyeux, A Jose, ...
Journal of Materials Chemistry A, 2025

Plasma-Enhanced Atomic Layer Deposition of AlPO 4/AlP x O y: Comparing Dual Source and Supercycle Approaches for Composition Control
F Preischel, D Zanders, JP Glauber, K Rönnby, D Rogalla, T Gemming, ...
Dalton Transactions, 2025

New dithiooxamide derivatives as promising precursors for ALD/MLD applications
P Kaur, M Nisula, C Detavernier, A Devi
Dalton Transactions, 2025
Ein seltener mononuklearer Lithium‐Carben‐Komplex für die Atomlagenabscheidung von lithiumhaltigen Dünnschichten
J Obenlüneschloß, N Boysen, K Rönnby, A Muriqi, V Hoffmann, C Abad, ... Angewandte Chemie, e202513066, 2025

Surface Oxidation of Transition Metal Nitrides
J. Liu, J.-P. Glauber, J. Lorenz, D. Rogalla, C. Harms, A. Devi, M. Nolan
J. Phys. Chem. C, 2025, XXXX, XXX, XXX-XXX

Publications 2024

Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces
K. Yu. Monakhov, C. Meinecke, M. Moors, C. Schmitz-Antoniak, T. Blaudeck , J. Hann, C. Bickmann, D. Reuter, T. Otto, S. E. Schulz, H. Parala, A. Devi
Pure Appl. Chem., 2024, 96, 9, 1313-1331

Assessing the potential of non-pyrophoric Zn(DMP)₂ for the fast deposition of ZnO functional coatings by spatial atomic layer deposition
L. Johnston, J. Obenlüneschloß, M. Farooq Khan Niazi, M. Weber, C. Lausecker, L. Rapenne, H. Roussel, C. Sanchez-Velazquez, D. Bellet, A. Devi, D. Muñoz-Rojas
RSC Appl. Interfaces, 2024, Advanced Article

A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction
J.-P. Glauber, J. Lorenz, J. Liu, B. Müller, S. Bragulla, A. Kostka, D. Rogalla, M. Wark, M. Nolan, C. Harms, A. Devi,
Dalton Trans., 2024, Advance Article

Tuning the Permeation Properties of Poly(1-trimethylsilyl-1-propyne) by Vapor Phase Infiltration Using Trimethylaluminum
J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, T. de los Arcos, V. Raj Damerla, A. Kostka, J. Franke, R. Dahlmann, T. D. Kühne, M. Wessling, P. Awakowicz, A. Devi,
Adv. Mater. Interfaces, 2024, 2400171

Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements
A. Ghazy, D. Zanders, A. Devi, M. Karppinen,
Adv. Mater. Interfaces, 2024, 2400274

Targeting Manganese Amidinates and ß-Ketoiminates Complexes as Precursors for Mn-Based Thin Film Vapor Deposition
M. Wilken, A. Muriqi, A. Krusenbaum, M. Nolan, A. Devi
Chem. Eur. J., 2024, e202401275

Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition
N. Huster, R. Mullins, M. Nolan, A. Devi
Dalton Trans., 2024, 53, 7711 – 7720

Publications 2023

Ultrafast surface-specific spectroscopy of water at a photoexcited TiO₂ model water-splitting photocatalyst
E. H. G. Backus, S. Hosseinpour, C. Ramanan, S. Sun, S. J. Schlegel, M. Zelenka, X. Jia, M. Gebhard, A. Devi, H. I. Wang, M. Bonn
Angew. Chem. Int. Ed., 2023, e202312123

In pursuit of next generation N-heterocyclic carbene-stabilized copper and silver precursors for metalorganic chemical vapor deposition and atomic layer deposition processes
I. Selvakumar, N. Boysen, M. Bürger, A. Devi
Chemistry, 2023, 5, 2038

Ultrashort pulse laser annealing of amorphous atomic layer deposited MoS₂ films
M. J. M. J. Becher, J. Jagosz, R.-M. Neubieser, J.-L. Wree, A. Devi, M. Michel, C. Bock, E, L. Gurevich, A. Ostendorf
Adv. Eng. Mater., 2023, 25, 2300677

Advances in photo-assisted seawater splitting promoted by green iron oxide-carbon nitride photoelectrocatalysts
M. Benedet, G. A Rizzi, O. I Lebedev, V. Roddatis, C. Sada, J.-L Wree, A. Devi, C. Maccato, A. Gasparotto, D. Barreca
J. Mater. Chem. A, 2023, 11 (40), 21595

PECVD and PEALD on polymer substrates (Part I): Fundamentals and analysis of plasma activation and thin film growth
T. de los Arcos, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T. D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. Grundmeier
Plasma Process Polym., 2023, e 2300150

PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films
T. de los Arcos, P. Awakowicz, M. Böke, N. Boysen, R. P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T. D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier
Plasma Process Polym., 2023, e 2300186

Fe₂O₃-graphitic carbon nitride nanocomposites analyzed by XPS
M. Benedet, D. Barreca, G. A. Rizzi, C. Maccato, J-L. Wree, A. Devi, A. Gasparotto
Surf. Sci. Spectra, 2023, 30, 024021

Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al₂O₃ atomic layer deposition
X. Xie, D. Zanders, F. Preischel, T. de los Arcos, A. Devi, G. Grundmeier
Surf. Interface Anal., 2023, 55, 886

Interplay of Precursor and Plasma for The Deposition of HfO₂ via PEALD: Film Growth and Dielectric Properties
F. Preischel, D. Zanders, T. Berning, A. Kostka, D. Rogalla, C. Bock, A. Devi
Adv. Mater. Interfaces, 2023, 2300244

The impact of plasma enhancement on the deposition of carbon containing zirconia films by metalorganic chemical vapor deposition
P. A. Maaß, V. Bedarev, L. Chauvet, M. Prenzel, J.-P. Glauber, A. Devi, M. Böke, A. von Keudell
Plasma Processes Polym., 2023, e2300050

Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor
S. Stefanovic, N. Gheshlaghi, D. Zanders, I. Kundrata, B. Zhao, M. K. S. Barr, M. Halik, A. Devi, J. Bachmann
Small, 2023, 2301774

Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It
M. Weber, N. Boysen, O. Graniel, A. Sekkat, C. Dussarrat, P. Wiff, A. Devi, D. Muñoz-Rojas
ACS Mater. Au, 2023, 3, 4, 274–298

Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing
J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. Devi
ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512

Publications 2022

Size and shape exclusion in 2D silicon dioxide membranes
P. Dementyev, N. Khayya, D. Zanders, I. Ennen, A. Devi, E. Altman
Small, 2022, 2205602

Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal–organic complexes
N. Boysen, A. Devi
Eur. J. Mass Spectrometry, 2022, 29(1), 12-20

Heterostructured α‐Fe₂O₃@ZnO@ZIF‐8 Core–Shell Nanowires for a Highly Selective MEMS‐Based ppb‐Level H₂S Gas Sensor System
L.‐Y. Zhu, X.‐Y. Miao, L.‐X. Ou, L.‐W. Mao, K. Yuan, S. Sun, A. Devi, H.‐L. Lu
Small, 2022, 18, 2204828

Highly sensitive and stable MEMS acetone sensors based on well-designed α-Fe₂O₃/C mesoporous nanorods
L.-Y. Zhu, K. Yuan, Z.-C. Li, X.-Y. Miao, J.-C. Wang, S. Sun, A. Devi, H.-L. Lu
J. Colloid Interface Sci., 2022, 622, 156

CVD grown tungsten oxide for low temperature hydrogen gas sensors: Tuning surface characteristics via materials processing for sensing applications
M. Wilken, E. Ciftyürek, S. Cwik, L. Mai, B. Mallick, D. Rogalla, K. D. Schierbaum, A. Devi
Small, 2022, 2204636

High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors
N. Boysen, J.-L. Wree, D. Zanders, D. Rogalla, D. Öhl, W. Schuhmann, A. Devi
ACS Appl. Mater. Interfaces, 2022, 14, 46, 52149–52162

Nucleation and growth studies of large-area deposited WS2 on flexible substrates
T. Berning, M. Becher, J.-L. Wree, J. Jagosz, A. Kostka, A. Ostendorf, A. Devi, C. Bock
Mater. Res. Express, 2022, 9, 116401

Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction
D. Zanders, J. Obenlüneschloß, J.-L. Wree, J. Jagosz, P. Kaur, N. Boysen, D. Rogalla, A. Kostka, C. Bock, D. Öhl, M. Gock, W. Schuhmann, A. Devi
Adv. Mater. Interfaces, 2022, 2201709

Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure
T. Hasselmann, B. Misimi, N. Boysen, D. Zanders, J.-L. Wree, D. Rogalla, T. Haeger, F. Zimmermann, K. O. Brinkmann, S. Schädler, D. Theirich, R. Heiderhoff, A. Devi, T. Riedl
Adv. Mater. Technol., 2022, 2200796

An Unusual Tri-coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes
D. Zanders, J. D. Masuda, B. Lowe, S. Curtis, A. Devi, S. T. Barry
Z. anorg. allg. Chem., 2022, e202200249

