Groupleader
Contact:
Phone: +49 (0) 351 4659 246
Room: A 2E.07
Research Group: "Area-Selective Deposition (ASD)”
Contact:
Phone: +49 (0) 351 4659 872
Room: B 3E.09
The Nanostructured Thin Film Materials (NTFM) group pursues a technology-driven experimental approach to design, develop and optimize nanoscale functional materials through atomic-layer processing of thin-film materials and nanoscale engineering via chemical vapour deposition methods, including Metal-Organic Chemical Vapour Deposition (MOCVD), Atomic Layer Deposition (ALD), and Area-Selective Deposition (ASD). The focus is on the chemistry of thin-film growth and interface engineering to investigate the mechanical, electrical, optical and optoelectronic properties of thin films as well as understanding and controlling the thin film properties by varying the process parameters, adjusting layer and interface properties, including growth and characterization of nanometer-thin layers of metal oxides, metal nitrides, metal sulfides and 2D materials. We work closely with many universities, research institutes, chemical industries, tools and equipment manufacturers to test new precursors and develop new processes for nanoelectronics, nanotechnology, energy technologies, and advanced semiconductor manufacturing.
Dr. H. Parala - room: A2.E.07
Nanostructured Thin Film Materials
IMC - Institute for Materials Chemistry
Leibniz Institute for Solid State and Materials Research Dresden
Helmholtzstr. 20
01069 Dresden
Germany
Brit Präßler-Wüstling
Phone: +49 (0) 351 4659 217
E-mail: b.praessler@ifw-dresden.de
E-mail: office-imc@ifw-dresden.de
Katja Peschel
Phone: +49 (0) 351 4659 304
E-mail: k.peschel@ifw-dresden.de
E-mail: office-imc@ifw-dresden.de
