


The Focussed Ion Beam (FIB) technology (FIB Helios 5 CX, ThermoScientific) is used for investigations in materials research or microelectronics, esp. for high contrast imaging of thin film microstructure using the channeling effect, cross section preparation, failure analysis, microstructuring, or thin film device modification. Using a focussed Gallium ion beam, it can precisely remove or deposit material at the sample surface on a submicron scale as well as image the sample surface or cross-section producing high quality contrast images with high magnifications.
Information from Equipment & Facilities from Micro/Nano Structures at Structure Analysis
| Name of contact person | group/department | telephone number | email address |
| Dr. Thomas Gemming | Structure Analysis | -298 | T.Gemming(at)ifw-dresden.de |