SnO via Water Based ALD employing Tin(II) Formamidinate: Precursor Characterization and Process Development
N. Huster, R. Ghiyasi, D. Zanders, D. Rogalla, M. Karppinen, A. Devi
Dalton Trans., 2022, 51, 14970-14979

Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors
A. Philip, L. Mai, R. Ghiyasi, A. Devi, M. Karppinen
Dalton Trans., 2022, 51, 14508-14516

Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films
J.-L. Wree, J.-P. Glauber, D. Zanders, D. Rogalla, M. Becher, M. B. E. Griffiths, A. Ostendort, S. T. Barry, A. Ney, A. Devi
ACS Appl. Electron. Mater., 2022, 4, 8, 3772–3779

Atomic / Molecular Layer Deposition of Cerium (III) Hybrid Thin Films using Rigid Organic Precursors
P. Kaur, A. Muriqi, J.-L. Wree, R. Ghiyasi, M. Safdar, M. Nolan, M. Karppinen, A. Devi
Dalton Trans., 2022, 51, 5603-5611

Low-temperature ALD process development of 200 mm wafer-scale MoS₂ for gas sensing application
R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A. Devi, C. Bock, M. Michel, A. Grabmaier
Micro Nano Eng., 2022, 15, 100126

Molecular Permeation in Freestanding Bilayer Silica
Daniil Naberezhnyi, L. Mai, N. Doudin, I. Ennen, A. Hütten, E. I. Altman, A. Devi, P. Dementyev
Nano Lett., 2022, 22, 3, 1287–1293

Bendable Polycrystalline and Magnetic CoFe₂O₄ Membranes by Chemical Methods
P. Salles, R. Guzmán, D. Zanders, A. Quintana, I. Fina, F. Sánchez, W. Zhou, A. Devi, M. Coll
ACS Appl. Mater. Interfaces, 2022, 14, 10, 12845–12854

Role of anionic backbone in NHC-stabilized coinage metal complexes: New precursors for atomic layer deposition
N. Boysen, A. Philip, D. Rogalla, M. Karppinen, A. Devi
Chem. Eur. J., 2022, 28, e202103798

Ferromagnetic europium sulfide thin films: Influence of precursors on magneto-optical properties
S. M. J. Beer, M. Arbersha, P. Lindner, M. Winter, D. Rogalla, M. Nolan, A. Ney, J. Debus, A. Devi
Chem. Mater., 2022, 34, 1, 152–164.

Influence of Different Ester Side Groups in Polymers on the Vapor Phase Infiltration with Trimethyl Aluminum
L. Mai, D. Maniar, F. Zysk, J. Schöbel, T. Kühne, K. Loos, A. Devi
Dalton Trans., 2022, 51, 1384–1394.

Publications 2021

Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties
D. Zanders, N. Boysen, M. A. Land, J. Obenlüneschloß, J. D. Masuda, B. Mallick, S. T. Barry, A. Devi
Eur. J. Inorg. Chem., 2021, e202100851

CVD grown GaSb_xN_1-x films as visible-light active photoanodes
D. Zywitzki, D. Mitoraj, Y. Vilk, O. Mendoza Reyes, M. Schleuning, D. Friedrich, A. Sadlo, D. Rogalla, R. Eichberger, R. Beranek, A. Devi
Dalton Trans., 2021, 50, 14832-14841.

Chemical vapor deposition of Cobalt and Nickel Ferrite thin films: Investigation of structure and pseudocapacitive properties
D. Zywitzki, R. Schaper, E. Ciftyürek, J.-L. Wree, D. H. Taffa, D. M. Baier, D. Rogalla, Y. Li, M. Meischein, A. Ludwig, Z. Li, K. Schierbaum, M. Wark, A. Devi
Adv. Mater. Interfaces, 2021, 8, 2100949.

A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
S. M. J. Beer, N. Boysen, A. Muriqi, D. Zanders, T. Berning, D. Rogalla, C. Bock, M. Nolan, A. Devi
Dalton Trans., 2021, 50, 12944-12956.

Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metalorganic chemical vapour deposition
J.‑L. Wree, J.‑P. Glauber, D. Öhl, A. Niesen, A. Kostka, D. Rogalla, W. Schuhmann, A. Devi
J. Mater. Chem. C, 2021, 9, 10254-10265.

Atomic Layer Deposition of High-Quality Copper Metal Films from Cu(acac)₂ and Hydroquinone Reductant
T. S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen
Adv. Eng. Mater., 2021, 23, 2100446.

Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low Resistivity Co Thin Films
D. Zanders, J. Liu, J. Obenlüneschloß, C. Bock, D. Rogalla, L. Mai, M. Nolan, S. T. Barry, A.Devi
Chem. Mater, 2021, 33, 13, 5045-5057.

Direct liquid injection chemical vapor deposition of ZrO₂ films from a heteroleptic Zr precursor: interplay between film characteristics and corrosion protection of stainless steel
S. M. J. Beer, D. Samelor, A. Abdel Aal, J. Etzkorn, D. Rogalla, A. E. Turgambaeva, J. Esvan, A. Kostka, C. Vahlas, A. Devi
J. Mater. Res. Technol., 2021, 13, 1599-1614.

Investigation of an atomic-layer-deposited Al₂O₃ diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform
Y. Li, D. Zanders, M. Meischein, A. Devi, A. Ludwig
Surf. Interface Anal., 2021, 53, 727-733.

(^tBuN)SiMe₂NMe₂ – A new N,N’-Κ₂-monoanionic ligand for atomic layer deposition precursors
M. B. E. Griffiths, D. Zanders, M. A. Land, J. D. Masuda, A. Devi, S. T. Barry
J. Vac. Sci. Technol., A, 2021, 39, 032409.

Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application
P. Kaur, L. Mai, A. Muriqi, D. Zanders, R. Ghiyasi, M. Safdar, N. Boysen, M. Winter, M. Nolan, M. Karppinen, A. Devi
Chem. Eur. J., 2021, 27, 4913–4926.

Atomic layer deposition of dielectric Y₂O₃ thin films from a homoleptic yttrium formamidinate precursor and water
N. Boysen, D. Zanders, T. Berning, S. M. J. Beer, D. Rogalla, C. Bock, A. Devi,
RSC Advances, 2021, 11, 2565-2574.

Fabrication of Gd_xFe_yO_z films using an atomic layer deposition-type approach
P. Yu, S. M. J. Beer, A. Devi, M. Coll,
CrystEngComm., 2021, 23, 730-740.

Publications 2020

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
N. Boysen, B. Misimi, A. Muriqi, J.-L. Wree, T. Hasselmann, D. Rogalla. T. Haeger, D. Theirich, M. T. Riedl, A. Devi
Chem. Commun., 2020, 56, 13752-13755.

A new metalorganic chemical vapor deposition process for MoS₂ with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
J.-L. Wree, E. Ciftyurek, D. Zanders, N. Boysen, A. Kostka, D. Rogalla, M. Kasischke, A. Ostendorf, K. Schierbaum, A. Devi
Dalton Trans., 2020, 49, 13462-13474.

Study on structural and thermal characteristics of heteroleptic yttrium complexes as potential precursors for vapor phase deposition
S. M. J. Beer, A. Krusenbaum, M. Winter, C. Vahlas, A. Devi,
Eur. J. Inorg. Chem., 2020, 3587–3596.

Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts
D. Zywitzki, D. Taffa, L. Lamkowski, M. Winter, D. Rogalla, M. Wark, A. Devi,
Inorg. Chem., 2020, 59, , 14, 10059–10070.

Additive-free spin coating of tin oxide thin films: Synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes
N. Huster, D. Zanders, S. Karle, D. Rogalla A. Devi,
Dalton Trans., 2020, 49, 10755-10764.

A Rare Low‐Spin Co(IV) Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration
D. Zanders, G. Bačić, D. Leckie, D. O. Odegbesan, J. Rawson, J. D. Masuda, A. Devi, S. T. Barry,
Angew. Chem., Int. Ed., 2020, 59, 33, 14138-14142.

From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
L. Mai, F. Mitschker, C. Bock, A. Niesen, E. Ciftyurek, D. Rogalla, J. Mickler, M. Erig, Z. Li, P. Awakowicz, K. Schierbaum, A. Devi,
Small, 2020, 16, 1907506.

Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO₄, CuO, and WO₃ Thin Films for Photoelectrocatalysis
J. Hirst, S. Müller, D. Peeters, A. Sadlo, L. Mai, O. Mendoza Reyes, D. Friedrich, D. Mitoraj, A. Devi, R. Beranek, R. Eichberger,
Z. Phys. Chem., 2020, 234(4), 699–717.

Publications 2019

PEALD of HfO₂ Thin Films: Precursor Tuning and a New Near Ambient Pressure XPS Approach to in-situ Examination of Thin Film Surfaces Exposed to Reactive Gases
D. Zanders, E. Ciftyurek, E. Subaşı, N. Huster, C. Bock, A. Kostka, D. Rogalla, K. Schierbaum and A. Devi
ACS Appl. Mater. Interfaces, 2019, 11, 31, 28407-28422.

