Highlights and full publication list

Publications 2025

• Heteroleptic Ruthenium p-Cymene Amidinate Complexes─A Synthetic Endeavor to Unearth Precursors for Ru Thin Films
  J Obenlüneschloß, J Klimars, I Selvakumar, B Mallick, M Schmickler, ...
  Inorganic Chemistry, 2025
  

• Atomic layer deposition
  E Kessels, A Devi, JS Park, M Ritala, A Yanguas-Gil, C Wiemer
  Nature Reviews Methods Primers 5 (1), 66, 2025
  

• From Precursors to Performance: Understanding the Chemistry in NiO Atomic Layer Deposition for Optimized Device Functionality
  V Kannampalli, M Schmickler, A Devi, B Fabre, C Lagrost, L Santinacci
  248th ECS Meeting (October 12-16, 2025), 2025
  

• Functional Nanomaterials Based Electrochemical and Chemiresistive Sensors for Hydrogen Detection: A Review
  P Ranjan, P Raizada, P Singh, A Devi, B Saha, A Singh
  Chemistry–An Asian Journal, e00712, 2025
  

• Rare mononuclear lithium–carbene complex for atomic layer deposition of lithium containing thin films
  J Obenlüneschloß, N Boysen, K Rönnby, A Muriqi, V Hoffmann, C Abad, ...
  Angewandte Chemie International Edition, e202513066, 2025
  

• Low-temperature, high-throughput spatial atomic layer deposition of NiOx nanocrystalline thin films from [Ni (ipki) 2]r
  S Porcar, M Schmickler, H Okcu, J Obenlüneschloß, S d’Ercole, ...
  Applied Surface Science Advances 29, 100836, 2025
  

• Near Room-Temperature Atomic Layer Deposition of Magnesium Oxide Using Bis-3-(N,N-dimethylamino)propyl Magnesium(II) and Water
  F Preischel, K Rönnby, L Mai, D Zanders, D Rogalla, B Mallick, M Nolan, ...
  Journal of the American Chemical Society 147 (35), 31764-31778, 2025
  

• High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces
  JP Glauber, J Lorenz, J Liu, M Seifert, V Hoffmann, C Abad, D Rogalla, ...
  ...
  

• Surface Oxidation of Transition Metal Nitrides
  J Liu, JP Glauber, J Lorenz, D Rogalla, C Harms, A Devi, M Nolan
  The Journal of Physical Chemistry C, 2025
  

• Outside Front Cover: Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth (Angew. Chem. 15/2025)
  JLV Arce, A Amoroso, N Perez, J Charvot, DN Hansen, P Zhao, J Yang, ...
  Angewandte Chemie 137 (15), e202506105, 2025
  

• Niedertemperatur‐Atomlagenabscheidung von (00l)‐Orientiertem Elementarem Bismut
  JL Vazquez‐Arce, A Amoroso, N Perez, J Charvot, D Naglav‐Hansen, ...
  Angewandte Chemie 137 (15), e202422578, 2025
  

• Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth
  JL Vazquez‐Arce, A Amoroso, N Perez, J Charvot, D Naglav‐Hansen, ...
  Angewandte Chemie International Edition 64 (15), e202422578, 2025
  

• Gas Sensor for Ammonia and Nitrogen Oxides Made of ALD Grown MoS₂
  RM Neubieser, LG Weckelmann, M Michel, M Unruh, D Zanders, A Kostka, ...
  IEEE Sensors Letters, 2025
  

• Atomic-layer-deposited CuxCryOz thin films
  G Bartholazzi, T Jussila, J Obenlüneschloß, V Vähänissi, A Devi, H Savin, ...
  ...
  

• Atomic-layer-deposited CuxCryOz thin films: Optoelectronic properties and potential application as hole-selective contacts for c-Si solar cells
  G Bartholazzi, T Jussila, J Obenlüneschloß, V Vähänissi, A Devi, H Savin, ...
  Applied Surface Science 683, 161793, 2025
  

• Atomic and molecular layer deposition of functional thin films based on rare earth elements
  A Ghazy, D Zanders, A Devi, M Karppinen
  Advanced Materials Interfaces 12 (4), 2400274, 2025
  

• Atomic Layer Deposition of NiO x: Harnessing the Potential of New Precursor Combinations for Photoelectrochemical Water Oxidation
  V Kannampalli, M Schmickler, B Fabre, L Largeau, A Seyeux, A Jose, ...
  Journal of Materials Chemistry A, 2025
  

• Plasma-Enhanced Atomic Layer Deposition of AlPO 4/AlP x O y: Comparing Dual Source and Supercycle Approaches for Composition Control
  F Preischel, D Zanders, JP Glauber, K Rönnby, D Rogalla, T Gemming, ...
  Dalton Transactions, 2025
  

• New dithiooxamide derivatives as promising precursors for ALD/MLD applications
  P Kaur, M Nisula, C Detavernier, A Devi
  Dalton Transactions, 2025
  
• Ein seltener mononuklearer Lithium‐Carben‐Komplex für die Atomlagenabscheidung von lithiumhaltigen Dünnschichten
  J Obenlüneschloß, N Boysen, K Rönnby, A Muriqi, V Hoffmann, C Abad, ... Angewandte Chemie, e202513066, 2025
  

•    Surface Oxidation of Transition Metal Nitrides
  J. Liu, J.-P. Glauber, J. Lorenz, D. Rogalla, C. Harms, A. Devi, M. Nolan
  J. Phys. Chem. C, 2025, XXXX, XXX, XXX-XXX
  

Publications 2024

• Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces
  K. Yu. Monakhov, C. Meinecke, M. Moors, C. Schmitz-Antoniak, T. Blaudeck , J. Hann, C. Bickmann, D. Reuter, T. Otto, S. E. Schulz, H. Parala, A. Devi
  Pure Appl. Chem., 2024, 96, 9, 1313-1331
  

• Assessing the potential of non-pyrophoric Zn(DMP)₂ for the fast deposition of ZnO functional coatings by spatial atomic layer deposition
  L. Johnston, J. Obenlüneschloß, M. Farooq Khan Niazi, M. Weber, C. Lausecker, L. Rapenne, H. Roussel, C. Sanchez-Velazquez, D. Bellet, A. Devi, D. Muñoz-Rojas
  RSC Appl. Interfaces, 2024, Advanced Article
  

• A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction
  J.-P. Glauber, J. Lorenz, J. Liu, B. Müller, S. Bragulla, A. Kostka, D. Rogalla, M. Wark, M. Nolan, C. Harms, A. Devi,
  Dalton Trans., 2024, Advance Article
  

• Tuning the Permeation Properties of Poly(1-trimethylsilyl-1-propyne) by Vapor Phase Infiltration Using Trimethylaluminum
  J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, T. de los Arcos, V. Raj Damerla, A. Kostka, J. Franke, R. Dahlmann, T. D. Kühne, M. Wessling, P. Awakowicz, A. Devi,
  Adv. Mater. Interfaces, 2024, 2400171
  

• Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements
  A. Ghazy, D. Zanders, A. Devi, M. Karppinen,
  Adv. Mater. Interfaces, 2024, 2400274
  

• Targeting Manganese Amidinates and ß-Ketoiminates Complexes as Precursors for Mn-Based Thin Film Vapor Deposition
  M. Wilken, A. Muriqi, A. Krusenbaum, M. Nolan, A. Devi
  Chem. Eur. J., 2024, e202401275
  

• Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition
  N. Huster, R. Mullins, M. Nolan, A. Devi
  Dalton Trans., 2024, 53, 7711 – 7720
  

Publications 2023

• Ultrafast surface-specific spectroscopy of water at a photoexcited TiO₂ model water-splitting photocatalyst
  E. H. G. Backus, S. Hosseinpour, C. Ramanan, S. Sun, S. J. Schlegel, M. Zelenka, X. Jia, M. Gebhard, A. Devi, H. I. Wang, M. Bonn
  Angew. Chem. Int. Ed., 2023, e202312123
  

• In pursuit of next generation N-heterocyclic carbene-stabilized copper and silver precursors for metalorganic chemical vapor deposition and atomic layer deposition processes
  I. Selvakumar, N. Boysen, M. Bürger, A. Devi
  Chemistry, 2023, 5, 2038
  

• Ultrashort pulse laser annealing of amorphous atomic layer deposited MoS₂ films
  M. J. M. J. Becher, J. Jagosz, R.-M. Neubieser, J.-L. Wree, A. Devi, M. Michel, C. Bock, E, L. Gurevich, A. Ostendorf
  Adv. Eng. Mater., 2023, 25, 2300677
  

• Advances in photo-assisted seawater splitting promoted by green iron oxide-carbon nitride photoelectrocatalysts
  M. Benedet, G. A Rizzi, O. I Lebedev, V. Roddatis, C. Sada, J.-L Wree, A. Devi, C. Maccato, A. Gasparotto, D. Barreca
  J. Mater. Chem. A, 2023, 11 (40), 21595
  

• PECVD and PEALD on polymer substrates (Part I): Fundamentals and analysis of plasma activation and thin film growth
  T. de los Arcos, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T. D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. Grundmeier
  Plasma Process Polym., 2023, e 2300150
  

• PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films
  T. de los Arcos, P. Awakowicz, M. Böke, N. Boysen, R. P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T. D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier
  Plasma Process Polym., 2023, e 2300186
  

• Fe₂O₃-graphitic carbon nitride nanocomposites analyzed by XPS
  M. Benedet, D. Barreca, G. A. Rizzi, C. Maccato, J-L. Wree, A. Devi, A. Gasparotto
  Surf. Sci. Spectra, 2023, 30, 024021
  

• Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al₂O₃ atomic layer deposition
  X. Xie, D. Zanders, F. Preischel, T. de los Arcos, A. Devi, G. Grundmeier
  Surf. Interface Anal., 2023, 55, 886
  

