For a surface sensitive chemical analysis our X-ray excited photoelectron spectroscopy supports you. The method is well-suited for a non-destructive (depth) analysis down to 10 nm. Primarily, semiconducting and metallic materials, as well as, their oxides are investigated. The sample preparation of organic and metallic thin films under ultra-high vacuum conditions is also possible and part of the service.
| PHI Spectrometer with 150mm hemispherical analyser |
| 16 Slot Multi-channeltron Detector |
| Monochromated Al K(alpha) X-ray source |
| Switchable X-ray source with Al- and Mg-Anodes |
| Ultra-high vacuum and x-ray resistant |
| Solid, dry samples as bulk pellets, thin films or powders |
| Recommended size for compacted samples: max. 20 mm diameters and 10 mm thickness |
| Analysis (Elements from Li or above) of elemental composition and their detailed chemical binding states |
| Investigation of depth profiling of the elemental composition by repeatedly sputtering down to 500nm |
| Non-destructive layered structure analysis by angle dependent XPS down to 10nm ( suitable for natural oxide layers) |
| Valence state analysis for conducting samples with Helium discharge light source |
| Thin film preparation of metallic (DC-sputtering) or organic (sublimation) thin films under ultra-high vacuum conditions in separate preparation chambers |