Up-converting ALD/MLD thin films with Yb³⁺, Er³⁺ in amorphous organic framework
M. Tuomisto, Z. Giedraityte, L. Mai, A. Devi, V. Boiko, K. Grzeszkiewicz, D. Hreniak, M. Karppinen, M. Lastusaari
J. Lumin., 2019, 215, 310-315

How Water Flips at Charged Titanium Dioxide: An SFG-Study on the Water-TiO₂-Interface
S. J. Schlegel, S. Hosseinpour, M. Gebhard, A. Devi, M. Bonn, E. H.G. Backus,
Phys. Chem. Chem. Phys., 2019, 21, 8956-8964

Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide
L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. Devi
Chem. – Eur. J., 2019, 25, 7489 –7500

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,
ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180

Luminescent Nd₂S₃ thin films: A new chemical vapour deposition route towards rare-earth sulphides
S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. Devi
Dalton Trans., 2019, 48, 2926 – 2938

Validation of a terminally amino functionalized tetra alkyl Sn(IV) precursor in metalorganic chemical vapor deposition of SnO₂ thin films: Study of film growth characteristics, optical and electrical properties
D. Zanders, E. Ciftyurek, C. Hoppe, A. Kostka, D. Rogalla, T. de los Arcos, G. Grundmeier, K. D. Schierbaum, A. Devi
Adv. Mater. Interfaces2019, 6, 1801540

Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films
A. Sadlo, D. Peeters, R. Albert, D. Rogalla, H.-W. Becker, R. Schmechel, A. Devi,
J. Nanosci. Nanotechnol.2019, 19, 867-876

Publications 2018

Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics
D. K. Ngwashi, S. Paul, A. Devi, R. B. M. Cross,
Advances in Materials2018, 7(4), 137-143

Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato precursors: Process Development, Film Characterization, and Gas Sensing Properties
M. Mattinen, J.-L. Wree, N. Stegmann, E. Ciftyurek, M. E. Achhab, P. J. King, K. Mizohata, J. Räisänen, K. D. Schierbaum, A. Devi, M. Ritala, M. Leskelä,
Chem. Mater.2018, 30(23), 8690-8701

Atomic/molecular layer deposition of Cu–organic thin films
D. J. Hagen, L. Mai, A. Devi, J. Sainioc, M. Karppinen,
Dalton Trans.2018, 47, 15791-15800

An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure
N. Boysen, T. Hasselmann, S. Karle, D. Rogalla, D. Theirich, M. Winter, T. Riedl, A. Devi,
Angew. Chem. Int. Ed.2018, 57, 16224–16227

Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate
M. Siebels, L. Mai, L. Schmoltke, K. Schütte, J. Barthel, J. Yue, J. Thomas, B. M. Smarsly, A. Devi, R. A. Fischer, C. Janiak,
Beilstein J. Nanotechnol.2018, 9, 1881-1894

Designing Stability into Thermally Reactive Plumbylenes
Bačić, G., Zanders, D., Mallick, B., Devi, A., Barry, S. T.
Inorg. Chem.2018, 57, 8218−8226

Direct growth of MoS₂ and WS₂ layers by Metal Organic Chemical Vapor Deposition
S. Cwik, D. Mitoraj, D. Rogalla, D. Peeters, J. Kim, O. Mendoza Reyes, H. M. Schütz, C. Bock, R. Beranek, A. Devi,
Adv. Mater. Interfaces2018, 5, 1800140

Fabrication of Zinc-Dicarboxylate- and Zinc-Pyrazolate-Carboxylate-Framework Thin Films through Vapour-Solid Deposition
R. Medishetty, Z. Zhang, A. Sadlo, S. Cwik, D. Peeters, S. Henke, N. Mangayarkarasi, A. Devi,
Dalton Trans.2018, 47, 14179-14183

Rational development of cobalt β-ketoiminate complexes: Alternative precursors for vapor phase deposition of spinel cobalt oxide photoelectrodes
K. j. Puring, D. Zywitzki, D. H. Taffa, D. Rogalla, M. Winter, M. Wark, A. Devi,
Inorg. Chem.2018, 57(9), 5133–5144

Ultrasound-mediated deposition and cytocompatibility of apatite-like coatings on magnesium alloys
C.-N. Lui, F. Böke, M. Gebhard, A. Devi, H. Fischer, A. Keller, G. Grundmeier,
Surf. Coat. Technol.2018, 345, 167-176

PEALD of SiO₂ and Al₂O₃ thin films on polypropylene: Investigations of the film growth at the interface, stress and gas barrier properties of dyads
M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, T. de Los Arcos, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi,
ACS Appl. Mater. Interfaces2018, 10, 7422-7434

CVD-grown copper tungstate thin films for solar water splitting
D. Peeters, O. Mendoza Reyes, L. Mai, A. Sadlo, S. Cwik, D. Rogalla, H. Schütz, H.-W. Becker, J. Hirst, S. Müller, D. Friedrich, D. Mitoraj, M. Nagli, M. Caspary Toroker, R. Eichberger, R. Beranek, A. Devi,
J. Mater. Chem. A2018, 6, 10206–10216

Tailored β-ketoiminato complexes of iron: Synthesis, characterisation and evaluation towards solution based deposition of iron oxide thin films
A. Sadlo, S. M. J. Beer, S. Rahman, M. Grafen, D. Rogalla, M. Winter, A. Ostendorf, A. Devi,
Eur. J. Inorg. Chem.2018, 1824-1833

A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, a. Devi,
Plasma Processes Polym.2018, 15, e1700209

Water assisted atomic layer deposition of yttrium oxide using tris(N,N’-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties
L. Mai, N. Boysen, E. Subaşı, T. de los Arcos, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi,
RSC Adv.2018, 8, 4987-4994

Molecular engineering of Ga-ketoiminates: Synthesis, structure and evaluation as precursors for the additive-free spin-coated deposition of gallium oxide thin films
R. O’Donoghue, S. Rahman, B. Mallick, M. Winter, D. Rogalla, H. -W. Becker, A. Devi,
New. J. Chem.2018, 42, 3196-3210

Manganese(II) Molecular Sources for Plasma-Assisted CVD of Mn Oxides and Fluorides: From Precursors to Growth Process
D. Barreca, G. Carraro, E. Fois, A. Gasparotto, F. Gri, R. Seraglia, M. Wilken, A. Venzo, A. Devi, G. Tabacchi, C. Maccato,
J. Phys. Chem. C2018, 122, 1367

Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
M. Wiesing, T. de los Arcos, M. Gebhard, A. Devi, G. Grundmeier,
Phys. Chem. Chem. Phys. 2018, 20, 180-190

Atomic Layer Deposition of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors
Q.-H. Ren, Y. Zhang, H.-L. Lu, Y.-P. Wang, W.-J. Liu, X.-M. Ji, A. Devi, A.-Q. Jiang, D. W. Zhang,
ACS Appl. Mater. Interfaces 20182018, 10, 468-476

Publications 2017

Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
R. O’Donoghue, J. Rechmann, M. Aghaee, D. Rogalla, H.-W. Becker, M. Creatore, A. D. Wieck and A. Devi,
Dalton Trans.2017, 46, 16551-16561

Molecular Engineering of Mn^II Diamine Diketonate Precursors for the Vapor Deposition of Manganese Oxide Nanostructures
C. Maccato, L. Bigiani, G. Carraro, A. Gasparotto, R. Seraglia, J. Kim, A. Devi, G. Tabacchi, E. Fois, G. Pace, V. Di Noto and D. Barreca,
Chem. Eur. J.2017, 23, 17954-17963

Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN
S. Cwik, S. M. J. Beer, S. Hoffmann, M. Krasnopolski, D. Rogalla, H.-W. Becker, D. Peeters, A. Ney and A. Devi,
ACS Appl. Mater. Interfaces2017, 9 (32), 27036–27044

Temperature Dependent Transport Mechanisms through PE-CVD Coatings: Comparison of Oxygen and Water Vapour
D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, C. Hopmann, M. Böke, J. Benedikt, A. Devi, P. Awakowicz and R. Dahlmann,
J. Phys. D: Appl. Phys.2017, 50, 395302

Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)₂ and Tertiary Butyl Hydrazine
K. Väyrynen, K. Mizohata, J. Räisänen, D. Peeters, A. Devi, M. Ritala†, and M. Leskelä,
Chem. Mater.2017, 29 (15), 6502–6510

Unearthing [3-(dimethylamino)propyl] aluminium(III) complexes as novel ALD precursors for Al₂O₃: Synthesis, characterization and ALD process development
L. Mai, M. Gebhard, T. de los Arcos, I. Giner, F. Mischker, M. Winter, H. Parala, P. Awakowicz, G. Grundmeier, A. Devi,
Chem. – Eur. J.2017, 45, 10768–10772

Low temperature atomic layer deposition of cobalt oxide as an effective catalyst for photoelectrochemical water splitting devices
J. Kim, T. Iivonen, J. Hämäläinen, M. Kemell, K. Meinander, K. Mizohata, L. Wang, J. Räisänen, R. Beranek, M. Leskelä, A. Devi,
Chem. Mater.2017, 29 (14), 5796–5805