• Interplay of Precursor and Plasma for The Deposition of HfO₂ via PEALD: Film Growth and Dielectric Properties
  F. Preischel, D. Zanders, T. Berning, A. Kostka, D. Rogalla, C. Bock, A. Devi
  Adv. Mater. Interfaces, 2023, 2300244

• The impact of plasma enhancement on the deposition of carbon containing zirconia films by metalorganic chemical vapor deposition
  P. A. Maaß, V. Bedarev, L. Chauvet, M. Prenzel, J.-P. Glauber, A. Devi, M. Böke, A. von Keudell
  Plasma Processes Polym., 2023, e2300050

• Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor
  S. Stefanovic, N. Gheshlaghi, D. Zanders, I. Kundrata, B. Zhao, M. K. S. Barr, M. Halik, A. Devi, J. Bachmann
  Small, 2023, 2301774

• Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It
  M. Weber, N. Boysen, O. Graniel, A. Sekkat, C. Dussarrat, P. Wiff, A. Devi, D. Muñoz-Rojas
  ACS Mater. Au, 2023, 3, 4, 274–298

• Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing
  J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. Devi
  ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512

Publications 2022

• Size and shape exclusion in 2D silicon dioxide membranes
  P. Dementyev, N. Khayya, D. Zanders, I. Ennen, A. Devi, E. Altman
  Small, 2022, 2205602

• Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal–organic complexes
  N. Boysen, A. Devi
  Eur. J. Mass Spectrometry, 2022, 29(1), 12-20

• Heterostructured α‐Fe₂O₃@ZnO@ZIF‐8 Core–Shell Nanowires for a Highly Selective MEMS‐Based ppb‐Level H₂S Gas Sensor System
  L.‐Y. Zhu, X.‐Y. Miao, L.‐X. Ou, L.‐W. Mao, K. Yuan, S. Sun, A. Devi, H.‐L. Lu
  Small, 2022, 18, 2204828

• Highly sensitive and stable MEMS acetone sensors based on well-designed α-Fe₂O₃/C mesoporous nanorods
  L.-Y. Zhu, K. Yuan, Z.-C. Li, X.-Y. Miao, J.-C. Wang, S. Sun, A. Devi, H.-L. Lu
  J. Colloid Interface Sci., 2022, 622, 156

• CVD grown tungsten oxide for low temperature hydrogen gas sensors: Tuning surface characteristics via materials processing for sensing applications
  M. Wilken, E. Ciftyürek, S. Cwik, L. Mai, B. Mallick, D. Rogalla, K. D. Schierbaum, A. Devi
  Small, 2022, 2204636

• High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors
  N. Boysen, J.-L. Wree, D. Zanders, D. Rogalla, D. Öhl, W. Schuhmann, A. Devi
  ACS Appl. Mater. Interfaces, 2022, 14, 46, 52149–52162

• Nucleation and growth studies of large-area deposited WS2 on flexible substrates
  T. Berning, M. Becher, J.-L. Wree, J. Jagosz, A. Kostka, A. Ostendorf, A. Devi, C. Bock
  Mater. Res. Express, 2022, 9, 116401

• Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction
  D. Zanders, J. Obenlüneschloß, J.-L. Wree, J. Jagosz, P. Kaur, N. Boysen, D. Rogalla, A. Kostka, C. Bock, D. Öhl, M. Gock, W. Schuhmann, A. Devi
  Adv. Mater. Interfaces, 2022, 2201709

• Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure
  T. Hasselmann, B. Misimi, N. Boysen, D. Zanders, J.-L. Wree, D. Rogalla, T. Haeger, F. Zimmermann, K. O. Brinkmann, S. Schädler, D. Theirich, R. Heiderhoff, A. Devi, T. Riedl
  Adv. Mater. Technol., 2022, 2200796

• An Unusual Tri-coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes
  D. Zanders, J. D. Masuda, B. Lowe, S. Curtis, A. Devi, S. T. Barry
  Z. anorg. allg. Chem., 2022, e202200249

• SnO via Water Based ALD employing Tin(II) Formamidinate: Precursor Characterization and Process Development
  N. Huster, R. Ghiyasi, D. Zanders, D. Rogalla, M. Karppinen, A. Devi
  Dalton Trans., 2022, 51, 14970-14979

• Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors
  A. Philip, L. Mai, R. Ghiyasi, A. Devi, M. Karppinen
  Dalton Trans., 2022, 51, 14508-14516

• Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films
  J.-L. Wree, J.-P. Glauber, D. Zanders, D. Rogalla, M. Becher, M. B. E. Griffiths, A. Ostendort, S. T. Barry, A. Ney, A. Devi
  ACS Appl. Electron. Mater., 2022, 4, 8, 3772–3779

• Atomic / Molecular Layer Deposition of Cerium (III) Hybrid Thin Films using Rigid Organic Precursors
  P. Kaur, A. Muriqi, J.-L. Wree, R. Ghiyasi, M. Safdar, M. Nolan, M. Karppinen, A. Devi
  Dalton Trans., 2022, 51, 5603-5611

• Low-temperature ALD process development of 200 mm wafer-scale MoS₂ for gas sensing application
  R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A. Devi, C. Bock, M. Michel, A. Grabmaier
  Micro Nano Eng., 2022, 15, 100126

• Molecular Permeation in Freestanding Bilayer Silica
  Daniil Naberezhnyi, L. Mai, N. Doudin, I. Ennen, A. Hütten, E. I. Altman, A. Devi, P. Dementyev
  Nano Lett., 2022, 22, 3, 1287–1293

• Bendable Polycrystalline and Magnetic CoFe₂O₄ Membranes by Chemical Methods
  P. Salles, R. Guzmán, D. Zanders, A. Quintana, I. Fina, F. Sánchez, W. Zhou, A. Devi, M. Coll
  ACS Appl. Mater. Interfaces, 2022, 14, 10, 12845–12854

• Role of anionic backbone in NHC-stabilized coinage metal complexes: New precursors for atomic layer deposition
  N. Boysen, A. Philip, D. Rogalla, M. Karppinen, A. Devi
  Chem. Eur. J., 2022, 28, e202103798

• Ferromagnetic europium sulfide thin films: Influence of precursors on magneto-optical properties
  S. M. J. Beer, M. Arbersha, P. Lindner, M. Winter, D. Rogalla, M. Nolan, A. Ney, J. Debus, A. Devi
  Chem. Mater., 2022, 34, 1, 152–164.

• Influence of Different Ester Side Groups in Polymers on the Vapor Phase Infiltration with Trimethyl Aluminum
  L. Mai, D. Maniar, F. Zysk, J. Schöbel, T. Kühne, K. Loos, A. Devi
  Dalton Trans., 2022, 51, 1384–1394.

Publications 2021

• Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties
  D. Zanders, N. Boysen, M. A. Land, J. Obenlüneschloß, J. D. Masuda, B. Mallick, S. T. Barry, A. Devi
  Eur. J. Inorg. Chem., 2021, e202100851

• CVD grown GaSb_xN_1-x films as visible-light active photoanodes
  D. Zywitzki, D. Mitoraj, Y. Vilk, O. Mendoza Reyes, M. Schleuning, D. Friedrich, A. Sadlo, D. Rogalla, R. Eichberger, R. Beranek, A. Devi
  Dalton Trans., 2021, 50, 14832-14841.

• Chemical vapor deposition of Cobalt and Nickel Ferrite thin films: Investigation of structure and pseudocapacitive properties
  D. Zywitzki, R. Schaper, E. Ciftyürek, J.-L. Wree, D. H. Taffa, D. M. Baier, D. Rogalla, Y. Li, M. Meischein, A. Ludwig, Z. Li, K. Schierbaum, M. Wark, A. Devi
  Adv. Mater. Interfaces, 2021, 8, 2100949.

• A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
  S. M. J. Beer, N. Boysen, A. Muriqi, D. Zanders, T. Berning, D. Rogalla, C. Bock, M. Nolan, A. Devi
  Dalton Trans., 2021, 50, 12944-12956.

• Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metalorganic chemical vapour deposition
  J.‑L. Wree, J.‑P. Glauber, D. Öhl, A. Niesen, A. Kostka, D. Rogalla, W. Schuhmann, A. Devi
  J. Mater. Chem. C, 2021, 9, 10254-10265.

• Atomic Layer Deposition of High-Quality Copper Metal Films from Cu(acac)₂ and Hydroquinone Reductant
  T. S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen
  Adv. Eng. Mater., 2021, 23, 2100446.

• Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low Resistivity Co Thin Films
  D. Zanders, J. Liu, J. Obenlüneschloß, C. Bock, D. Rogalla, L. Mai, M. Nolan, S. T. Barry, A.Devi
  Chem. Mater, 2021, 33, 13, 5045-5057.

• Direct liquid injection chemical vapor deposition of ZrO₂ films from a heteroleptic Zr precursor: interplay between film characteristics and corrosion protection of stainless steel
  S. M. J. Beer, D. Samelor, A. Abdel Aal, J. Etzkorn, D. Rogalla, A. E. Turgambaeva, J. Esvan, A. Kostka, C. Vahlas, A. Devi
  J. Mater. Res. Technol., 2021, 13, 1599-1614.

• Investigation of an atomic-layer-deposited Al₂O₃ diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform
  Y. Li, D. Zanders, M. Meischein, A. Devi, A. Ludwig
  Surf. Interface Anal., 2021, 53, 727-733.

• (^tBuN)SiMe₂NMe₂ – A new N,N’-Κ₂-monoanionic ligand for atomic layer deposition precursors
  M. B. E. Griffiths, D. Zanders, M. A. Land, J. D. Masuda, A. Devi, S. T. Barry
  J. Vac. Sci. Technol., A, 2021, 39, 032409.

• Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application
  P. Kaur, L. Mai, A. Muriqi, D. Zanders, R. Ghiyasi, M. Safdar, N. Boysen, M. Winter, M. Nolan, M. Karppinen, A. Devi
  Chem. Eur. J., 2021, 27, 4913–4926.

