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Cluster tool Creavac Creamet 350 CI 6 ("CARMEN")

Schematics of the tool
Schematics of the tool

CARMEN is a Clustertool for Advanced Research on Thin Film Materials for Electroacoustic Nonconventional Devices

The deposition machine CARMEN is a versatile tool for various deposition techniques.

Description of the tool:

Chamber in the middle = handler for transfer and with three measurement stages (optical layer thickness, electrical sheet resistance method in construction)
Chamber 1 = load lock with hot carrier system (heating in all chambers except chamber 6)
Chamber 2 = ion beam pretreatment (Mark I+ Kaufman-type ion source) for surface preclean and etch applications with high-current, low-energy ions
Chamber 3 = DC magnetron co-sputtering of metallizations (Cu, Al, Ag, Ti, W, Co, Fe, Ni, Zr)
Chamber 4 = HF magnetron sputtering (reactive) of metallizations and barriers (Ti, Ru, Ta5Si3, TaSiN)
Chamber 5 = HF magnetron sputtering (reactive) of insulators (SAW-grade SiO2)
Chamber 6 = e-beam evaporation (Cu, Al, Ag, Au, Ti)

  • base pressure 10-6 mbar down to low 10-7 mbar
  • dry vacuum system (roots and turbo molecular pumps)
  • controlled carrier heating RT to 500°C and cooling (ramps 2 to 20 K/min)
  • computer controlled processing and monitoring
  • inspection/process flow via Internet

Information from Equipment & Facilities from Micro/Nano Structures at Structure Analysis

Name of contact person group/department telephone number email address
Dr. Thomas Gemming Structure Analysis -298 T.Gemming(at)ifw-dresden.de