New amidinate complexes of indium(III): Promising CVD precursors for transparent and conductive In₂O₃ thin films
M. Gebhard, M. Hellwig, A. Kroll, D. Rogalla, M. Winter, B. Mallick, A. Ludwig, M. Wiesing, A. Wieck, G. Grundmeier, A. Devi,
Dalton Trans.2017, 46, 10220-10231

Photoactive zinc ferrites fabricated via conventional CVD approach
D. Peeters, D. H. Taffa, M. M. Kerrigan, A. Ney, N. Jöns, D. Rogalla, S. Cwik, H.-W. Becker, M. Grafen, A. Ostendorf, C. H. Winter, S. Chakraborty, M. Wark, A. Devi,
ACS Sustainable Chem. Eng.2017, 5, 2917-2926

Nanostructured Fe₂O₃ Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor
D. Peeters, A. Sadlo, K. Lowjaga, O. Mendoza Reyes, L. Wang, L. Mai, M. Gebhard, D. Rogalla, H.-W. Becker, I. Giner, G. Grundmeier, D. Mitoraj, M. Grafen, A. Ostendorf, R. Beranek and A. Devi,
Adv. Mater. Interfaces2017, 18, 1700155 (11pp)

Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence
F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, M. Boeke, J. Benedikt, I. Giner, T. de los Arcos, C. Hopmann, G. Grundmeier, A. Devi and P. Awakowicz,
J. Phys. D.: Appl. Phys.2017, 50, 235201 (11pp)

Transport mechanims through PECVD coatings: influence of temperature, coating properties and defects on permeation of water vapor
D. Kirchheim, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, C. Hopmann, M. Böke, A. Devi, P. Awakowicz and R. Dahlmann,
J. Phys. D: Appl. Phys.2017, 50(8), 085203

Atomic/molecular layer deposition of hybrid inorganic-organic thin films from erbium guanidinate precursor
Lukas Mai, Zivile Giedraityte, Marcel Schmidt, Detlef Rogalla, Sven Scholz, Andreas D. Wieck, Anjana Devi and Maarit Karppinen,
J. Mater. Sci.2017, 11, 6216–6224

Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films
S. Karle, D. Rogalla, A. Ludwig, H. –W. Becker, A. Wieck, M. Grafen, A. Ostendorf and A. Devi,
Dalton Trans.2017, 46, 2670-2679

Publications 2016

An efficient PE-ALD process for TiO₂ thin films employing a new Ti-precursor
M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier and A. Devi,
J. Mater. Chem. C2016, 4, 1057

Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer deposition of zinc oxide
R. O’ Donoghue, D. Peeters, D. Rogalla, H. -W. Becker, J. Rechmann, S. Henke, M. Winter and A. Devi,
Dalton Trans.2016, 45 (47), 19012

Review Article: Recommended reading list of early publications on atomic layer deposition – Outcome of the “Virtual Project on the History of ALD
Esko Ahvenniemi Andrew R. Akbashev Saima Ali Mikhael Bechelany Maria Berdova Stefan Boyadjiev David C. Cameron Rong Chen Mikhail Chubarov Veronique Cremers Anjana Devi Viktor Drozd Liliya Elnikova Gloria Gottardi Kestutis Grigoras Dennis M. Hausmann Cheol Seong Hwang Shih-Hui Jen Tanja Kallio Jaana Kanervo Ivan Khmelnitskiy Do Han Kim Lev Klibanov Yury Koshtyal A. Outi I. Krause Jakob Kuhs Irina Kärkkänen Marja-Leena Kääriäinen Tommi Kääriäinen Luca Lamagna Adam A. Łapicki Markku Leskelä Harri Lipsanen Jussi Lyytinen Anatoly Malkov and Anatoly Malygin Abdelkader Mennad Christian Militzer Jyrki Molarius Małgorzata Norek Çağla Özgit-Akgün Mikhail Panov Henrik Pedersen Fabien Piallat Georgi Popov Riikka L. Puurunen Geert Rampelberg Robin H. A. Ras Erwan Rauwel Fred Roozeboom Timo Sajavaara Hossein Salami Hele Savin Nathanaelle Schneider Thomas E. Seidel Jonas Sundqvist Dmitry B. Suyatin Tobias Törndahl J. Ruud van Ommen Claudia Wiemer Oili M. E. Ylivaara Oksana Yurkevich,
J. Vac. Sci. Technol.2016, 35(1), 010801/1-010801/13.

Publications 2015

MOCVD of TiO₂ thin films from a modified titanium alkoxide precursor
S. J. Kim, V. S. Dang, K. Xu, D. Barreca, C. Maccato, G. Carraro, R. K. Bhakta, M. Winter, H.-W. Becker, D. Rogalla, C. Sada, R. A. Fischer, A. Devi,
Phys. Stat. Solidi (a)2015, 212, 1563

Metal-organic CVD of Y₂O₃ Thin Films using Yttrium tris-amidinates
S. Karle, V.-S. Dang, M. Prenzel, D. Rogalla, H.-W. Becker and A. Devi,
Chem. Vap. Dep.2015, 10-11-12, 335

Publications 2014

Indium-tris-guanidinates: a promising class of precursors for water assisted atomic layer deposition of In₂O₃ thin films
M. Gebhard, M. Hellwig, H. Parala, K. Xu, M. Winter, A. Devi,
Dalton Trans.2014, 43(3), 937

Investigations on the structural, compositional and functional properties of MOCVD grown Er₂O₃ thin films
K. Xu, V. S. Dang, A. Ney, T. de los Arcos, A. Devi,
J. Nanosci. Nanotechnol.2014, 14(7), 5095

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
N. B. Srinivasan, T. Thiede, T. de los Arcos, D. Rogalla, H.-W. Becker, A. Devi, R. A. Fischer,
Physica Status Solidi A: Applications and Materials Science2014, 211(2), 260

Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization
D. Peeters, G. Carraro, C. Maccato, H. Parala, A. Gasparotto, D. Barreca, C. Sada, K. Kartaschew, M. Havenith, D. Rogalla,
Physica Status Solidi A: Applications and Materials Science2014, 211(2), 316

Novel ß-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for soultion based processing of ZrO₂ thin films
M. Banerjee, R. W: Seidel, M. Winter, H.-W. Becker, D. Rogalla, A. Devi,
Dalton Trans.2014, 43(6), 2384

Electrical and optical properties of TiO₂ thin films prepared by plasma-enhanced atomic layer deposition
V.S. Dang, H. Parala, J. H. Kim, K. Xu, N. B. Srinivasan, E. Edengeiser, M. Havenith, A. WIeck, T. de los Arcos, R. A. Fischer,
Physica Status Solidi A: Applications and Materials Science2014, 211(2), 416

Surface Decoration of ε-Fe₂O₃ Nanorods by CuO Via a Two-Step CVD/Sputtering Approach
D. Barreca, G. Carraro, D. Peeters, A. Gasparotto, C. Maccato, W. M. M. Kessels, V. Longo, F. Rossi, E. Bontempi, C. Sada, A. Devi,
Chem. Vap. Deposition2014, 20(7-9), 313

Recent advances using guanidinate ligands for chemical vapour deposition (CVD) and atomic layer deposition (ALD) applications
A. Kurek, P. Gordon, S. Karle, A. Devi, S. T. Barry,
Aust. J. Chem2014, 67(7), 989

Preface to the CVD Special Issue: Atomic-Scale-Engineered Materials (ASEM)
A. Devi, W. M. M. Kessels ,
Chem. Vap. Deposition2014, 20(7-9), 186

MOCVD of TiO₂ Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties
M. Banerjee, V.-S. Dang, M. Bledowski, R. Beranek, H.-W. Becker, D. Rogalla, E. Edengeiser, M. Havenith, A. D. Wieck, A. Devi,
Chem. Vap. Deposition2014, 20(7-9), 224

Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO₂ Films
V.-S. Dang, M. Banerjee, H. Zhu, N. B. Srinivasan, H. Parala, J. Pfetzing-Micklich, A. D. Wieck, A. Devi ,
Chem. Vap. Deposition2014, 20(7-9), 320

Atomic-scale engineering of multifunctional nano-sized materials and films
F. Roozeboom, D. Barreca, A. Devi, H. Parala, M. Ritala ,
Phys. Status Solidi A2014, 211(2), 249

Atomic Layer Deposition of TiO₂ and ZrO₂ Thin Films Using Heteroleptic Guanidinate Precursors
M. Kaipio, T. Blanquart, M. Banerjee, K. Xu, J. Niinistoe, V. Longo, K. Mizohata, A. Devi, M. Ritala, M. Leskelae,
Chem. Vap. Deposition2014, 20(7-9), 209

Publications 2013

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)₂{(ⁱPrN)₂CMe}₂] (M = Mo, W) as precursors
N. B. Srinivasan, T. Thiede, T. de los Arcos, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R. A. Fischer,
Surf. Coat. Technol.2013, 230, 130

Intrinsic Nitrogen-doped CVD-grown TiO₂ Thin Films from All-N-coordinated Ti Precursors for Photoelectrochemical Applications
S. Kim, K. Xu, H. Parala, R. Beranek, M. Bledowski, K. Sliozberg, H.-W. Becker, D. Rogalla, D. Barreca, C. Maccato, C. Sade, W. Schuhmann, R. A. Fischer, A. Devi ,
Chem. Vap. Deposition2013, 19(1-3), 45