• Atomic layer deposition of dielectric Y₂O₃ thin films from a homoleptic yttrium formamidinate precursor and water
  N. Boysen, D. Zanders, T. Berning, S. M. J. Beer, D. Rogalla, C. Bock, A. Devi,
  RSC Advances, 2021, 11, 2565-2574.

• Fabrication of Gd_xFe_yO_z films using an atomic layer deposition-type approach
  P. Yu, S. M. J. Beer, A. Devi, M. Coll,
  CrystEngComm., 2021, 23, 730-740.

Publications 2020

• A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
  N. Boysen, B. Misimi, A. Muriqi, J.-L. Wree, T. Hasselmann, D. Rogalla. T. Haeger, D. Theirich, M. T. Riedl, A. Devi
  Chem. Commun., 2020, 56, 13752-13755.

• A new metalorganic chemical vapor deposition process for MoS₂ with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
  J.-L. Wree, E. Ciftyurek, D. Zanders, N. Boysen, A. Kostka, D. Rogalla, M. Kasischke, A. Ostendorf, K. Schierbaum, A. Devi
  Dalton Trans., 2020, 49, 13462-13474.

• Study on structural and thermal characteristics of heteroleptic yttrium complexes as potential precursors for vapor phase deposition
  S. M. J. Beer, A. Krusenbaum, M. Winter, C. Vahlas, A. Devi,
  Eur. J. Inorg. Chem., 2020, 3587–3596.

• Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts
  D. Zywitzki, D. Taffa, L. Lamkowski, M. Winter, D. Rogalla, M. Wark, A. Devi,
  Inorg. Chem., 2020, 59, , 14, 10059–10070.

• Additive-free spin coating of tin oxide thin films: Synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes
  N. Huster, D. Zanders, S. Karle, D. Rogalla A. Devi,
  Dalton Trans., 2020, 49, 10755-10764.

• A Rare Low‐Spin Co(IV) Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration
  D. Zanders, G. Bačić, D. Leckie, D. O. Odegbesan, J. Rawson, J. D. Masuda, A. Devi, S. T. Barry,
  Angew. Chem., Int. Ed., 2020, 59, 33, 14138-14142.

• From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
  L. Mai, F. Mitschker, C. Bock, A. Niesen, E. Ciftyurek, D. Rogalla, J. Mickler, M. Erig, Z. Li, P. Awakowicz, K. Schierbaum, A. Devi,
  Small, 2020, 16, 1907506.

• Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO₄, CuO, and WO₃ Thin Films for Photoelectrocatalysis
  J. Hirst, S. Müller, D. Peeters, A. Sadlo, L. Mai, O. Mendoza Reyes, D. Friedrich, D. Mitoraj, A. Devi, R. Beranek, R. Eichberger,
  Z. Phys. Chem., 2020, 234(4), 699–717.

Publications 2019

• PEALD of HfO₂ Thin Films: Precursor Tuning and a New Near Ambient Pressure XPS Approach to in-situ Examination of Thin Film Surfaces Exposed to Reactive Gases
  D. Zanders, E. Ciftyurek, E. Subaşı, N. Huster, C. Bock, A. Kostka, D. Rogalla, K. Schierbaum and A. Devi
  ACS Appl. Mater. Interfaces, 2019, 11, 31, 28407-28422.

• Up-converting ALD/MLD thin films with Yb³⁺, Er³⁺ in amorphous organic framework
  M. Tuomisto, Z. Giedraityte, L. Mai, A. Devi, V. Boiko, K. Grzeszkiewicz, D. Hreniak, M. Karppinen, M. Lastusaari
  J. Lumin., 2019, 215, 310-315

• How Water Flips at Charged Titanium Dioxide: An SFG-Study on the Water-TiO₂-Interface
  S. J. Schlegel, S. Hosseinpour, M. Gebhard, A. Devi, M. Bonn, E. H.G. Backus,
  Phys. Chem. Chem. Phys., 2019, 21, 8956-8964

• Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide
  L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. Devi
  Chem. – Eur. J., 2019, 25, 7489 –7500

• Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
  L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,
  ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180

• Luminescent Nd₂S₃ thin films: A new chemical vapour deposition route towards rare-earth sulphides
  S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. Devi
  Dalton Trans., 2019, 48, 2926 – 2938

• Validation of a terminally amino functionalized tetra alkyl Sn(IV) precursor in metalorganic chemical vapor deposition of SnO₂ thin films: Study of film growth characteristics, optical and electrical properties
  D. Zanders, E. Ciftyurek, C. Hoppe, A. Kostka, D. Rogalla, T. de los Arcos, G. Grundmeier, K. D. Schierbaum, A. Devi
  Adv. Mater. Interfaces2019, 6, 1801540

• Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films
  A. Sadlo, D. Peeters, R. Albert, D. Rogalla, H.-W. Becker, R. Schmechel, A. Devi,
  J. Nanosci. Nanotechnol.2019, 19, 867-876

Publications 2018

• Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics
  D. K. Ngwashi, S. Paul, A. Devi, R. B. M. Cross,
  Advances in Materials2018, 7(4), 137-143

• Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato precursors: Process Development, Film Characterization, and Gas Sensing Properties
  M. Mattinen, J.-L. Wree, N. Stegmann, E. Ciftyurek, M. E. Achhab, P. J. King, K. Mizohata, J. Räisänen, K. D. Schierbaum, A. Devi, M. Ritala, M. Leskelä,
  Chem. Mater.2018, 30(23), 8690-8701

• Atomic/molecular layer deposition of Cu–organic thin films
  D. J. Hagen, L. Mai, A. Devi, J. Sainioc, M. Karppinen,
  Dalton Trans.2018, 47, 15791-15800

• An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure
  N. Boysen, T. Hasselmann, S. Karle, D. Rogalla, D. Theirich, M. Winter, T. Riedl, A. Devi,
  Angew. Chem. Int. Ed.2018, 57, 16224–16227

• Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate
  M. Siebels, L. Mai, L. Schmoltke, K. Schütte, J. Barthel, J. Yue, J. Thomas, B. M. Smarsly, A. Devi, R. A. Fischer, C. Janiak,
  Beilstein J. Nanotechnol.2018, 9, 1881-1894

• Designing Stability into Thermally Reactive Plumbylenes
  Bačić, G., Zanders, D., Mallick, B., Devi, A., Barry, S. T.
  Inorg. Chem.2018, 57, 8218−8226

• Direct growth of MoS₂ and WS₂ layers by Metal Organic Chemical Vapor Deposition
  S. Cwik, D. Mitoraj, D. Rogalla, D. Peeters, J. Kim, O. Mendoza Reyes, H. M. Schütz, C. Bock, R. Beranek, A. Devi,
  Adv. Mater. Interfaces2018, 5, 1800140

• Fabrication of Zinc-Dicarboxylate- and Zinc-Pyrazolate-Carboxylate-Framework Thin Films through Vapour-Solid Deposition
  R. Medishetty, Z. Zhang, A. Sadlo, S. Cwik, D. Peeters, S. Henke, N. Mangayarkarasi, A. Devi,
  Dalton Trans.2018, 47, 14179-14183

• Rational development of cobalt β-ketoiminate complexes: Alternative precursors for vapor phase deposition of spinel cobalt oxide photoelectrodes
  K. j. Puring, D. Zywitzki, D. H. Taffa, D. Rogalla, M. Winter, M. Wark, A. Devi,
  Inorg. Chem.2018, 57(9), 5133–5144

• Ultrasound-mediated deposition and cytocompatibility of apatite-like coatings on magnesium alloys
  C.-N. Lui, F. Böke, M. Gebhard, A. Devi, H. Fischer, A. Keller, G. Grundmeier,
  Surf. Coat. Technol.2018, 345, 167-176

• PEALD of SiO₂ and Al₂O₃ thin films on polypropylene: Investigations of the film growth at the interface, stress and gas barrier properties of dyads
  M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, T. de Los Arcos, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi,
  ACS Appl. Mater. Interfaces2018, 10, 7422-7434

• CVD-grown copper tungstate thin films for solar water splitting
  D. Peeters, O. Mendoza Reyes, L. Mai, A. Sadlo, S. Cwik, D. Rogalla, H. Schütz, H.-W. Becker, J. Hirst, S. Müller, D. Friedrich, D. Mitoraj, M. Nagli, M. Caspary Toroker, R. Eichberger, R. Beranek, A. Devi,
  J. Mater. Chem. A2018, 6, 10206–10216

• Tailored β-ketoiminato complexes of iron: Synthesis, characterisation and evaluation towards solution based deposition of iron oxide thin films
  A. Sadlo, S. M. J. Beer, S. Rahman, M. Grafen, D. Rogalla, M. Winter, A. Ostendorf, A. Devi,
  Eur. J. Inorg. Chem.2018, 1824-1833

• A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD
  M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, a. Devi,
  Plasma Processes Polym.2018, 15, e1700209

• Water assisted atomic layer deposition of yttrium oxide using tris(N,N’-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties
  L. Mai, N. Boysen, E. Subaşı, T. de los Arcos, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi,
  RSC Adv.2018, 8, 4987-4994

• Molecular engineering of Ga-ketoiminates: Synthesis, structure and evaluation as precursors for the additive-free spin-coated deposition of gallium oxide thin films
  R. O’Donoghue, S. Rahman, B. Mallick, M. Winter, D. Rogalla, H. -W. Becker, A. Devi,
  New. J. Chem.2018, 42, 3196-3210

• Manganese(II) Molecular Sources for Plasma-Assisted CVD of Mn Oxides and Fluorides: From Precursors to Growth Process
  D. Barreca, G. Carraro, E. Fois, A. Gasparotto, F. Gri, R. Seraglia, M. Wilken, A. Venzo, A. Devi, G. Tabacchi, C. Maccato,
  J. Phys. Chem. C2018, 122, 1367

• Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
  M. Wiesing, T. de los Arcos, M. Gebhard, A. Devi, G. Grundmeier,
  Phys. Chem. Chem. Phys. 2018, 20, 180-190

