Nanostructures can be used to tailor light-matter interaction in many ways. Optical metasurfaces composed of two-dimensional configurations of sub-wavelength sized metallic or dielectric nanostructures in particular have a large range of potential applications, e.g., as perfect absorbers or sensors. Their combination with optoelectronic devices can enable and enhance device functionality. Here, we report on the transfer of prototype device realizations in a university cleanroom to a 200 mm Si BiCMOS pilot line, i.e. the combination of plasmonic nanohole arrays with Ge photodetectors for on-chip refractive index sensing as well as the realization of metasurface-based, wavelength-selective photodetectors on the Si platform. The reproducibility of CMOS-compatible fabrication methods can also leveraged for the realization of metasurfaces with tailored properties for light-matter interaction. We present examples based on plasmonic metasurfaces, whose optical properties are strongly influenced by near-field interactions between the individual meta-atoms. Our results not only highlight challenges and opportunities in implementing metasurfaces as functional device layers, they also showcase the advantages of using high precision Si technology for the fabrication of nanophotonic structures.