Homoleptic Gadolinium Amidinates as Precursors for MOCVD of Oriented Gadolinium Nitride (GdN) Thin Films
M. Krasnopolski, C. G. Hrib, R. W. Seidel, M. Winter, H.-W. Becker, D. Rogalla, R. A. Fischer, F. T. Edelmann, A. Devi ,
Inorg. Chem.2013, 52(1), 286

Growth and Crystallization of TiO₂ Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium
M. Reiners, K. Xu, N. Aslam, A. Devi, R. Waser, S. Hoffmann-Eifert,
Chem. Mater.2013, 25(15), 2934

Atomic layer deposition of Er₂O₃ thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties
K. Xu, A. R. Chaudhuri, H. Parala, D. Schwendt, T. de los Arcos, H.-J. Osten, A. Devi,
J. Mater. Chem. C2013, 1(25), 3939

A Z’ = 6 crystal structure of (E)-N,N’-dicyclohexylacetamidine
M. Krasnopolski, R. W. Seidel, R. Goddard, J. Breidung, M. Winter, A. Devi, R. A. Fischer,
J. Mol. Struct.2013, 1031, 239

[Zr(NEtMe)₂(guan-NEtMe)₂] as a Novel Atomic Layer Deposition Precursor: ZrO₂ Film Growth and Mechanistic Studies
T. Blanquart, J. Niinisto, N. Aslam, M. Banerjee, Y. Tomczak, M. Gavagnin, V. Longo, E. Puukilainen, H. D. Wanzenboeck, W. M. M. Kessels, A. Devi, S. Hoffmann-Eifert, M. Ritala, M. Leskelae,
Chem. Mater.2013, 25(15), 3088

‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications
A. Devi,
Coord. Chem. Rev.2013, 257(23-24), 3332

Publications 2012

Surfactant-Induced Nonhydrolytic Synthesis of Phase-Pure ZrO₂ Nanoparticles from Metal-Organic and Oxocluster Precursors
M. A. Sliem, D. A. Schmidt, A. Betard, S. Kalidindi, S. Gross, M. Havenith, A. Devi, R. A. Fischer ,
Chem. Mater.2014, 24(22), 4274

Strain-induced phase transitions in epitaxial NaNbO₃ thin films grown by metal-organic chemical vapor deposition
J. Schwarzkopf, M. Schmidbauer, T. Remmele, A. Duk, A. Kwasniewski, S. Bin Anooz, A. Devi, R Fornari ,
J. Appl. Cryst.2012, 45(5), 1015

Sc₂O₃, Er₂O₃, and Y₂O₃ thin films by MOCVD from volatile guanidinate class of rare-earth precursors
A. P. Milanov, K. Xu, S. Cwik, H. Parala, T. de los Arcos, H.-W. Becker, D. Rogalla, R. Cross, S. Paul, A. Devi ,
Dalton Trans.2012, 41(45), 13936

Rare-earth substituted HfO₂ thin films grown by metal organic chemical vapor deposition
A. Devi, S. Cwik, K. Xu, A. P. Milanov, H. Noei, Y. Wang, D. Barreca, J. Meijer, D. Rogalla, D. Kahn, R. Cross, H. Parala, S. Paul,
Thin Solid Films2012, 520(14), 4512

Microgradient-heaters as tools for high-throughput experimentation
R. Meyer, S. Hamann, M. Ehmann, S. Thienhaus, S. Jaeger, T. Thiede, A. Devi, R. A. Fischer, A. Ludwig,
ACS Comb. Sci.2012, 14(10), 531

Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition
T. de los Arcos, S. Cwik, A. P. Milanov, V. Gwildies, H. Parala, T. Wagner, A. Birkner, D. Rogalla, H.-W. Becker, J. Winter, A. Ludwig, R. A. Fischer, A. Devi,
Thin Solid Films2012, 522, 11

Fabrication of ZrO₂ and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors
M. Banerjee, N. B. Srinivasan, H. Zhu, S. Kim, K. Xu, M. Winter, H.-W. Becker, D. Rogalla, T. de los Arcos, D. Bekermann,
Cryst. Growth Des.2012, 12(10), 5079

CuO/ZnO nanocomposite gas sensors developed by a plasma-assisted route
Q. Simon, D. Barreca, A. Gasparotto, C. Maccato, E. Tondello, C. Sada, E. Comini, G. Sberveglieri, M. Banerjee, K. Xu, A. Devi, R. A. Fischer,
ChemPhysChem2012, 13(9), 2342

Co₃O₄/ZnO Nanocomposites: From Plasma Synthesis to Gas Sensing Applications
D. Bekermann, A. Gasparotto, D. Barreca, C. Maccato, E. Comini, C. Sada, G. Sberveglieri, A. Devi, R. A. Fischer,
ACS Appl. Mater. Interfaces2012, 4(2), 928

Atomic Layer Deposition of HfO₂ Thin Films Employing a Heteroleptic Hafnium Precursor
K. Xu, A. P. Milanov, H. Parala, C. Wenger, C. Baristiran-Kaynak, K. Lakribssi, T. Toader, C. Bock, D. Rogalla, H.-W. Becker, U. Kunze, A. Devi,
Chem. Vap. Deposition2012, 18(1-3), 27

Atomic Layer Deposition of Gd₂O₃ and Dy₂O₃: A Study of the ALD Characteristics and Structural and Electrical Properties
K. Xu, R. Ranjith, A. Laha, H. Parala, A. P. Milanov, R. A. Fischer, E. Bugiel, J. Feydt, S. Irsen, T. Toader, C. Bock, D. Rogalla, H.-J. Osten, U. Kunze, A. Devi,
Chem. Mater.2012, 24(4), 651

Ag/ZnO nanomaterials as high performance sensors for flammable and toxic gases
Q. Simon, D. Barreca, A. Gasparotto, C. Maccato, E. Tondello, C. Sada, E. Comini, A. Devi, R. A. Fischer,
Nanotechnology2012, 23(2), 025502

β-Fe₂O₃ nanomaterials from an iron(II) diketonate-diamine complex: a study from molecular precursor to growth process
D. Barreca, G. Carraro, A. Devi, E. Fois, A. Gasparotto, R. Seraglia, C. Maccato, C. Sada, G. Tabacchi, E. Tondello, A. Venzo, M. Winter,
Dalton Trans.2012, 41(1), 149

Publications 2011

Malonate complexes of dysprosium: Synthesis, characterization and application for MOCVD of Dysprosium containing thin films
A. P. Milanov, R. W. Seidel, D. Barreca, A. Gasparotto, M. Winter, J. Feydt, S. Irsen, H.-W. Becker, A. Devi,
Dalton Trans.2011, 40, 62

Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare earth nitride thin films
T. B. Thiede, M. Krasnopolski, A. P. Milanov, T. de los Arcos, A. Ney, H. W. Becker, D. Rogalla, J. Winter, A. Devi, R. A. Fischer,
Chem. Mater.2011, 23(6), 1430

Basic investigation of HfO₂ based metal-insulator-metal diodes
P. Dudek, R. Schmidt, M. Lukosius, G. Lupina, C. Wenger, A. Abrutis, K. Xu, A. Devi,
Thin Solid Films 2011, 17, 5796

Influence of Na on the structure of Bi₄Ti₃O₁₂ films deposited by liquid-delivery spin MOCVD
J. Schwarzkopf, R. Dirsyte, A. Devi, A. Kwasniewski, M. Schmidbauer, G. Wagner, M. Michling, D. Schmeisser, R. Fornari,
Thin Solid Films2011, 519, 5754

“MOCVD of ZnO films from bis(ketoiminato)Zn(II) precursors: Structure, Morphology and Optical Properties
D. Bekermann, A. Ludwig, T. Toader, C. Maccato, D. Barreca, A. Gasparotto, C. Bock, A. D. Wieck, U. Kunze, E. Tondello, R. A. Fischer, A Devi,
Chem. Vap. Deposition2011, 17, 155

Plasma enhanced-CVD of undoped and fluorine-doped Co₃O₄ nanosystems for novel gas sensors
D. Barreca, D. Bekermann, E. Comini, A. Devi, R. A. Fischer, A. Gasparotto, M. Gavagnin, C. Maccato, C. Sada, G. Sberveglieri, E. Tondello,
Sensors and Actuators B-chemical2011, 160, 79

F-Doped Co3O4 Photocatalysts for Sustainable H2 Generation from Water/Ethanol
A. Gasparotto, D. Barreca, D. Bekermann, A. Devi, R. A. Fischer, P. Fomasiero, V. Oleg, I. Lebedev, C. Maccato, T. Montini, G. Van Tendeloo, E. Tondello,
J. Am. Chem. Soc.2011, 133, 19362

Atomic Vapor Deposition Approach to In₂O₃ Thin Films
M. Hellwig, H. Parala, J. Cybinksa, D. Barreca, A. Gasparotto, B. Niermann, H. -Werner Becker, D. Rogalla, J. Feydt, S. Irsen, A.V. Mudring, J. Winter, R. A. Fischer, A. Devi,
J. Nanosci. and Nanotechnol.2011, 9, 8094