• Atomic Layer Deposition of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors
  Q.-H. Ren, Y. Zhang, H.-L. Lu, Y.-P. Wang, W.-J. Liu, X.-M. Ji, A. Devi, A.-Q. Jiang, D. W. Zhang,
  ACS Appl. Mater. Interfaces 20182018, 10, 468-476

Publications 2017

• Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
  R. O’Donoghue, J. Rechmann, M. Aghaee, D. Rogalla, H.-W. Becker, M. Creatore, A. D. Wieck and A. Devi,
  Dalton Trans.2017, 46, 16551-16561

• Molecular Engineering of Mn^II Diamine Diketonate Precursors for the Vapor Deposition of Manganese Oxide Nanostructures
  C. Maccato, L. Bigiani, G. Carraro, A. Gasparotto, R. Seraglia, J. Kim, A. Devi, G. Tabacchi, E. Fois, G. Pace, V. Di Noto and D. Barreca,
  Chem. Eur. J.2017, 23, 17954-17963

• Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN
  S. Cwik, S. M. J. Beer, S. Hoffmann, M. Krasnopolski, D. Rogalla, H.-W. Becker, D. Peeters, A. Ney and A. Devi,
  ACS Appl. Mater. Interfaces2017, 9 (32), 27036–27044

• Temperature Dependent Transport Mechanisms through PE-CVD Coatings: Comparison of Oxygen and Water Vapour
  D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, C. Hopmann, M. Böke, J. Benedikt, A. Devi, P. Awakowicz and R. Dahlmann,
  J. Phys. D: Appl. Phys.2017, 50, 395302

• Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)₂ and Tertiary Butyl Hydrazine
  K. Väyrynen, K. Mizohata, J. Räisänen, D. Peeters, A. Devi, M. Ritala†, and M. Leskelä,
  Chem. Mater.2017, 29 (15), 6502–6510

• Unearthing [3-(dimethylamino)propyl] aluminium(III) complexes as novel ALD precursors for Al₂O₃: Synthesis, characterization and ALD process development
  L. Mai, M. Gebhard, T. de los Arcos, I. Giner, F. Mischker, M. Winter, H. Parala, P. Awakowicz, G. Grundmeier, A. Devi,
  Chem. – Eur. J.2017, 45, 10768–10772

• Low temperature atomic layer deposition of cobalt oxide as an effective catalyst for photoelectrochemical water splitting devices
  J. Kim, T. Iivonen, J. Hämäläinen, M. Kemell, K. Meinander, K. Mizohata, L. Wang, J. Räisänen, R. Beranek, M. Leskelä, A. Devi,
  Chem. Mater.2017, 29 (14), 5796–5805

• New amidinate complexes of indium(III): Promising CVD precursors for transparent and conductive In₂O₃ thin films
  M. Gebhard, M. Hellwig, A. Kroll, D. Rogalla, M. Winter, B. Mallick, A. Ludwig, M. Wiesing, A. Wieck, G. Grundmeier, A. Devi,
  Dalton Trans.2017, 46, 10220-10231

• Photoactive zinc ferrites fabricated via conventional CVD approach
  D. Peeters, D. H. Taffa, M. M. Kerrigan, A. Ney, N. Jöns, D. Rogalla, S. Cwik, H.-W. Becker, M. Grafen, A. Ostendorf, C. H. Winter, S. Chakraborty, M. Wark, A. Devi,
  ACS Sustainable Chem. Eng.2017, 5, 2917-2926

• Nanostructured Fe₂O₃ Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor
  D. Peeters, A. Sadlo, K. Lowjaga, O. Mendoza Reyes, L. Wang, L. Mai, M. Gebhard, D. Rogalla, H.-W. Becker, I. Giner, G. Grundmeier, D. Mitoraj, M. Grafen, A. Ostendorf, R. Beranek and A. Devi,
  Adv. Mater. Interfaces2017, 18, 1700155 (11pp)

• Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence
  F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, M. Boeke, J. Benedikt, I. Giner, T. de los Arcos, C. Hopmann, G. Grundmeier, A. Devi and P. Awakowicz,
  J. Phys. D.: Appl. Phys.2017, 50, 235201 (11pp)

• Transport mechanims through PECVD coatings: influence of temperature, coating properties and defects on permeation of water vapor
  D. Kirchheim, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, C. Hopmann, M. Böke, A. Devi, P. Awakowicz and R. Dahlmann,
  J. Phys. D: Appl. Phys.2017, 50(8), 085203

• Atomic/molecular layer deposition of hybrid inorganic-organic thin films from erbium guanidinate precursor
  Lukas Mai, Zivile Giedraityte, Marcel Schmidt, Detlef Rogalla, Sven Scholz, Andreas D. Wieck, Anjana Devi and Maarit Karppinen,
  J. Mater. Sci.2017, 11, 6216–6224

• Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films
  S. Karle, D. Rogalla, A. Ludwig, H. –W. Becker, A. Wieck, M. Grafen, A. Ostendorf and A. Devi,
  Dalton Trans.2017, 46, 2670-2679

Publications 2016

• An efficient PE-ALD process for TiO₂ thin films employing a new Ti-precursor
  M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier and A. Devi,
  J. Mater. Chem. C2016, 4, 1057

• Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer deposition of zinc oxide
  R. O’ Donoghue, D. Peeters, D. Rogalla, H. -W. Becker, J. Rechmann, S. Henke, M. Winter and A. Devi,
  Dalton Trans.2016, 45 (47), 19012

• Review Article: Recommended reading list of early publications on atomic layer deposition – Outcome of the “Virtual Project on the History of ALD
  Esko Ahvenniemi Andrew R. Akbashev Saima Ali Mikhael Bechelany Maria Berdova Stefan Boyadjiev David C. Cameron Rong Chen Mikhail Chubarov Veronique Cremers Anjana Devi Viktor Drozd Liliya Elnikova Gloria Gottardi Kestutis Grigoras Dennis M. Hausmann Cheol Seong Hwang Shih-Hui Jen Tanja Kallio Jaana Kanervo Ivan Khmelnitskiy Do Han Kim Lev Klibanov Yury Koshtyal A. Outi I. Krause Jakob Kuhs Irina Kärkkänen Marja-Leena Kääriäinen Tommi Kääriäinen Luca Lamagna Adam A. Łapicki Markku Leskelä Harri Lipsanen Jussi Lyytinen Anatoly Malkov and Anatoly Malygin Abdelkader Mennad Christian Militzer Jyrki Molarius Małgorzata Norek Çağla Özgit-Akgün Mikhail Panov Henrik Pedersen Fabien Piallat Georgi Popov Riikka L. Puurunen Geert Rampelberg Robin H. A. Ras Erwan Rauwel Fred Roozeboom Timo Sajavaara Hossein Salami Hele Savin Nathanaelle Schneider Thomas E. Seidel Jonas Sundqvist Dmitry B. Suyatin Tobias Törndahl J. Ruud van Ommen Claudia Wiemer Oili M. E. Ylivaara Oksana Yurkevich,
  J. Vac. Sci. Technol.2016, 35(1), 010801/1-010801/13.

Publications 2015

• MOCVD of TiO₂ thin films from a modified titanium alkoxide precursor
  S. J. Kim, V. S. Dang, K. Xu, D. Barreca, C. Maccato, G. Carraro, R. K. Bhakta, M. Winter, H.-W. Becker, D. Rogalla, C. Sada, R. A. Fischer, A. Devi,
  Phys. Stat. Solidi (a)2015, 212, 1563

• Metal-organic CVD of Y₂O₃ Thin Films using Yttrium tris-amidinates
  S. Karle, V.-S. Dang, M. Prenzel, D. Rogalla, H.-W. Becker and A. Devi,
  Chem. Vap. Dep.2015, 10-11-12, 335

Publications 2014

• Indium-tris-guanidinates: a promising class of precursors for water assisted atomic layer deposition of In₂O₃ thin films
  M. Gebhard, M. Hellwig, H. Parala, K. Xu, M. Winter, A. Devi,
  Dalton Trans.2014, 43(3), 937

• Investigations on the structural, compositional and functional properties of MOCVD grown Er₂O₃ thin films
  K. Xu, V. S. Dang, A. Ney, T. de los Arcos, A. Devi,
  J. Nanosci. Nanotechnol.2014, 14(7), 5095

• MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
  N. B. Srinivasan, T. Thiede, T. de los Arcos, D. Rogalla, H.-W. Becker, A. Devi, R. A. Fischer,
  Physica Status Solidi A: Applications and Materials Science2014, 211(2), 260

• Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization
  D. Peeters, G. Carraro, C. Maccato, H. Parala, A. Gasparotto, D. Barreca, C. Sada, K. Kartaschew, M. Havenith, D. Rogalla,
  Physica Status Solidi A: Applications and Materials Science2014, 211(2), 316

• Novel ß-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for soultion based processing of ZrO₂ thin films
  M. Banerjee, R. W: Seidel, M. Winter, H.-W. Becker, D. Rogalla, A. Devi,
  Dalton Trans.2014, 43(6), 2384

• Electrical and optical properties of TiO₂ thin films prepared by plasma-enhanced atomic layer deposition
  V.S. Dang, H. Parala, J. H. Kim, K. Xu, N. B. Srinivasan, E. Edengeiser, M. Havenith, A. WIeck, T. de los Arcos, R. A. Fischer,
  Physica Status Solidi A: Applications and Materials Science2014, 211(2), 416

• Surface Decoration of ε-Fe₂O₃ Nanorods by CuO Via a Two-Step CVD/Sputtering Approach
  D. Barreca, G. Carraro, D. Peeters, A. Gasparotto, C. Maccato, W. M. M. Kessels, V. Longo, F. Rossi, E. Bontempi, C. Sada, A. Devi,
  Chem. Vap. Deposition2014, 20(7-9), 313

