Our group focuses on the development of molecular precursors and the design of atomic-scale deposition processes for the fabrication of functional thin films via chemical vapor deposition (CVD), atomic layer deposition (ALD), and related techniques.
Through the implementation of tailored precursors and process engineering, we enable the synthesis and investigation of advanced materials across a wide range of technological applications — including electronics, energy conversion, sensing, catalysis, and sustainable manufacturing.
From molecules to materials: We design precursors and atomic-layer processes to engineer functional thin films for electronics, energy, and sustainable technology.
The aim of this initiative is to enable large-scale processing of advanced functional materials at the atomic level for future nanotechnologies. Therefore, the Competence Center at IFW Dresden has been upgraded with an industrial MOCVD reactor. This system enables highly precise process control, especially with newly developed precursors, greatly enhancing the institute’s materials research capabilities. In addition, a state-of-the-art atomic layer deposition (ALD) platform has been installed, providing advanced capabilities for the deposition of a wide range of material systems, including 2D materials, metals, and dielectric thin films on technologically relevant substrate sizes. The system is also compatible with custom-designed precursor compounds, creating new opportunities for process development and materials innovation. Together, these developments further strengthen the Competence Center’s role as a bridge between fundamental research and application-driven development.
Development of novel, sustainable, and high-performance precursors for ALD/MLD/CVD — including amidates, β-ketoenamines, carbonyl complexes, and dithiooxamides.
Examples: Ruthenium amidates (J. Obenlüneschloß et al., Dalton Trans. 2026), liquid Ge(IV) precursors (F. Preischel et al., Small 2026), rare-earth amidates (A. Ghazy et al., Chem. Mater. 2026), and self-reducing Al hydrides (N. Huster et al., Dalton Trans. 2024).
Pioneering precursor- and process-specific ALD/MLD for metals, oxides, nitrides, and hybrid films — with focus on low-temperature, conformal, and scalable growth.
Examples: NiOx for water oxidation (V. Kannampalli et al., J. Mater. Chem. A 2026), ZnO from Zn(DMP)₂ (K. Guzey et al., ACS Appl. Electron. Mater. 2026), and MgO at near room temperature (F. Preischel et al., JACS 2025).
Tailoring electronic, optical, catalytic, and mechanical properties through composition, structure, and interface control.
Examples: Tunable MoS₂ via polyoxometalate doping (J.-P. Glauber et al., Adv. Electron. Mater. 2026), SnO₂:Ta TCOs (C. Bauden et al., physica status solidi (b) 2026), and CuxCryOz for solar cells (G. Bartholazzi et al., Appl. Surf. Sci. 2025).
Advancing eco-friendly, low-energy, and non-toxic deposition routes — including metalation of biopolymers and sustainable CVD.
Examples: Zn-metalation of chitosan for antiseptic scaffolds (M. Moreno et al., Appl. Surf. Sci. Adv. 2026), sustainable ZrN for nitrogen reduction (J.-P. Glauber et al., Dalton Trans. 2024), and non-pyrophoric Zn(DMP)₂ (L. Johnston et al., RSC Appl. Interfaces 2024).
Using DFT, machine learning, and FAIR data principles to guide precursor selection and predict film properties.
Examples: Computationally guided rare-earth ALD (F. Preischel et al., Chem. Mater. 2026), FAIR reviews in materials science (J. D'Souza et al., JVST A 2026), and defect engineering in CeO₂ (R. Tschammer et al., ACS Appl. Mater. Interfaces 2026).
Designing hybrid organic-inorganic, nanostructured, and responsive materials for advanced applications.
Examples: Zn-benzene dithiol films for temperature sensing (A. Philip et al., Small 2024), nanoporous gold for SERS (A. Jose et al., J. Alloys Compd. 2025), and MoS₂ gas sensors (R.-M. Neubieser et al., IEEE Sensors Lett. 2025).
We develop novel precursors and process strategies for atomic layer deposition (ALD) to enable conformal, ultra-thin, and defect-controlled growth of functional thin films — from oxides and nitrides to metals and hybrid materials. Our work focuses on precision control at the atomic scale, with applications in electronics, energy, and sustainable manufacturing.
MoreWe advance metal-organic and vapor-phase CVD processes for the direct growth of high-quality thin films, including metal sulfides, ferrites, and photoactive materials. Our research emphasizes precursor design, process optimization, and functional property engineering for next-generation devices.
MoreWe design and implement innovative molecular and chemical routes to create functional materials — from sustainable precursors to hybrid organic-inorganic films. Our approach integrates molecular engineering, computational guidance, and scalable deposition for real-world applications.
MoreOur thesis projects span the full spectrum of materials science — from precursor synthesis to device integration — with a focus on atomic-scale control, sustainability, and innovation. Each thesis contributes to the group’s core mission: molecules to materials.
More“We don’t just deposit films — we design molecules to build the future.”
— Dr. Anjali Devi, Molecules to Materials Group