Plasma-assisted synthesis of Ag/ZnO nanocomposites: First example of photo-induced H2 production and sensing
Q. Simon, D. Barreca, D. Bekermann, A. Gasparotto, C. Maccato, E. Comini, V. Gombac, P. Fomasiero, O. I. Lebedev, S. Turner, A. Devi, R.. A. Fischer, G. Van Tendeloo,
Int. J. of Hydrog. Energy2011, 36, 15527

Growth of epitaxial sodium-bismuth-titanate films by metal-organic chemical vapor phase deposition
J. Schwarzkopf, M. Schmidbauer, A. Duk, A. Kwasniewski, S. Bin Anooz, G. Wagner, A. Devi, R. Fomari,
Thin Solid Films2011, 520, 239

Plasma Processing of Nanomaterials: Emerging Technologies for Sensing and Energy Applications
A. Gasparotto, D. Barreca, D. Bekermann, A. Devi, R. A. Fischer, C. Maccato, E. Tondello,
J. Nanosci. and Nanotechnol.2011, 11, 8206

Publications 2010

Growth of crystalline Gd₂O₃ thin films with high quality interface on Si(100) by low temperature H₂O assisted atomic layer deposition
A. P. Milanov, K. Xu, A. Laha, E. Bugiel, R. Ranjith, D. Schwendt, H. J. Osten, H. Parala, R. A. Fischer, A. Devi,
J. Am. Chem. Soc.2010, 132, 36

ZnO Nanorod Arrays by Plasma-Enhanced CVD for Light-Activated Functional Applications
D. Bekermann, A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, M. Kete, U. Lavrencic Stangar, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
ChemPhysChem2010, 11(11), 2337

All-Nitrogen Coordinated Amidinato Imido Complexes of Molybdenum and Tungsten: Syntheses and Characterization
V. Gwildies, T. B. Thiede, S. Amirjalayer, L. Alsamman, A. Devi, R. A. Fischer,
Inorg. Chem.2010, 49(18), 8487

Deposition of SrRuO₃ thin films on oxide substrates with liquid-delivery spin MOCVD
J. Schwarzkopf, R. Dirsyte, A. Devi, M. Schmidbauer, G. Wagner, R. Fornari,
Thin Solid Films2010, 518, 4675

1D ZnO nano-assemblies by Plasma-CVD as chemical sensors for flammable and toxic gases
D. Barreca , D. Bekermann , E. Cominic , A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, G. Sberveglieric, E. Tondello,
Sens. & Actuators (B): Chemical 2010, B149(1), 1

Down scaling of defect passivated Gd₂O₃ thin films on p-Si(001) wafers grown by H₂O assisted atomic layer deposition
R. Ranjith, A. Laha, E. Bugiel, H. J. Osten, K. Xu, A. P. Milanov, A. Devi,
Semicond. Sci. Technol.2010, 25, 105001

Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors
A. Devi, M. Hellwig, D. Barreca, H. Parala, R. Thomas, H.-W. Becker, Ram. S. Katiyar, R. A. Fischer, E. Tondello,
Chem. Vap. Deposition2010, 16, 157

Highly Oriented ZnO Nanorod Arrays by a Novel Plasma Chemical Vapor Deposition Process
D. Bekermann, A. Gasparotto, D. Barreca, L. Bovo, A. Devi, R. A. Fischer, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
Cryst. Growth & Design2010, 10, 2012

Volatile, Monomeric and Fluorine-free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide
D. Bekermann, D. Rogalla, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
Eur. J. Inorg. Chem.2010, 9, 1366

Urchin-like ZnO nanorod arrays for gas sensing applications
D. Barreca, D. Bekermann, E. Comini, A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, C. Sada, G. Sberveglieri, E. Tondello,
CrystEngComm201012, 3419

Heteroleptic guanidinate and amidinate based complexes of hafnium as new precursors for MOCVD of HfO₂
K. Xu, A. P. Milanov, M. Winter, D. Barreca, A. Gasparotto, H.-W. Becker, A. Devi,
Eur. J. Inorg. Chem.2010, 11, 1679

Liquid injection MOCVD grown binary and ternary rare-earth oxides as alternative gate oxides for logic devices
R. Thomas, P. Ehrhart, R. Waser, J. Schubert, A. Devi, R. S. Katiyar,
ECS Trans.2010, 33(3), 211

Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD
S. Cwik, . A. P. Milanov, V. Gwildies, T. B. Thiede, V. S. Vidyarthi, A. Savan, R. Meyer, H.-W. Becker, D. Rogalla, A. Ludwig, R. A. Fischer, A. Devi,
ECS Trans.2010, 28(8), 159

Publications 2009

Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal-Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films
A. P. Milanov, T. Thiede, A. Devi, R. A. Fischer,
J. Am. Chem. Soc.2009, 131, 17062

Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors
A. P. Milanov, T. Toader, H. Parala, D. Barreca, A. Gasparotto, C. Bock, H.-W. Becker, D. K. Ngwashi, R. Cross, S. Paul, U. Kunze, R. A. Fischer, A. Devi,
Chem. Mater.2009, 21, 5443

Zinc Malonate Based Precursors for MOCVD of ZnO
D. Bekermann, D. Pilard, R. Fischer, and A. Devi,
ECS Transactions2009, 8, 601

An integrated experimental and theoretical investigation on Cu(hfa)₂.TMEDA: structure, bonding and reactivity
G. Bandoli, D. Barreca, A. Gasparotto, R. Seraglia, E. Tondello, A. Devi, R. A. Fischer, E. Fois, A. Gamba, G. Tabacchi,
Physical Chemistry Chemical Physics2009, 11, 5998

Rare-earth based oxide and nitride thin films employing volatile homoleptic guanidinate precursors
A. P. Milanov, T. Thiede, M. Hellwig, H. Parala, C. Bock, H.-W. Becker, D. K. Ngwashi, R. B. M. Cross, S. Paul, U. Kunze, R. A. Fischer, A. Devi,
ECS Transactions2009, 25, 143

Investigation of niobium nitride and oxy-nitride films grown by MOCVD
D. Bekermann, D. Barreca, A. Gasparotto, H. W. Becker, R. A. Fischer, A. Devi,
Surf. Coatings and Technol.2009, 204, 404

MOCVD of gallium oxide thin films using homoleptic gallium complexes: Precursor evaluation and thin film characterization
M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, B. Niermann, J. Winter, H. W. Becker, D. Rogalla, R. A. Fischer, A. Devi,
ECS Transactions2009, 25, 617

Tuning the thermal properties of hafnium precursors by tailoring the ligands
K. Xu, A. P. Milanov, A. Devi,
K. Xu, A. P. Milanov, A. Devi2009, 25, 625

Innovative M(hfa)₂TMEDA (M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: An integrated theoretical and experimental approach
A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, E. Fois, A. Gamba, C. Maccato, R. Seraglia, G. Tabacchi, E. Tondello,
ECS Transactions2009, 25, 549

Capacitance-Voltage Analysis of ZrO2 Thin films deposited by MOCVD techniques
T. A. Mih, S.Paul, A. P. Milanov, R. Bhakta, A. Devi,
ECS Transactions2009, 25, 901

Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films
R. Pothiraja, A. Milanov, D. Barreca, A. Gasparotto, H. W. Becker, M. Winter, R. A. Fischer, A. Devi,
Chem. Commun.2009, 15, 1978

Novel gallium complexes with malonic diester anions as molecular precursors for the MOCVD of Ga₂O₃ thin films
M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, M. Winter, E. Tondello, R. A. Fischer, A. Devi,
Eur. J. Inorg. Chem.2009, 8, 1110

A cobalt(II) hexafluoroacetylacetonate ethylenediamine complex as CVD molecular source of cobalt oxides nanostructures
G. Bandoli, D.Barreca, A.Gasparotto, C. Maccato, R. Seraglia, E. Tondello, A. Devi, R. A. Fischer, M. Winter,
Inorg. Chem.2009, 48, 82

Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films
R. Pothiraja, A. Milanov, H. Parala, M. Winter, R. A. Fischer and A. Devi,
Dalton Trans.2009, 4, 654

Publications 2008

Synthesis, characterization and thermal properties of homoleptic rare-earth guanidinates: Promising precursors for MOCVD and ALD of rare-earth oxide thin films
A. Milanov, R. A. Fischer and A. Devi,
Inorg. Chem.2008, 47, 11405

MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study
D. Bekermann, D. Barreca, A. Devi, A. Gasparotto, and R. A. Fischer,
ECS Trans.2008, 16, 235

Publications 2007

Gd2O3 nanostructured thin films analyzed by XPS
D. Barreca, A. Gasparotto, A. Milanov, E. Tondello, A. Devi, R. A. Fischer,
Surf. Sci. Spectra2007, 14, 60

Nanostructured Dy2O3 films: an XPS investigation
D. Barreca, A. Gasparotto, A. Milanov, E. Tondello, A. Devi, R. A. Fischer,
Surf. Sci. Spectra2007, 14, 52

Hafnium oxide thin film grown by ALD: an XPS study
D. Barreca, A. Milanov, R. A. Fischer, A. Devi, E. Tondello,
Surf. Sci. Spectra2007, 14, 34