• Recent advances using guanidinate ligands for chemical vapour deposition (CVD) and atomic layer deposition (ALD) applications
  A. Kurek, P. Gordon, S. Karle, A. Devi, S. T. Barry,
  Aust. J. Chem2014, 67(7), 989

• Preface to the CVD Special Issue: Atomic-Scale-Engineered Materials (ASEM)
  A. Devi, W. M. M. Kessels ,
  Chem. Vap. Deposition2014, 20(7-9), 186

• MOCVD of TiO₂ Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties
  M. Banerjee, V.-S. Dang, M. Bledowski, R. Beranek, H.-W. Becker, D. Rogalla, E. Edengeiser, M. Havenith, A. D. Wieck, A. Devi,
  Chem. Vap. Deposition2014, 20(7-9), 224

• Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO₂ Films
  V.-S. Dang, M. Banerjee, H. Zhu, N. B. Srinivasan, H. Parala, J. Pfetzing-Micklich, A. D. Wieck, A. Devi ,
  Chem. Vap. Deposition2014, 20(7-9), 320

• Atomic-scale engineering of multifunctional nano-sized materials and films
  F. Roozeboom, D. Barreca, A. Devi, H. Parala, M. Ritala ,
  Phys. Status Solidi A2014, 211(2), 249

• Atomic Layer Deposition of TiO₂ and ZrO₂ Thin Films Using Heteroleptic Guanidinate Precursors
  M. Kaipio, T. Blanquart, M. Banerjee, K. Xu, J. Niinistoe, V. Longo, K. Mizohata, A. Devi, M. Ritala, M. Leskelae,
  Chem. Vap. Deposition2014, 20(7-9), 209

Publications 2013

• Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)₂{(ⁱPrN)₂CMe}₂] (M = Mo, W) as precursors
  N. B. Srinivasan, T. Thiede, T. de los Arcos, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R. A. Fischer,
  Surf. Coat. Technol.2013, 230, 130

• Intrinsic Nitrogen-doped CVD-grown TiO₂ Thin Films from All-N-coordinated Ti Precursors for Photoelectrochemical Applications
  S. Kim, K. Xu, H. Parala, R. Beranek, M. Bledowski, K. Sliozberg, H.-W. Becker, D. Rogalla, D. Barreca, C. Maccato, C. Sade, W. Schuhmann, R. A. Fischer, A. Devi ,
  Chem. Vap. Deposition2013, 19(1-3), 45

• Homoleptic Gadolinium Amidinates as Precursors for MOCVD of Oriented Gadolinium Nitride (GdN) Thin Films
  M. Krasnopolski, C. G. Hrib, R. W. Seidel, M. Winter, H.-W. Becker, D. Rogalla, R. A. Fischer, F. T. Edelmann, A. Devi ,
  Inorg. Chem.2013, 52(1), 286

• Growth and Crystallization of TiO₂ Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium
  M. Reiners, K. Xu, N. Aslam, A. Devi, R. Waser, S. Hoffmann-Eifert,
  Chem. Mater.2013, 25(15), 2934

• Atomic layer deposition of Er₂O₃ thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties
  K. Xu, A. R. Chaudhuri, H. Parala, D. Schwendt, T. de los Arcos, H.-J. Osten, A. Devi,
  J. Mater. Chem. C2013, 1(25), 3939

• A Z’ = 6 crystal structure of (E)-N,N’-dicyclohexylacetamidine
  M. Krasnopolski, R. W. Seidel, R. Goddard, J. Breidung, M. Winter, A. Devi, R. A. Fischer,
  J. Mol. Struct.2013, 1031, 239

• [Zr(NEtMe)₂(guan-NEtMe)₂] as a Novel Atomic Layer Deposition Precursor: ZrO₂ Film Growth and Mechanistic Studies
  T. Blanquart, J. Niinisto, N. Aslam, M. Banerjee, Y. Tomczak, M. Gavagnin, V. Longo, E. Puukilainen, H. D. Wanzenboeck, W. M. M. Kessels, A. Devi, S. Hoffmann-Eifert, M. Ritala, M. Leskelae,
  Chem. Mater.2013, 25(15), 3088

• ‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications
  A. Devi,
  Coord. Chem. Rev.2013, 257(23-24), 3332

Publications 2012

• Surfactant-Induced Nonhydrolytic Synthesis of Phase-Pure ZrO₂ Nanoparticles from Metal-Organic and Oxocluster Precursors
  M. A. Sliem, D. A. Schmidt, A. Betard, S. Kalidindi, S. Gross, M. Havenith, A. Devi, R. A. Fischer ,
  Chem. Mater.2014, 24(22), 4274

• Strain-induced phase transitions in epitaxial NaNbO₃ thin films grown by metal-organic chemical vapor deposition
  J. Schwarzkopf, M. Schmidbauer, T. Remmele, A. Duk, A. Kwasniewski, S. Bin Anooz, A. Devi, R Fornari ,
  J. Appl. Cryst.2012, 45(5), 1015

• Sc₂O₃, Er₂O₃, and Y₂O₃ thin films by MOCVD from volatile guanidinate class of rare-earth precursors
  A. P. Milanov, K. Xu, S. Cwik, H. Parala, T. de los Arcos, H.-W. Becker, D. Rogalla, R. Cross, S. Paul, A. Devi ,
  Dalton Trans.2012, 41(45), 13936

• Rare-earth substituted HfO₂ thin films grown by metal organic chemical vapor deposition
  A. Devi, S. Cwik, K. Xu, A. P. Milanov, H. Noei, Y. Wang, D. Barreca, J. Meijer, D. Rogalla, D. Kahn, R. Cross, H. Parala, S. Paul,
  Thin Solid Films2012, 520(14), 4512

• Microgradient-heaters as tools for high-throughput experimentation
  R. Meyer, S. Hamann, M. Ehmann, S. Thienhaus, S. Jaeger, T. Thiede, A. Devi, R. A. Fischer, A. Ludwig,
  ACS Comb. Sci.2012, 14(10), 531

• Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition
  T. de los Arcos, S. Cwik, A. P. Milanov, V. Gwildies, H. Parala, T. Wagner, A. Birkner, D. Rogalla, H.-W. Becker, J. Winter, A. Ludwig, R. A. Fischer, A. Devi,
  Thin Solid Films2012, 522, 11

• Fabrication of ZrO₂ and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors
  M. Banerjee, N. B. Srinivasan, H. Zhu, S. Kim, K. Xu, M. Winter, H.-W. Becker, D. Rogalla, T. de los Arcos, D. Bekermann,
  Cryst. Growth Des.2012, 12(10), 5079

• CuO/ZnO nanocomposite gas sensors developed by a plasma-assisted route
  Q. Simon, D. Barreca, A. Gasparotto, C. Maccato, E. Tondello, C. Sada, E. Comini, G. Sberveglieri, M. Banerjee, K. Xu, A. Devi, R. A. Fischer,
  ChemPhysChem2012, 13(9), 2342

• Co₃O₄/ZnO Nanocomposites: From Plasma Synthesis to Gas Sensing Applications
  D. Bekermann, A. Gasparotto, D. Barreca, C. Maccato, E. Comini, C. Sada, G. Sberveglieri, A. Devi, R. A. Fischer,
  ACS Appl. Mater. Interfaces2012, 4(2), 928

• Atomic Layer Deposition of HfO₂ Thin Films Employing a Heteroleptic Hafnium Precursor
  K. Xu, A. P. Milanov, H. Parala, C. Wenger, C. Baristiran-Kaynak, K. Lakribssi, T. Toader, C. Bock, D. Rogalla, H.-W. Becker, U. Kunze, A. Devi,
  Chem. Vap. Deposition2012, 18(1-3), 27

• Atomic Layer Deposition of Gd₂O₃ and Dy₂O₃: A Study of the ALD Characteristics and Structural and Electrical Properties
  K. Xu, R. Ranjith, A. Laha, H. Parala, A. P. Milanov, R. A. Fischer, E. Bugiel, J. Feydt, S. Irsen, T. Toader, C. Bock, D. Rogalla, H.-J. Osten, U. Kunze, A. Devi,
  Chem. Mater.2012, 24(4), 651

• Ag/ZnO nanomaterials as high performance sensors for flammable and toxic gases
  Q. Simon, D. Barreca, A. Gasparotto, C. Maccato, E. Tondello, C. Sada, E. Comini, A. Devi, R. A. Fischer,
  Nanotechnology2012, 23(2), 025502

• β-Fe₂O₃ nanomaterials from an iron(II) diketonate-diamine complex: a study from molecular precursor to growth process
  D. Barreca, G. Carraro, A. Devi, E. Fois, A. Gasparotto, R. Seraglia, C. Maccato, C. Sada, G. Tabacchi, E. Tondello, A. Venzo, M. Winter,
  Dalton Trans.2012, 41(1), 149

Publications 2011

• Malonate complexes of dysprosium: Synthesis, characterization and application for MOCVD of Dysprosium containing thin films
  A. P. Milanov, R. W. Seidel, D. Barreca, A. Gasparotto, M. Winter, J. Feydt, S. Irsen, H.-W. Becker, A. Devi,
  Dalton Trans.2011, 40, 62

• Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare earth nitride thin films
  T. B. Thiede, M. Krasnopolski, A. P. Milanov, T. de los Arcos, A. Ney, H. W. Becker, D. Rogalla, J. Winter, A. Devi, R. A. Fischer,
  Chem. Mater.2011, 23(6), 1430

• Basic investigation of HfO₂ based metal-insulator-metal diodes
  P. Dudek, R. Schmidt, M. Lukosius, G. Lupina, C. Wenger, A. Abrutis, K. Xu, A. Devi,
  Thin Solid Films 2011, 17, 5796

• Influence of Na on the structure of Bi₄Ti₃O₁₂ films deposited by liquid-delivery spin MOCVD
  J. Schwarzkopf, R. Dirsyte, A. Devi, A. Kwasniewski, M. Schmidbauer, G. Wagner, M. Michling, D. Schmeisser, R. Fornari,
  Thin Solid Films2011, 519, 5754

