Pulsed Laser Deposition Lab

The IMW runs Physical Vapor Deposition (PVD) laboratories with two Pulsed Laser Deposition (PLD) clusters as well as two sputter deposition systems. The setup includes several UHV chambers with load lock systems for the preparation of epitaxial and polycrystalline ferroelectric and superconducting thin films as well as for oxide heterostructures. Besides state-of-the-art RHEED systems for in-situ control of film growth, specialized systems are available for ion-beam assisted and off-axis PLD.


    • High Temperature Superconductors: (Y,Gd)Ba2Cu3O7-x, La2(Ba,Sr,)CuO4
    • Fe-based Superconductors: Fe(Se,Te), BaFe2-x(Ni,Co)xAs2
    • Metallic Superconductors: Nb, NbN
    • Ferroelectric oxides: BaTi1-xZrxO3, Ba1-xSrxTiO3, PMN-PT
    • Functional Oxide Heterostructures: SrRuO3, La1-xSrxCoO3 etc.
    • (Magnetic) Shape Memory Alloys: Ni-Mn-Ga, NiTi
    • Magnetocaloric and Thermomagnetic Films: Ni-Mn-Ga (Co, Cu,…), Antiperovskite


    • Two Coherent Excimer Lasers LPX 305 (248 nm, 25 ns, 50 Hz, max. 1 J)
    • UHV PLD systems with up to 8 targets, heated substrates, RHEED target and substrate transfer, 10-9 mbar or deposition under Ar, N2 or O2 pressure
    • HV PLD setup with 6 targets for ion-beam assisted deposition including RHEED
    • HV PLD setups with up to 7 targets and oxygen resistant heaters
    • UHV Sputter system with 5 targets (4” and 4*2”, 3” substrates up to 1000°C), base pressure 10-9 mbar, loadlock, rate monitor, for functional metallic films and combinatorial material science
    • HV sputter system with 2” target for metallic superconductors
    • All deposition systems are computer controlled with scripts for automated deposition and heat treatment

        Scientists in Charge

        Dr. Ruben Hühne
        Research Group “Functional Oxide Layers and Superconductors”
        Room A 3E.06.1