Stabilization of Amide-Based Complexes of Niobium and Tantalum Using Malonates as Chelating Ligands: Precursor Chemistry and Thin Film Deposition
M. Hellwig, A. Milanov, D. Barecca, J.-L. Deborde, R. Thomas, M. Winter, U. Kunze, R. A. Fischer and A. Devi,
Chem. Mater.2007, 19, 6077

Liquid injection MOCVD of TiO₂ and SrTiO₃ thin films from [Ti(OⁱPr)₂(tbaoac)₂]: Film properties and compatibility with [Sr(thd)₂]
R. Thomas, R. Bhakta, P. Ehrhart, R. A. Fischer, R.Waser and A. Devi,
Surface Coatings and Technology2007, 201, 9135

LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors
. Milanov, R.Thomas, M. Hellwig, K. Merz, H.-W. Becker, P.Ehrhart, R. A. Fischer, R. Waser, and A. Devi,
Surface Coatings and Technology2007, 201, 9109

Vaporizable metalorganic compounds for deposition of metals and metal-containing thin films
A. Thenappan, J. Lao, H. K. Nair, A. Devi, R. Bhakta, A. Milanov,
Patent : PCT Int. Appl.2007, 58pp, CODEN: PIXXD2 WO 2007005088 A2 20070111 CAN 146:133962 AN 2007:33784

Thin films of ZrO₂ for high-k applications employing engineered alkoxide and amide based MOCVD precursors
R. Thomas, R. Bhakta, A. Milanov, A. Devi and P. Ehrhart,
Chem. Vap. Deposition2007, 13, 98

Synthesis and characterisation of zirconium-amido guanidinato complex: A potential precursor for ZrO₂ thin films
A. Devi, R, Bhakta, A. Milanov, M. Hellwig, D. Barreca, E. Tondello, R. Thomas, P.Ehrhart, M. Winter, and R. A. Fischer,
Dalton Trans.2007, 17, 1671

Thin films of HfO₂ for high-k gate oxide applications from engineered alkoxide and amide based MOCVD precursors
.Thomas, E. Rije, P. Ehrhart, A. Milanov, R. Bhakta, A. Bauneman, A. Devi, R. A. Fischer and R. Waser,
J. Electrochem. Soc.2007, 154, G77

The synthesis of ZrO₂/SiO₂ nanocomposites by the two-step CVD of a volatile halogen-free Zr alkoxide in a fluidized-bed reactor
W. Xia , Y. Wang, V. Hagen, A. Heel, G. Kasper, U. Patil, A. Devi, M. Muhler,
Chem. Vap. Deposition2007, 13, 37

Investigation of Thermal Decomposition of the Titanium MOCVD Precursor [Ti(OⁱPr)₂(thd)₂], Employing Matrix Isolation-FTIR technique
R. Bhakta, H. Bettinger, and A. Devi,
ECS Transactions2007, 2, 89

Publications 2006

Metalorganic precursors for CVD and related techniques (ALD)
A. Devi, R. Bhakta, A. Milanov,
German Patent: DE 10 2005 030 915.1 and US Patent : US 60/696,0722006,

Guanidinate stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO₂
A. Milanov, R. Bhakta, A. Baunemann, H. W. Becker, R. Thomas, P. Ehrhart, M. Winter and A. Devi,
Inorganic Chemistry2006, 46, 11008

Precursor chemistry for TiO₂: Titanium complexes with mixed nitrogen/oxygen ligand sphere
A. Baunemann, M. Hellwig, A. Varade, R. Bhakta, M. Winter, S. A. Shivashankar, R. A. Fischer, and A. Devi,
Dalton Trans.2006, 28, 3485

Liquid injection MOCVD of ZrO₂ thin films using zirconium bis (diethylamido)bis(di-tert-butylmalonato) as a novel precursor
R. Thomas, A. Milanov, R. Bhakta, U. Patil, M. Winter, P. Ehrhart, R. Waser and A. Devi,
Chem. Vap. Deposition2006, 12, 295

MOCVD of ZrO₂ and HfO₂ thin films from modified monomeric precursors
U. Patil, R. Thomas, A. Milanov, R. Bhakta, P. Ehrhart, R. Waser, R. Becker, H.-W. Becker, M. Winter, K. Merz, R. A. Fischer and A. Devi,
Chem. Vap. Deposition2006, 12, 172

Mixed amide malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
A. Milanov, R. Bhakta, R. Thomas, P. Ehrhart, M. Winter, R. Waser, A. Devi,
J. Mater. Chem.2006, 16, 437

Publications 2005

High-k dielectric materials by metalorganic chemical vapor deposition: Growth and characterization
R. Thomas, S. Regnery, P. Ehrhart , R. Waser, R. Bhakta, U. Patil, A. Devi,
Ferroelectrics2005, 327, 111

Materials chemistry of group-13 nitrides
A. Devi, R. Schmid, J. Müller, R. A. Fischer,
Topics in Organometallic Chemistry2005, 9, 49

Synthesis and structure of Bis(2-butyl-N,N’-diisopropylamidinateo)dichloro-hafnium(IV)
A. Milanov, R. Bhakta, M. Winter, K. Merz, A. Devi,
Acta Cryst. C2005, 61, m 370

Metal-Organic CVD of conductive and crystalline hafnium nitride films
Y. Kim, A. Baunemann, H. Parala, A. Devi, R. A. Fischer,
Chem. Vap. Deposition2005, 11, 294

Zirconium dioxide thin films for high-k applications by MOCVD from novel mononuclear precursors
R. Thomas, U. Patil, P. Ehrhart, A. Devi, R. Waser,
Proc. Electrochem. Soc.2005, 944

Volatile single source precursors for the MOCVD of metal silicate thin films
U. Patil, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
Proc. Electrochem. Soc.2005, 913

Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned Si(100) substrates by MOCVD method
B. C. Kang, A. Baunemann, Y. Kim, J. H. Lee, D. Y. Jung, A. Devi, H. Parala, R. A. Fischer, J. H. Boo,
Proc. Electrochem. Soc.2005, 326

MOCVD of TiO2 thin films on OTS modified Si(100) substrates by micro-contact printing: Selective growth and new characterisation technique with micro-Raman spectroscopy
B. C. Kang, J. H. Lee, D. Y. Jung, J. H. Boo, A. Devi, R. Bhakta, R. A. Fischer, S. H. Hong,
Proc. Electrochem. Soc.2005, 320

Gas phase decomposition studies on the MOCVD precursor [Ti(OC₃H₇)]₄] using matrix-isolation FTIR spectroscopy
R. Bhakta, E. Gemel, J. Müller, A. Devi,
Proc. Electrochem. Soc.2005, 312

Publications 2004

Precursor engineering and evaluation: Studies on the nature of molecular mechanisms involved in the MOCVD of TiO₂ thin films
R. Bhakta, R. Thomas, F. Hipler, H. Bettinger, J. Müller, P. Ehrhart, A. Devi,
J. Mater. Chem.2004, 14, 3231

Mononuclear precursor for MOCVD of HfO₂ thin films
A. Baunemann, R. Becker, M. Winter, R. A. Fischer, R. Thomas, P. Ehrhart, R. Waser, A. Devi,
Chem. Commun.2004, 14, 1610

Publications 2003

MOCVD of copper films from copper ethylacetoacetate: Experiment and thermodynamic analysis
S. Mukhopadhyay, K. Shalini, A. Devi, S. A. Shivashankar,
Proc. Electrochem. Soc.2003, 2, 1275

Nanostructures of group-III nitrides by MOCVD using molecular precursors
J. Khanderi, A. Wohlfart, H. Parala, A. Devi, R. A. Fischer,
Proc. Electrochem. Soc.2003, 2, 1098

MOCVD of TiO₂ thin films using a new class of metalorganic precursors
R. Bhakta, U. Patil, A. Devi,
Proc. Electrochem. Soc.2003, 2, 1477

Zinc amide compounds as potential precursors for the synthesis of zinc nitride
E. Maile, A. Devi, R. A. Fischer,
Proc. Electrochem. Soc.2003, 2, 975

A study on the metalorganic chemical vapor deposition of pure copper films from low cost copper(II) ) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand
R. Becker, A. Devi, J. Weiß, U. Weckenmann, M. Winter, C. Kiener, H. W. Becker, R. A. Fischer,
Chem. Vap. Deposition2003, 9, 149

MOCVD of gallium nitride nanostructures using (N₃)₂Ga{(CH₂)₃NR₂} R=Me, Et as single molecule precursor: Morphology control and materials characterization
J. Khanderi, A. Wohlfart, H. Parala, A. Devi, J. Hambrock, A. Birkner, R. A. Fischer,
J. Mater. Chem.2003, 13, 1438

Mononuclear mixed-ketoester-alkoxide compound of Ti as a promising precursor for MOCVD of TiO2 thin films
R. Bhakta, S. Regnery, F. Hipler, M. Winter, P. Ehrhart, R. Waser, A. Devi,
Chem. Vap. Deposition2003, 9, 295

Organische Puffer machen Metalloxide flüssig: Chemische Verpackungskünste für neue Computerchips
A. Devi,
ChemieRubin2003, 56