• “MOCVD of ZnO films from bis(ketoiminato)Zn(II) precursors: Structure, Morphology and Optical Properties
  D. Bekermann, A. Ludwig, T. Toader, C. Maccato, D. Barreca, A. Gasparotto, C. Bock, A. D. Wieck, U. Kunze, E. Tondello, R. A. Fischer, A Devi,
  Chem. Vap. Deposition2011, 17, 155

• Plasma enhanced-CVD of undoped and fluorine-doped Co₃O₄ nanosystems for novel gas sensors
  D. Barreca, D. Bekermann, E. Comini, A. Devi, R. A. Fischer, A. Gasparotto, M. Gavagnin, C. Maccato, C. Sada, G. Sberveglieri, E. Tondello,
  Sensors and Actuators B-chemical2011, 160, 79

• F-Doped Co3O4 Photocatalysts for Sustainable H2 Generation from Water/Ethanol
  A. Gasparotto, D. Barreca, D. Bekermann, A. Devi, R. A. Fischer, P. Fomasiero, V. Oleg, I. Lebedev, C. Maccato, T. Montini, G. Van Tendeloo, E. Tondello,
  J. Am. Chem. Soc.2011, 133, 19362

• Atomic Vapor Deposition Approach to In₂O₃ Thin Films
  M. Hellwig, H. Parala, J. Cybinksa, D. Barreca, A. Gasparotto, B. Niermann, H. -Werner Becker, D. Rogalla, J. Feydt, S. Irsen, A.V. Mudring, J. Winter, R. A. Fischer, A. Devi,
  J. Nanosci. and Nanotechnol.2011, 9, 8094

• Plasma-assisted synthesis of Ag/ZnO nanocomposites: First example of photo-induced H2 production and sensing
  Q. Simon, D. Barreca, D. Bekermann, A. Gasparotto, C. Maccato, E. Comini, V. Gombac, P. Fomasiero, O. I. Lebedev, S. Turner, A. Devi, R.. A. Fischer, G. Van Tendeloo,
  Int. J. of Hydrog. Energy2011, 36, 15527

• Growth of epitaxial sodium-bismuth-titanate films by metal-organic chemical vapor phase deposition
  J. Schwarzkopf, M. Schmidbauer, A. Duk, A. Kwasniewski, S. Bin Anooz, G. Wagner, A. Devi, R. Fomari,
  Thin Solid Films2011, 520, 239

• Plasma Processing of Nanomaterials: Emerging Technologies for Sensing and Energy Applications
  A. Gasparotto, D. Barreca, D. Bekermann, A. Devi, R. A. Fischer, C. Maccato, E. Tondello,
  J. Nanosci. and Nanotechnol.2011, 11, 8206

Publications 2010

• Growth of crystalline Gd₂O₃ thin films with high quality interface on Si(100) by low temperature H₂O assisted atomic layer deposition
  A. P. Milanov, K. Xu, A. Laha, E. Bugiel, R. Ranjith, D. Schwendt, H. J. Osten, H. Parala, R. A. Fischer, A. Devi,
  J. Am. Chem. Soc.2010, 132, 36

• ZnO Nanorod Arrays by Plasma-Enhanced CVD for Light-Activated Functional Applications
  D. Bekermann, A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, M. Kete, U. Lavrencic Stangar, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
  ChemPhysChem2010, 11(11), 2337

• All-Nitrogen Coordinated Amidinato Imido Complexes of Molybdenum and Tungsten: Syntheses and Characterization
  V. Gwildies, T. B. Thiede, S. Amirjalayer, L. Alsamman, A. Devi, R. A. Fischer,
  Inorg. Chem.2010, 49(18), 8487

• Deposition of SrRuO₃ thin films on oxide substrates with liquid-delivery spin MOCVD
  J. Schwarzkopf, R. Dirsyte, A. Devi, M. Schmidbauer, G. Wagner, R. Fornari,
  Thin Solid Films2010, 518, 4675

• 1D ZnO nano-assemblies by Plasma-CVD as chemical sensors for flammable and toxic gases
  D. Barreca , D. Bekermann , E. Cominic , A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, G. Sberveglieric, E. Tondello,
  Sens. & Actuators (B): Chemical 2010, B149(1), 1

• Down scaling of defect passivated Gd₂O₃ thin films on p-Si(001) wafers grown by H₂O assisted atomic layer deposition
  R. Ranjith, A. Laha, E. Bugiel, H. J. Osten, K. Xu, A. P. Milanov, A. Devi,
  Semicond. Sci. Technol.2010, 25, 105001

• Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors
  A. Devi, M. Hellwig, D. Barreca, H. Parala, R. Thomas, H.-W. Becker, Ram. S. Katiyar, R. A. Fischer, E. Tondello,
  Chem. Vap. Deposition2010, 16, 157

• Highly Oriented ZnO Nanorod Arrays by a Novel Plasma Chemical Vapor Deposition Process
  D. Bekermann, A. Gasparotto, D. Barreca, L. Bovo, A. Devi, R. A. Fischer, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
  Cryst. Growth & Design2010, 10, 2012

• Volatile, Monomeric and Fluorine-free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide
  D. Bekermann, D. Rogalla, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
  Eur. J. Inorg. Chem.2010, 9, 1366

• Urchin-like ZnO nanorod arrays for gas sensing applications
  D. Barreca, D. Bekermann, E. Comini, A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, C. Sada, G. Sberveglieri, E. Tondello,
  CrystEngComm201012, 3419

• Heteroleptic guanidinate and amidinate based complexes of hafnium as new precursors for MOCVD of HfO₂
  K. Xu, A. P. Milanov, M. Winter, D. Barreca, A. Gasparotto, H.-W. Becker, A. Devi,
  Eur. J. Inorg. Chem.2010, 11, 1679

• Liquid injection MOCVD grown binary and ternary rare-earth oxides as alternative gate oxides for logic devices
  R. Thomas, P. Ehrhart, R. Waser, J. Schubert, A. Devi, R. S. Katiyar,
  ECS Trans.2010, 33(3), 211

• Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD
  S. Cwik, . A. P. Milanov, V. Gwildies, T. B. Thiede, V. S. Vidyarthi, A. Savan, R. Meyer, H.-W. Becker, D. Rogalla, A. Ludwig, R. A. Fischer, A. Devi,
  ECS Trans.2010, 28(8), 159

Publications 2009

• Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal-Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films
  A. P. Milanov, T. Thiede, A. Devi, R. A. Fischer,
  J. Am. Chem. Soc.2009, 131, 17062

• Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors
  A. P. Milanov, T. Toader, H. Parala, D. Barreca, A. Gasparotto, C. Bock, H.-W. Becker, D. K. Ngwashi, R. Cross, S. Paul, U. Kunze, R. A. Fischer, A. Devi,
  Chem. Mater.2009, 21, 5443

• Zinc Malonate Based Precursors for MOCVD of ZnO
  D. Bekermann, D. Pilard, R. Fischer, and A. Devi,
  ECS Transactions2009, 8, 601

• An integrated experimental and theoretical investigation on Cu(hfa)₂.TMEDA: structure, bonding and reactivity
  G. Bandoli, D. Barreca, A. Gasparotto, R. Seraglia, E. Tondello, A. Devi, R. A. Fischer, E. Fois, A. Gamba, G. Tabacchi,
  Physical Chemistry Chemical Physics2009, 11, 5998

• Rare-earth based oxide and nitride thin films employing volatile homoleptic guanidinate precursors
  A. P. Milanov, T. Thiede, M. Hellwig, H. Parala, C. Bock, H.-W. Becker, D. K. Ngwashi, R. B. M. Cross, S. Paul, U. Kunze, R. A. Fischer, A. Devi,
  ECS Transactions2009, 25, 143

• Investigation of niobium nitride and oxy-nitride films grown by MOCVD
  D. Bekermann, D. Barreca, A. Gasparotto, H. W. Becker, R. A. Fischer, A. Devi,
  Surf. Coatings and Technol.2009, 204, 404

• MOCVD of gallium oxide thin films using homoleptic gallium complexes: Precursor evaluation and thin film characterization
  M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, B. Niermann, J. Winter, H. W. Becker, D. Rogalla, R. A. Fischer, A. Devi,
  ECS Transactions2009, 25, 617

• Tuning the thermal properties of hafnium precursors by tailoring the ligands
  K. Xu, A. P. Milanov, A. Devi,
  K. Xu, A. P. Milanov, A. Devi2009, 25, 625

• Innovative M(hfa)₂TMEDA (M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: An integrated theoretical and experimental approach
  A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, E. Fois, A. Gamba, C. Maccato, R. Seraglia, G. Tabacchi, E. Tondello,
  ECS Transactions2009, 25, 549

• Capacitance-Voltage Analysis of ZrO2 Thin films deposited by MOCVD techniques
  T. A. Mih, S.Paul, A. P. Milanov, R. Bhakta, A. Devi,
  ECS Transactions2009, 25, 901

• Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films
  R. Pothiraja, A. Milanov, D. Barreca, A. Gasparotto, H. W. Becker, M. Winter, R. A. Fischer, A. Devi,
  Chem. Commun.2009, 15, 1978

• Novel gallium complexes with malonic diester anions as molecular precursors for the MOCVD of Ga₂O₃ thin films
  M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, M. Winter, E. Tondello, R. A. Fischer, A. Devi,
  Eur. J. Inorg. Chem.2009, 8, 1110

• A cobalt(II) hexafluoroacetylacetonate ethylenediamine complex as CVD molecular source of cobalt oxides nanostructures
  G. Bandoli, D.Barreca, A.Gasparotto, C. Maccato, R. Seraglia, E. Tondello, A. Devi, R. A. Fischer, M. Winter,
  Inorg. Chem.2009, 48, 82

• Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films
  R. Pothiraja, A. Milanov, H. Parala, M. Winter, R. A. Fischer and A. Devi,
  Dalton Trans.2009, 4, 654