Synthesis and structure of mixed isopropoxide-ß-ketoester and ß-ketoamide zirconium complexes: Potential precursors for MOCVD of ZrO₂
U. Patil, M. Winter, H. W. Becker, A. Devi,
J. Mater. Chem.2003, 13, 2177

Pubikationen 2002

Thermodynamic investigation of the MOCVD of Cu films from bis(2,2,6,6-tetramethyl-3,5-heptadionato)copper (II)
S. Mukhopadhyay, K. Shalini, A. Devi, S. A. Shivashankar,
Bull. Mater. Sci.2002, 25, 391

Synthesis of nano-scale TiO2 particles by non-hydrolytic approach
H. Parala, A. Devi, R. Bhakta, R. A. Fischer,
J. Mater. Chem.2002, 12, 1625

Morphology controlled growth of arrays of GaN nanopillars and randomly distributed GaN nanowires on sapphire using (N₃)₂Ga[(CH₂)₃NMe₂)] as a single molecule precursor
A. Wohlfart, A. Devi, E. Maile, R. A. Fischer,
Chem. Comm.2002, 9, 998

MOCVD of aluminium oxide films using aluminium ß-diketonates as precursors
A. Devi, S. A. Shivashankar, A.G. Samuelson,
J. Phys. IV 2002, 12, 139

Strongly oriented thin films of Co₃O₄ deposited on single crystal MgO(100) by low-pressure, low-temperature MOCVD
A. U. Mane, K. Shalini, A. Devi, S. A. Shivashankar,
J. Cryst. Growth2002, 240, 157

Metalorganic chemical vapor deposition of Cu films from bis(t-butyl-3-oxo-butanato(copper (II): Thermodynamic investigation and experimental verification
S. Mukhopadhyay, K. Shalini, R. Lakshmi, A. Devi, S. A. Shivashankar,
Surface and Coatings Technology2002, 150, 205

Publications 2001

Investigations on InN Whiskers grown by Chemical Vapor Deposition
H. Parala, A. Devi, F. Hipler, E. Maile, A. Birkner, Hans W. Becker, R. A. Fischer,
J. Cryst. Growth2001, 231, 68

Nanosized GaN Particles by Chemical Vapor Infiltration
H. Parala, A. Devi, A. Birkner, R. A Fischer,
Proc. Electrochem. Soc.2001, 13, 429

Indium Nitride Whisker Growth by Chemical Vapor Deposition
H. Parala, A. Devi, F. Hipler, A. Birkner, R. A. Fischer,
Proc. Electrochem. Soc.2001, 13, 356

Growth of porous columnar alpha-GaN layers on c-plane Al₂O₃ by MOCVD using Bisazido dimethylaminopropyl gallium as single source precursor
A. Wohlfart, A. Devi, F. Hipler, H. W. Becker, R. A. Fischer,
J. Phys. IV2001, 11, 683

An Efficient Chemical Solution Deposition Method for Epitaxial GaN layers using Single Molecule Precursor
H. Parala, A. Devi, A. Wohlfart, M. Winter, R. A. Fischer,
Adv. Functional Mater.2001, 11, 224

Chemical Vapor Deposition of Copper using Copper(II) Amino Alkoxides
R. Becker, J. Weiß, A. Devi, R. A. Fischer,
J. Phys. IV2001, 11, 569

Synthesis of GaN Particles in Porous Matrices by Chemical Vapor Infiltration of Single Molecule Precursors
H. Parala, A. Devi, W. Rogge, A. Birkner, R. A. Fischer,
J. Phys. IV2001, 11, 473

Growth of InN Whiskers From Single Source Precursors
A. Devi, H. Parala, A. Wohlfart, A. Birkner, R. A. Fischer,
J. Phys. IV2001, 11, 577

A study of nucleation and growth in MOCVD: The growth of thin films of Alumina
M. P. Singh, S. Mukhopadhyay, A. Devi, S. A. Shivashankar,
Mater. Res. Soc. Symp. Proc.2001, 648, P6.47

Publications 2000

Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE using (N₃)₂Ga[(CH₂)₃NMe₂] as Single Source Precursor
A. Wohlfart, A. Devi, W. Rogge, R. A. Fischer, M. D. Allendorf, C. F. Melius,
Proc. Electrochem. Soc.2000, 13, 697

CVD of Thin Films of Copper and Cobalt from Different Precursors: Growth Kinetics and Microstructure
A. Mane, K. Shalini, A. Devi, R. Lakshmi, M. S. Dharmaprakash, M. Paranjape, S. A. Shivashankar,
Mat. Res. Soc. Symp. Proc.2000, 614, G6.11.1

Precursor Chemistry of Group-III Nitrides XVI: Synthesis and Structure of Monomeric Penta Coordinated Intramolecularly Adduct Stabilized Amidobisazides of Aluminium, Gallium and Indium with and all Nitrogen Coordination Sphere: OMCVD of GaN using (N₃)₂Ga{N[CH₂CH₂(NEt₂)]₂}
H. Sussek, O. Stark, A. Devi, H. Pritzkow, R. A. Fischer,
J. Organomet. Chem.2000, 602, 29

A Study on Bisazido(dimethylaminopropyl)gallium as Precursor for OMVPE of Gallium Nitride in a Cold Wall Reactor System at Reduced Pressure
A. Devi, W. Rogge, A. Wohlfart, F. Hipler, H. W. Becker, R. A. Fischer,
Chem. Vap. Deposition2000, 6, 245

Growth Kinetics of GaN Thin Films Grown by MOVPE Using Single Molecule Precursors
R. A. Fischer, A. Wohlfart, A. Devi, W. Rogge,
Mater. Res. Soc. Internet J. Nitride Semicond. Res.2000, 5, U136

Epitaxy, Disperse Powders and Colloids of Gallium Nitride achieved by transformation of single source precursors
H. Winkler, A. Devi, A. Manz, A. Wohlfart, W. Rogge, R. A. Fischer,
Physica Status Solidi A2000, 177, 27

Precursor Chemistry for OMVPE of Group-13 Nitrides
R. A. Fischer, A. Devi,
Developments in Crystal Growth Research2000, 2, 61

Publications 1999

Molecular Precursors to Group-13 Nitrides, 14: Synthesis and Structures of (N₃)₂Ga[(CH₂)₃NMe₂], (N₃)Ga[(CH₂)₃NMe₂]₂ and (N₃)₃Ga(NR₃) (R= CH₃, C₂H₅)
A. Devi, H. Sussek, H. Pritzkow, M. Winter, R. A. Fischer,
Eur. J. Inorg. Chem.1999, 12, 2127

OMVPE of GaN using (N3)2Ga[(CH2)3NMe2] (BAZIGA) in a Cold Wall Reactor
A. Devi, W. Rogge, R. A. Fischer, F. Stowasser, H. W. Becker, J. Schaefer, J. Wolfrum,
J. Phys. IV1999, (P8) Part 2, 589

Thermal Analysis of Metalorganic Complexes of Copper for Evaluation as CVD Precursors
A. Devi, S. A. Shivashankar,
J. Therm. Anal. Calorim.1999, 55, 259

Publications 1998

Thermal Chemical Vapor Deposition of Copper Films from Copper Ethylacetoacetate: Microstructure and Electrical Resistivity
A. Devi, S. A. Shivashankar,
J. Mater. Sci. Lett.1998, 17, 367

A novel Cu (II) precursor for CVD: Synthesis, Characterization and Application
A. Devi, J. Goswami, L. Raghunathan, S. A. Shivashankar, S. Chandrasekaran,
J. Mater. Res.1998, 13, 687

Publications 1996

Low-Temperature Structure of Two Copper Based Precursors for MOCVD: Bis(tert-butyl acetoacetato)aquo Copper(II) and Bis(dipivaloylmethanato) Copper(II)
S. Pattnaik, T. N. Guru Row, L. Raghunathan, A. Devi, J. Goswami, S. A. Shivashankar, S. Chandrasekaran, W. T. Robinson,
Acta Cryst. C1996, 52, 89

Chemical Vapor Deposition of Thin Films of Copper Using a New Metalorganic Precursor
J. Goswami, L. Raghunathan, A. Devi, S. A. Shivashankar, S. Chandrasekaran,
J. Mater. Sci. Lett.1996, 15, 573

Publications 1995

Thermal Investigations on Single Bimetallic Precursors for MOCVD of Ferroelectric Oxide Thin Films
M. M. A. Sekar, A.G.Samuelson, A. Devi, S. A. Shivashankar,
Proceedings of the 10th National Symposium on Thermal Analysis1995, 139

Evaluation by Thermal Analysis of Metalorganic Precursors for Chemical Vapor Deposition of Thin Films of Copper
A. Devi, R. Lakshmi, J. Goswami, S. A. Shivashankar and S. Chandrasekaran,
Proceedings of the 10th National Symposium on Thermal Analysis1995, 117

Publications 1994

Comparison of Growth and Microstructure of Copper Films deposited from different Cu(II) Precursors
J. Goswami, S. A. Shivashankar, L. Raghunathan, A. Devi, K. V. Ramanathan,
Mater. Res. Soc. Symp. Proc.1994, 337, 691