Publications 2008

• Synthesis, characterization and thermal properties of homoleptic rare-earth guanidinates: Promising precursors for MOCVD and ALD of rare-earth oxide thin films
  A. Milanov, R. A. Fischer and A. Devi,
  Inorg. Chem.2008, 47, 11405

• MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study
  D. Bekermann, D. Barreca, A. Devi, A. Gasparotto, and R. A. Fischer,
  ECS Trans.2008, 16, 235

Publications 2007

• Gd2O3 nanostructured thin films analyzed by XPS
  D. Barreca, A. Gasparotto, A. Milanov, E. Tondello, A. Devi, R. A. Fischer,
  Surf. Sci. Spectra2007, 14, 60

• Nanostructured Dy2O3 films: an XPS investigation
  D. Barreca, A. Gasparotto, A. Milanov, E. Tondello, A. Devi, R. A. Fischer,
  Surf. Sci. Spectra2007, 14, 52

• Hafnium oxide thin film grown by ALD: an XPS study
  D. Barreca, A. Milanov, R. A. Fischer, A. Devi, E. Tondello,
  Surf. Sci. Spectra2007, 14, 34

• Stabilization of Amide-Based Complexes of Niobium and Tantalum Using Malonates as Chelating Ligands: Precursor Chemistry and Thin Film Deposition
  M. Hellwig, A. Milanov, D. Barecca, J.-L. Deborde, R. Thomas, M. Winter, U. Kunze, R. A. Fischer and A. Devi,
  Chem. Mater.2007, 19, 6077

• Liquid injection MOCVD of TiO₂ and SrTiO₃ thin films from [Ti(OⁱPr)₂(tbaoac)₂]: Film properties and compatibility with [Sr(thd)₂]
  R. Thomas, R. Bhakta, P. Ehrhart, R. A. Fischer, R.Waser and A. Devi,
  Surface Coatings and Technology2007, 201, 9135

• LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors
  . Milanov, R.Thomas, M. Hellwig, K. Merz, H.-W. Becker, P.Ehrhart, R. A. Fischer, R. Waser, and A. Devi,
  Surface Coatings and Technology2007, 201, 9109

• Vaporizable metalorganic compounds for deposition of metals and metal-containing thin films
  A. Thenappan, J. Lao, H. K. Nair, A. Devi, R. Bhakta, A. Milanov,
  Patent : PCT Int. Appl.2007, 58pp, CODEN: PIXXD2 WO 2007005088 A2 20070111 CAN 146:133962 AN 2007:33784

• Thin films of ZrO₂ for high-k applications employing engineered alkoxide and amide based MOCVD precursors
  R. Thomas, R. Bhakta, A. Milanov, A. Devi and P. Ehrhart,
  Chem. Vap. Deposition2007, 13, 98

• Synthesis and characterisation of zirconium-amido guanidinato complex: A potential precursor for ZrO₂ thin films
  A. Devi, R, Bhakta, A. Milanov, M. Hellwig, D. Barreca, E. Tondello, R. Thomas, P.Ehrhart, M. Winter, and R. A. Fischer,
  Dalton Trans.2007, 17, 1671

• Thin films of HfO₂ for high-k gate oxide applications from engineered alkoxide and amide based MOCVD precursors
  .Thomas, E. Rije, P. Ehrhart, A. Milanov, R. Bhakta, A. Bauneman, A. Devi, R. A. Fischer and R. Waser,
  J. Electrochem. Soc.2007, 154, G77

• The synthesis of ZrO₂/SiO₂ nanocomposites by the two-step CVD of a volatile halogen-free Zr alkoxide in a fluidized-bed reactor
  W. Xia , Y. Wang, V. Hagen, A. Heel, G. Kasper, U. Patil, A. Devi, M. Muhler,
  Chem. Vap. Deposition2007, 13, 37

• Investigation of Thermal Decomposition of the Titanium MOCVD Precursor [Ti(OⁱPr)₂(thd)₂], Employing Matrix Isolation-FTIR technique
  R. Bhakta, H. Bettinger, and A. Devi,
  ECS Transactions2007, 2, 89

Publications 2006

• Metalorganic precursors for CVD and related techniques (ALD)
  A. Devi, R. Bhakta, A. Milanov,
  German Patent: DE 10 2005 030 915.1 and US Patent : US 60/696,0722006,

• Guanidinate stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO₂
  A. Milanov, R. Bhakta, A. Baunemann, H. W. Becker, R. Thomas, P. Ehrhart, M. Winter and A. Devi,
  Inorganic Chemistry2006, 46, 11008

• Precursor chemistry for TiO₂: Titanium complexes with mixed nitrogen/oxygen ligand sphere
  A. Baunemann, M. Hellwig, A. Varade, R. Bhakta, M. Winter, S. A. Shivashankar, R. A. Fischer, and A. Devi,
  Dalton Trans.2006, 28, 3485

• Liquid injection MOCVD of ZrO₂ thin films using zirconium bis (diethylamido)bis(di-tert-butylmalonato) as a novel precursor
  R. Thomas, A. Milanov, R. Bhakta, U. Patil, M. Winter, P. Ehrhart, R. Waser and A. Devi,
  Chem. Vap. Deposition2006, 12, 295

• MOCVD of ZrO₂ and HfO₂ thin films from modified monomeric precursors
  U. Patil, R. Thomas, A. Milanov, R. Bhakta, P. Ehrhart, R. Waser, R. Becker, H.-W. Becker, M. Winter, K. Merz, R. A. Fischer and A. Devi,
  Chem. Vap. Deposition2006, 12, 172

• Mixed amide malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
  A. Milanov, R. Bhakta, R. Thomas, P. Ehrhart, M. Winter, R. Waser, A. Devi,
  J. Mater. Chem.2006, 16, 437

Publications 2005

• High-k dielectric materials by metalorganic chemical vapor deposition: Growth and characterization
  R. Thomas, S. Regnery, P. Ehrhart , R. Waser, R. Bhakta, U. Patil, A. Devi,
  Ferroelectrics2005, 327, 111

• Materials chemistry of group-13 nitrides
  A. Devi, R. Schmid, J. Müller, R. A. Fischer,
  Topics in Organometallic Chemistry2005, 9, 49

• Synthesis and structure of Bis(2-butyl-N,N’-diisopropylamidinateo)dichloro-hafnium(IV)
  A. Milanov, R. Bhakta, M. Winter, K. Merz, A. Devi,
  Acta Cryst. C2005, 61, m 370

• Metal-Organic CVD of conductive and crystalline hafnium nitride films
  Y. Kim, A. Baunemann, H. Parala, A. Devi, R. A. Fischer,
  Chem. Vap. Deposition2005, 11, 294

• Zirconium dioxide thin films for high-k applications by MOCVD from novel mononuclear precursors
  R. Thomas, U. Patil, P. Ehrhart, A. Devi, R. Waser,
  Proc. Electrochem. Soc.2005, 944

• Volatile single source precursors for the MOCVD of metal silicate thin films
  U. Patil, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
  Proc. Electrochem. Soc.2005, 913

• Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned Si(100) substrates by MOCVD method
  B. C. Kang, A. Baunemann, Y. Kim, J. H. Lee, D. Y. Jung, A. Devi, H. Parala, R. A. Fischer, J. H. Boo,
  Proc. Electrochem. Soc.2005, 326

• MOCVD of TiO2 thin films on OTS modified Si(100) substrates by micro-contact printing: Selective growth and new characterisation technique with micro-Raman spectroscopy
  B. C. Kang, J. H. Lee, D. Y. Jung, J. H. Boo, A. Devi, R. Bhakta, R. A. Fischer, S. H. Hong,
  Proc. Electrochem. Soc.2005, 320

• Gas phase decomposition studies on the MOCVD precursor [Ti(OC₃H₇)]₄] using matrix-isolation FTIR spectroscopy
  R. Bhakta, E. Gemel, J. Müller, A. Devi,
  Proc. Electrochem. Soc.2005, 312

Publications 2004

• Precursor engineering and evaluation: Studies on the nature of molecular mechanisms involved in the MOCVD of TiO₂ thin films
  R. Bhakta, R. Thomas, F. Hipler, H. Bettinger, J. Müller, P. Ehrhart, A. Devi,
  J. Mater. Chem.2004, 14, 3231

• Mononuclear precursor for MOCVD of HfO₂ thin films
  A. Baunemann, R. Becker, M. Winter, R. A. Fischer, R. Thomas, P. Ehrhart, R. Waser, A. Devi,
  Chem. Commun.2004, 14, 1610

Publications 2003

• MOCVD of copper films from copper ethylacetoacetate: Experiment and thermodynamic analysis
  S. Mukhopadhyay, K. Shalini, A. Devi, S. A. Shivashankar,
  Proc. Electrochem. Soc.2003, 2, 1275

• Nanostructures of group-III nitrides by MOCVD using molecular precursors
  J. Khanderi, A. Wohlfart, H. Parala, A. Devi, R. A. Fischer,
  Proc. Electrochem. Soc.2003, 2, 1098

• MOCVD of TiO₂ thin films using a new class of metalorganic precursors
  R. Bhakta, U. Patil, A. Devi,
  Proc. Electrochem. Soc.2003, 2, 1477

• Zinc amide compounds as potential precursors for the synthesis of zinc nitride
  E. Maile, A. Devi, R. A. Fischer,
  Proc. Electrochem. Soc.2003, 2, 975

• A study on the metalorganic chemical vapor deposition of pure copper films from low cost copper(II) ) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand
  R. Becker, A. Devi, J. Weiß, U. Weckenmann, M. Winter, C. Kiener, H. W. Becker, R. A. Fischer,
  Chem. Vap. Deposition2003, 9, 149

• MOCVD of gallium nitride nanostructures using (N₃)₂Ga{(CH₂)₃NR₂} R=Me, Et as single molecule precursor: Morphology control and materials characterization
  J. Khanderi, A. Wohlfart, H. Parala, A. Devi, J. Hambrock, A. Birkner, R. A. Fischer,
  J. Mater. Chem.2003, 13, 1438

• Mononuclear mixed-ketoester-alkoxide compound of Ti as a promising precursor for MOCVD of TiO2 thin films
  R. Bhakta, S. Regnery, F. Hipler, M. Winter, P. Ehrhart, R. Waser, A. Devi,
  Chem. Vap. Deposition2003, 9, 295

• Organische Puffer machen Metalloxide flüssig: Chemische Verpackungskünste für neue Computerchips
  A. Devi,
  ChemieRubin2003, 56

• Synthesis and structure of mixed isopropoxide-ß-ketoester and ß-ketoamide zirconium complexes: Potential precursors for MOCVD of ZrO₂
  U. Patil, M. Winter, H. W. Becker, A. Devi,
  J. Mater. Chem.2003, 13, 2177

Pubikationen 2002

• Thermodynamic investigation of the MOCVD of Cu films from bis(2,2,6,6-tetramethyl-3,5-heptadionato)copper (II)
  S. Mukhopadhyay, K. Shalini, A. Devi, S. A. Shivashankar,
  Bull. Mater. Sci.2002, 25, 391

• Synthesis of nano-scale TiO2 particles by non-hydrolytic approach
  H. Parala, A. Devi, R. Bhakta, R. A. Fischer,
  J. Mater. Chem.2002, 12, 1625

• Morphology controlled growth of arrays of GaN nanopillars and randomly distributed GaN nanowires on sapphire using (N₃)₂Ga[(CH₂)₃NMe₂)] as a single molecule precursor
  A. Wohlfart, A. Devi, E. Maile, R. A. Fischer,
  Chem. Comm.2002, 9, 998

• MOCVD of aluminium oxide films using aluminium ß-diketonates as precursors
  A. Devi, S. A. Shivashankar, A.G. Samuelson,
  J. Phys. IV 2002, 12, 139

• Strongly oriented thin films of Co₃O₄ deposited on single crystal MgO(100) by low-pressure, low-temperature MOCVD
  A. U. Mane, K. Shalini, A. Devi, S. A. Shivashankar,
  J. Cryst. Growth2002, 240, 157

• Metalorganic chemical vapor deposition of Cu films from bis(t-butyl-3-oxo-butanato(copper (II): Thermodynamic investigation and experimental verification
  S. Mukhopadhyay, K. Shalini, R. Lakshmi, A. Devi, S. A. Shivashankar,
  Surface and Coatings Technology2002, 150, 205

Publications 2001

• Investigations on InN Whiskers grown by Chemical Vapor Deposition
  H. Parala, A. Devi, F. Hipler, E. Maile, A. Birkner, Hans W. Becker, R. A. Fischer,
  J. Cryst. Growth2001, 231, 68

• Nanosized GaN Particles by Chemical Vapor Infiltration
  H. Parala, A. Devi, A. Birkner, R. A Fischer,
  Proc. Electrochem. Soc.2001, 13, 429

• Indium Nitride Whisker Growth by Chemical Vapor Deposition
  H. Parala, A. Devi, F. Hipler, A. Birkner, R. A. Fischer,
  Proc. Electrochem. Soc.2001, 13, 356

• Growth of porous columnar alpha-GaN layers on c-plane Al₂O₃ by MOCVD using Bisazido dimethylaminopropyl gallium as single source precursor
  A. Wohlfart, A. Devi, F. Hipler, H. W. Becker, R. A. Fischer,
  J. Phys. IV2001, 11, 683

• An Efficient Chemical Solution Deposition Method for Epitaxial GaN layers using Single Molecule Precursor
  H. Parala, A. Devi, A. Wohlfart, M. Winter, R. A. Fischer,
  Adv. Functional Mater.2001, 11, 224

• Chemical Vapor Deposition of Copper using Copper(II) Amino Alkoxides
  R. Becker, J. Weiß, A. Devi, R. A. Fischer,
  J. Phys. IV2001, 11, 569

• Synthesis of GaN Particles in Porous Matrices by Chemical Vapor Infiltration of Single Molecule Precursors
  H. Parala, A. Devi, W. Rogge, A. Birkner, R. A. Fischer,
  J. Phys. IV2001, 11, 473

• Growth of InN Whiskers From Single Source Precursors
  A. Devi, H. Parala, A. Wohlfart, A. Birkner, R. A. Fischer,
  J. Phys. IV2001, 11, 577

• A study of nucleation and growth in MOCVD: The growth of thin films of Alumina
  M. P. Singh, S. Mukhopadhyay, A. Devi, S. A. Shivashankar,
  Mater. Res. Soc. Symp. Proc.2001, 648, P6.47

Publications 2000

• Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE using (N₃)₂Ga[(CH₂)₃NMe₂] as Single Source Precursor
  A. Wohlfart, A. Devi, W. Rogge, R. A. Fischer, M. D. Allendorf, C. F. Melius,
  Proc. Electrochem. Soc.2000, 13, 697

• CVD of Thin Films of Copper and Cobalt from Different Precursors: Growth Kinetics and Microstructure
  A. Mane, K. Shalini, A. Devi, R. Lakshmi, M. S. Dharmaprakash, M. Paranjape, S. A. Shivashankar,
  Mat. Res. Soc. Symp. Proc.2000, 614, G6.11.1

• Precursor Chemistry of Group-III Nitrides XVI: Synthesis and Structure of Monomeric Penta Coordinated Intramolecularly Adduct Stabilized Amidobisazides of Aluminium, Gallium and Indium with and all Nitrogen Coordination Sphere: OMCVD of GaN using (N₃)₂Ga{N[CH₂CH₂(NEt₂)]₂}
  H. Sussek, O. Stark, A. Devi, H. Pritzkow, R. A. Fischer,
  J. Organomet. Chem.2000, 602, 29

• A Study on Bisazido(dimethylaminopropyl)gallium as Precursor for OMVPE of Gallium Nitride in a Cold Wall Reactor System at Reduced Pressure
  A. Devi, W. Rogge, A. Wohlfart, F. Hipler, H. W. Becker, R. A. Fischer,
  Chem. Vap. Deposition2000, 6, 245

• Growth Kinetics of GaN Thin Films Grown by MOVPE Using Single Molecule Precursors
  R. A. Fischer, A. Wohlfart, A. Devi, W. Rogge,
  Mater. Res. Soc. Internet J. Nitride Semicond. Res.2000, 5, U136

• Epitaxy, Disperse Powders and Colloids of Gallium Nitride achieved by transformation of single source precursors
  H. Winkler, A. Devi, A. Manz, A. Wohlfart, W. Rogge, R. A. Fischer,
  Physica Status Solidi A2000, 177, 27

• Precursor Chemistry for OMVPE of Group-13 Nitrides
  R. A. Fischer, A. Devi,
  Developments in Crystal Growth Research2000, 2, 61

Publications 1999

• Molecular Precursors to Group-13 Nitrides, 14: Synthesis and Structures of (N₃)₂Ga[(CH₂)₃NMe₂], (N₃)Ga[(CH₂)₃NMe₂]₂ and (N₃)₃Ga(NR₃) (R= CH₃, C₂H₅)
  A. Devi, H. Sussek, H. Pritzkow, M. Winter, R. A. Fischer,
  Eur. J. Inorg. Chem.1999, 12, 2127

• OMVPE of GaN using (N3)2Ga[(CH2)3NMe2] (BAZIGA) in a Cold Wall Reactor
  A. Devi, W. Rogge, R. A. Fischer, F. Stowasser, H. W. Becker, J. Schaefer, J. Wolfrum,
  J. Phys. IV1999, (P8) Part 2, 589

• Thermal Analysis of Metalorganic Complexes of Copper for Evaluation as CVD Precursors
  A. Devi, S. A. Shivashankar,
  J. Therm. Anal. Calorim.1999, 55, 259

Publications 1998

• Thermal Chemical Vapor Deposition of Copper Films from Copper Ethylacetoacetate: Microstructure and Electrical Resistivity
  A. Devi, S. A. Shivashankar,
  J. Mater. Sci. Lett.1998, 17, 367

• A novel Cu (II) precursor for CVD: Synthesis, Characterization and Application
  A. Devi, J. Goswami, L. Raghunathan, S. A. Shivashankar, S. Chandrasekaran,
  J. Mater. Res.1998, 13, 687

Publications 1996

• Low-Temperature Structure of Two Copper Based Precursors for MOCVD: Bis(tert-butyl acetoacetato)aquo Copper(II) and Bis(dipivaloylmethanato) Copper(II)
  S. Pattnaik, T. N. Guru Row, L. Raghunathan, A. Devi, J. Goswami, S. A. Shivashankar, S. Chandrasekaran, W. T. Robinson,
  Acta Cryst. C1996, 52, 89

• Chemical Vapor Deposition of Thin Films of Copper Using a New Metalorganic Precursor
  J. Goswami, L. Raghunathan, A. Devi, S. A. Shivashankar, S. Chandrasekaran,
  J. Mater. Sci. Lett.1996, 15, 573

Publications 1995

• Thermal Investigations on Single Bimetallic Precursors for MOCVD of Ferroelectric Oxide Thin Films
  M. M. A. Sekar, A.G.Samuelson, A. Devi, S. A. Shivashankar,
  Proceedings of the 10th National Symposium on Thermal Analysis1995, 139

• Evaluation by Thermal Analysis of Metalorganic Precursors for Chemical Vapor Deposition of Thin Films of Copper
  A. Devi, R. Lakshmi, J. Goswami, S. A. Shivashankar and S. Chandrasekaran,
  Proceedings of the 10th National Symposium on Thermal Analysis1995, 117

Publications 1994

• Comparison of Growth and Microstructure of Copper Films deposited from different Cu(II) Precursors
  J. Goswami, S. A. Shivashankar, L. Raghunathan, A. Devi, K. V. Ramanathan,
  Mater. Res. Soc. Symp. Proc.1994, 337, 691